JP2944164B2 - フレキソ印刷版用液状感光性樹脂組成物 - Google Patents

フレキソ印刷版用液状感光性樹脂組成物

Info

Publication number
JP2944164B2
JP2944164B2 JP2207975A JP20797590A JP2944164B2 JP 2944164 B2 JP2944164 B2 JP 2944164B2 JP 2207975 A JP2207975 A JP 2207975A JP 20797590 A JP20797590 A JP 20797590A JP 2944164 B2 JP2944164 B2 JP 2944164B2
Authority
JP
Japan
Prior art keywords
molecular weight
weight
glycol
average molecular
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2207975A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0495959A (ja
Inventor
源昭 高橋
健治 藤岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Original Assignee
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Kogyo KK filed Critical Asahi Kasei Kogyo KK
Priority to JP2207975A priority Critical patent/JP2944164B2/ja
Priority to FR9110041A priority patent/FR2665774A1/fr
Priority to BE9100731A priority patent/BE1004496A5/fr
Priority to ITMI912228A priority patent/IT1251162B/it
Priority to ES09101857A priority patent/ES2034890B1/es
Publication of JPH0495959A publication Critical patent/JPH0495959A/ja
Application granted granted Critical
Publication of JP2944164B2 publication Critical patent/JP2944164B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67Unsaturated compounds having active hydrogen
    • C08G18/671Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP2207975A 1990-08-08 1990-08-08 フレキソ印刷版用液状感光性樹脂組成物 Expired - Lifetime JP2944164B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2207975A JP2944164B2 (ja) 1990-08-08 1990-08-08 フレキソ印刷版用液状感光性樹脂組成物
FR9110041A FR2665774A1 (fr) 1990-08-08 1991-08-07 Composition liquide a base d'une resine photodurcissable pour la fabrication d'une plaque d'impression flexographique.
BE9100731A BE1004496A5 (fr) 1990-08-08 1991-08-08 Composition liquide a base d'une resine photodurcissable pour la fabrication d'une plaque d'impression flexographique.
ITMI912228A IT1251162B (it) 1990-08-08 1991-08-08 Composizione liquida di resina foto-induribile per produrre una piastra per stampa flessografica
ES09101857A ES2034890B1 (es) 1990-08-08 1991-08-08 "compuesto liquido de resina fotocurable para la fabricacion de planchas para la impresion flexografica y su procedimiento de fabricacion".

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2207975A JP2944164B2 (ja) 1990-08-08 1990-08-08 フレキソ印刷版用液状感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPH0495959A JPH0495959A (ja) 1992-03-27
JP2944164B2 true JP2944164B2 (ja) 1999-08-30

Family

ID=16548607

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2207975A Expired - Lifetime JP2944164B2 (ja) 1990-08-08 1990-08-08 フレキソ印刷版用液状感光性樹脂組成物

Country Status (5)

Country Link
JP (1) JP2944164B2 (es)
BE (1) BE1004496A5 (es)
ES (1) ES2034890B1 (es)
FR (1) FR2665774A1 (es)
IT (1) IT1251162B (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2283244B (en) * 1993-06-18 1997-08-13 Asahi Chemical Ind A photosensitive resin composition used for a corrugated board printing plate
AU684151B2 (en) * 1994-03-04 1997-12-04 Asahi Kasei Kogyo Kabushiki Kaisha Liquid photosensitive resin composition for forming relief structures
KR20090122343A (ko) 2007-06-18 2009-11-27 아사히 가세이 이-매터리얼즈 가부시키가이샤 감광성 수지 조성물, 플렉소 인쇄판 및 플렉소 인쇄판의 제조 방법
JP5466689B2 (ja) * 2011-11-30 2014-04-09 富士フイルム株式会社 フレキソ印刷版用樹脂組成物、フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版及びその製版方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL129237C (es) * 1965-03-11
JPS53143669A (en) * 1977-05-23 1978-12-14 Asahi Chem Ind Co Ltd Elimination of surface tuckiness of radically-polymerizable resin cured product
ZA851456B (en) * 1984-03-06 1985-10-30 Uniroyal Inc Tapered di-block copolymer photopolymerizable composition
GB2179360B (en) * 1985-08-12 1989-08-02 Uniroyal Plastics Aqueous developable photopolymeric compositions containing chlorosulfonated polyethylene
JPH07113767B2 (ja) * 1986-10-02 1995-12-06 旭化成工業株式会社 段ボ−ル印刷用感光性樹脂印刷版
JP2653458B2 (ja) * 1988-03-26 1997-09-17 旭化成工業株式会社 凸版印刷版用感光性樹脂組成物
EP0348063B1 (en) * 1988-06-10 1993-05-26 Asahi Kasei Kogyo Kabushiki Kaisha Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition
EP0356954A3 (en) * 1988-08-30 1991-05-08 E.I. Du Pont De Nemours And Company A plasticized polyvinyl alcohol release layer for a flexographic printing plate
CA2045292A1 (en) * 1990-07-26 1992-01-27 John A. Martens Flexographic printing plate compositions

Also Published As

Publication number Publication date
ITMI912228A0 (it) 1991-08-08
JPH0495959A (ja) 1992-03-27
FR2665774B1 (es) 1997-02-14
ITMI912228A1 (it) 1992-02-09
ES2034890B1 (es) 1995-11-01
BE1004496A5 (fr) 1992-12-01
IT1251162B (it) 1995-05-04
FR2665774A1 (fr) 1992-02-14
ES2034890A1 (es) 1993-04-01

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