JP3568980B2 - チップに切断後のｉｃのウエハ形態での加工処理法 - Google Patents

チップに切断後のｉｃのウエハ形態での加工処理法 Download PDF

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Publication number
JP3568980B2
JP3568980B2 JP03364294A JP3364294A JP3568980B2 JP 3568980 B2 JP3568980 B2 JP 3568980B2 JP 03364294 A JP03364294 A JP 03364294A JP 3364294 A JP3364294 A JP 3364294A JP 3568980 B2 JP3568980 B2 JP 3568980B2
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Japan
Prior art keywords
wafer
substrate
chips
tape
dicing tape
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Expired - Fee Related
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JP03364294A
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English (en)
Japanese (ja)
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JPH076983A (ja
Inventor
シー．スミス グレゴリィ
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テキサス インスツルメンツ インコーポレイテツド
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Publication of JPH076983A publication Critical patent/JPH076983A/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1082—Partial cutting bonded sandwich [e.g., grooving or incising]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Dicing (AREA)
  • Micromachines (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
JP03364294A 1993-03-03 1994-03-03 チップに切断後のｉｃのウエハ形態での加工処理法 Expired - Fee Related JP3568980B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US025533 1987-03-13
US2553393A 1993-03-03 1993-03-03

Publications (2)

Publication Number Publication Date
JPH076983A JPH076983A (ja) 1995-01-10
JP3568980B2 true JP3568980B2 (ja) 2004-09-22

Family

ID=21826636

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03364294A Expired - Fee Related JP3568980B2 (ja) 1993-03-03 1994-03-03 チップに切断後のｉｃのウエハ形態での加工処理法

Country Status (8)

Country Link
US (1) US5622900A (oth)
EP (1) EP0614102B1 (oth)
JP (1) JP3568980B2 (oth)
KR (1) KR100302974B1 (oth)
CN (1) CN1054437C (oth)
CA (1) CA2115947A1 (oth)
DE (1) DE69415059T2 (oth)
TW (1) TW246738B (oth)

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US5832585A (en) * 1996-08-13 1998-11-10 National Semiconductor Corporation Method of separating micro-devices formed on a substrate
KR100267155B1 (ko) * 1996-09-13 2000-10-16 아끼구사 나오유끼 반도체 장치의 제조 방법 및 제조 장치
TW571373B (en) 1996-12-04 2004-01-11 Seiko Epson Corp Semiconductor device, circuit substrate, and electronic machine
CN100440472C (zh) * 1996-12-04 2008-12-03 精工爱普生株式会社 半导体装置及其制造方法、电路基板和电子设备
TW480636B (en) 1996-12-04 2002-03-21 Seiko Epson Corp Electronic component and semiconductor device, method for manufacturing and mounting thereof, and circuit board and electronic equipment
US6182546B1 (en) 1997-03-04 2001-02-06 Tessera, Inc. Apparatus and methods for separating microelectronic packages from a common substrate
US5923995A (en) * 1997-04-18 1999-07-13 National Semiconductor Corporation Methods and apparatuses for singulation of microelectromechanical systems
US5972781A (en) * 1997-09-30 1999-10-26 Siemens Aktiengesellschaft Method for producing semiconductor chips
US6217972B1 (en) 1997-10-17 2001-04-17 Tessera, Inc. Enhancements in framed sheet processing
US5899730A (en) * 1997-11-14 1999-05-04 Lucent Technologies Inc. Method of handling semiconductor wafers, bars and chips
US6140151A (en) * 1998-05-22 2000-10-31 Micron Technology, Inc. Semiconductor wafer processing method
US6543512B1 (en) 1998-10-28 2003-04-08 Micron Technology, Inc. Carrier, method and system for handling semiconductor components
TW420845B (en) * 1999-08-11 2001-02-01 Siliconware Precision Industries Co Ltd Die sawing and grinding process
WO2001014248A2 (en) * 1999-08-24 2001-03-01 Knowles Electronics, Llc Assembly process for delicate silicon structures
US6425971B1 (en) * 2000-05-10 2002-07-30 Silverbrook Research Pty Ltd Method of fabricating devices incorporating microelectromechanical systems using UV curable tapes
WO2002074686A2 (en) * 2000-12-05 2002-09-26 Analog Devices, Inc. A method and device for protecting micro electromechanical systems structures during dicing of a wafer
US20020076905A1 (en) * 2000-12-15 2002-06-20 Yuan-Fu Lin Method of eliminating silicon residual from wafer after dicing saw process
US6420206B1 (en) 2001-01-30 2002-07-16 Axsun Technologies, Inc. Optical membrane singulation process utilizing backside and frontside protective coating during die saw
US20020114507A1 (en) * 2001-02-21 2002-08-22 Mark Lynch Saw alignment technique for array device singulation
US6982184B2 (en) * 2001-05-02 2006-01-03 Silverbrook Research Pty Ltd Method of fabricating MEMS devices on a silicon wafer
US6589809B1 (en) * 2001-07-16 2003-07-08 Micron Technology, Inc. Method for attaching semiconductor components to a substrate using local UV curing of dicing tape
KR20030060488A (ko) * 2002-01-09 2003-07-16 삼성전자주식회사 웨이퍼 레벨로 제작되는 소자의 분리방법
US7534498B2 (en) * 2002-06-03 2009-05-19 3M Innovative Properties Company Laminate body, method, and apparatus for manufacturing ultrathin substrate using the laminate body
JP4565804B2 (ja) * 2002-06-03 2010-10-20 スリーエム イノベイティブ プロパティズ カンパニー 被研削基材を含む積層体、その製造方法並びに積層体を用いた極薄基材の製造方法及びそのための装置
US7785485B2 (en) * 2003-09-17 2010-08-31 Becton, Dickinson And Company System and method for creating linear and non-linear trenches in silicon and other crystalline materials with a router
JP2005150235A (ja) * 2003-11-12 2005-06-09 Three M Innovative Properties Co 半導体表面保護シート及び方法
US7465368B2 (en) * 2003-12-24 2008-12-16 Intel Corporation Die molding for flip chip molded matrix array package using UV curable tape
NL1030004C2 (nl) * 2005-09-21 2007-03-22 Fico Singulation B V Inrichting en werkwijze voor het separeren van elektronische componenten.
US7851334B2 (en) * 2007-07-20 2010-12-14 Infineon Technologies Ag Apparatus and method for producing semiconductor modules
JP2010062269A (ja) * 2008-09-02 2010-03-18 Three M Innovative Properties Co ウェーハ積層体の製造方法、ウェーハ積層体製造装置、ウェーハ積層体、支持層剥離方法、及びウェーハの製造方法
WO2010045754A1 (en) * 2008-10-23 2010-04-29 Freescale Semiconductor Inc. Method for singulating electronic components from a substrate
FI125817B (fi) 2009-01-27 2016-02-29 Teknologian Tutkimuskeskus Vtt Oy Parannettu sähköisesti säädettävä Fabry-Perot-interferometri, välituote, elektrodijärjestely ja menetelmä sähköisesti säädettävän Fabry-Perot-interferometrin tuottamiseksi
FI124072B (fi) * 2009-05-29 2014-03-14 Valtion Teknillinen Mikromekaaninen säädettävä Fabry-Perot -interferometri, välituote ja menetelmä niiden valmistamiseksi
DE102010016781A1 (de) * 2010-05-04 2011-11-10 Cicor Management AG Verfahren zur Herstellung einer flexiblen Schaltungsanordnung
DE102014111744B4 (de) 2014-08-18 2022-01-05 Infineon Technologies Ag Baugruppe zum handhaben eines halbleiterchips und verfahren zum handhaben eines halbleiterchips
KR102625710B1 (ko) * 2021-09-24 2024-01-16 주식회사 루츠 형광체의 제조방법

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JPS5578544A (en) * 1978-12-08 1980-06-13 Nec Corp Pelletization of semiconductor wafer
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US5061049A (en) * 1984-08-31 1991-10-29 Texas Instruments Incorporated Spatial light modulator and method
JPS6249231A (ja) * 1985-08-29 1987-03-03 Toyoda Mach Works Ltd 圧力センサの製造方法
JPS6269635A (ja) * 1985-09-24 1987-03-30 Toshiba Corp 半導体ウエ−ハの支持治具
JP2578774B2 (ja) * 1986-09-02 1997-02-05 日本板硝子株式会社 レンズ付きモジュ−ルの製造方法
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JPH03228350A (ja) * 1990-02-02 1991-10-09 Nec Corp 半導体ウェハーの切削方法
JPH0627411B2 (ja) * 1990-09-19 1994-04-13 理研軽金属工業株式会社 エキスパンションジョイント
JPH05291398A (ja) * 1992-04-08 1993-11-05 Sony Corp 素子基板及び液晶表示装置の製造方法
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US5459081A (en) * 1993-12-21 1995-10-17 Nec Corporation Process for transferring a device to a substrate by viewing a registration pattern

Also Published As

Publication number Publication date
EP0614102A2 (en) 1994-09-07
DE69415059D1 (de) 1999-01-21
CA2115947A1 (en) 1994-09-04
US5622900A (en) 1997-04-22
CN1054437C (zh) 2000-07-12
JPH076983A (ja) 1995-01-10
DE69415059T2 (de) 1999-05-20
KR940022799A (ko) 1994-10-21
KR100302974B1 (ko) 2001-11-30
TW246738B (oth) 1995-05-01
EP0614102B1 (en) 1998-12-09
EP0614102A3 (en) 1994-11-30
CN1101458A (zh) 1995-04-12

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