JP2660835B2 - 画像形成方法 - Google Patents

画像形成方法

Info

Publication number
JP2660835B2
JP2660835B2 JP62114400A JP11440087A JP2660835B2 JP 2660835 B2 JP2660835 B2 JP 2660835B2 JP 62114400 A JP62114400 A JP 62114400A JP 11440087 A JP11440087 A JP 11440087A JP 2660835 B2 JP2660835 B2 JP 2660835B2
Authority
JP
Japan
Prior art keywords
group
component
parts
atom
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62114400A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62273529A (ja
Inventor
アーヴィング エドワード
ポール バンクス クリストファー
Original Assignee
チバ−ガイギ− アクチエンゲゼル シヤフト
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB868611480A external-priority patent/GB8611480D0/en
Priority claimed from GB868614529A external-priority patent/GB8614529D0/en
Application filed by チバ−ガイギ− アクチエンゲゼル シヤフト filed Critical チバ−ガイギ− アクチエンゲゼル シヤフト
Publication of JPS62273529A publication Critical patent/JPS62273529A/ja
Application granted granted Critical
Publication of JP2660835B2 publication Critical patent/JP2660835B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Paints Or Removers (AREA)
JP62114400A 1986-05-10 1987-05-11 画像形成方法 Expired - Fee Related JP2660835B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB868611480A GB8611480D0 (en) 1986-05-10 1986-05-10 Forming images
GB8611480 1986-06-14
GB8614529 1986-06-14
GB868614529A GB8614529D0 (en) 1986-06-14 1986-06-14 Forming images

Publications (2)

Publication Number Publication Date
JPS62273529A JPS62273529A (ja) 1987-11-27
JP2660835B2 true JP2660835B2 (ja) 1997-10-08

Family

ID=26290751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62114400A Expired - Fee Related JP2660835B2 (ja) 1986-05-10 1987-05-11 画像形成方法

Country Status (12)

Country Link
US (1) US4849320A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP2660835B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE1001615A4 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1315592C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CH (1) CH678897A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3715181C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ES (1) ES2003717A6 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2598522B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2191199B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT1205008B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL8701100A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
SE (1) SE467379B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

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Also Published As

Publication number Publication date
US4849320A (en) 1989-07-18
GB2191199B (en) 1990-06-13
SE8701902L (sv) 1987-11-11
JPS62273529A (ja) 1987-11-27
ES2003717A6 (es) 1988-11-01
DE3715181A1 (de) 1987-11-12
BE1001615A4 (fr) 1989-12-19
CA1315592C (en) 1993-04-06
FR2598522A1 (fr) 1987-11-13
GB8710794D0 (en) 1987-06-10
SE467379B (sv) 1992-07-06
NL8701100A (nl) 1987-12-01
IT1205008B (it) 1989-03-10
IT8720448A0 (it) 1987-05-08
FR2598522B1 (fr) 1994-05-27
GB2191199A (en) 1987-12-09
SE8701902D0 (sv) 1987-05-08
CH678897A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-11-15
DE3715181C2 (de) 1998-10-29

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