FR2598522B1 - Procede de formation d'images et compositions pour ce procede. - Google Patents

Procede de formation d'images et compositions pour ce procede.

Info

Publication number
FR2598522B1
FR2598522B1 FR8706455A FR8706455A FR2598522B1 FR 2598522 B1 FR2598522 B1 FR 2598522B1 FR 8706455 A FR8706455 A FR 8706455A FR 8706455 A FR8706455 A FR 8706455A FR 2598522 B1 FR2598522 B1 FR 2598522B1
Authority
FR
France
Prior art keywords
compositions
image forming
forming process
image
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR8706455A
Other languages
English (en)
French (fr)
Other versions
FR2598522A1 (fr
Inventor
Edward Irving
Christopher Paul Banks
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB868611480A external-priority patent/GB8611480D0/en
Priority claimed from GB868614529A external-priority patent/GB8614529D0/en
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of FR2598522A1 publication Critical patent/FR2598522A1/fr
Application granted granted Critical
Publication of FR2598522B1 publication Critical patent/FR2598522B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Paints Or Removers (AREA)
FR8706455A 1986-05-10 1987-05-07 Procede de formation d'images et compositions pour ce procede. Expired - Fee Related FR2598522B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB868611480A GB8611480D0 (en) 1986-05-10 1986-05-10 Forming images
GB868614529A GB8614529D0 (en) 1986-06-14 1986-06-14 Forming images

Publications (2)

Publication Number Publication Date
FR2598522A1 FR2598522A1 (fr) 1987-11-13
FR2598522B1 true FR2598522B1 (fr) 1994-05-27

Family

ID=26290751

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8706455A Expired - Fee Related FR2598522B1 (fr) 1986-05-10 1987-05-07 Procede de formation d'images et compositions pour ce procede.

Country Status (12)

Country Link
US (1) US4849320A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP2660835B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE1001615A4 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1315592C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CH (1) CH678897A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3715181C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ES (1) ES2003717A6 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2598522B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2191199B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT1205008B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL8701100A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
SE (1) SE467379B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

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Also Published As

Publication number Publication date
BE1001615A4 (fr) 1989-12-19
DE3715181C2 (de) 1998-10-29
CH678897A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-11-15
DE3715181A1 (de) 1987-11-12
SE467379B (sv) 1992-07-06
NL8701100A (nl) 1987-12-01
GB2191199A (en) 1987-12-09
SE8701902L (sv) 1987-11-11
US4849320A (en) 1989-07-18
JP2660835B2 (ja) 1997-10-08
IT8720448A0 (it) 1987-05-08
CA1315592C (en) 1993-04-06
JPS62273529A (ja) 1987-11-27
GB8710794D0 (en) 1987-06-10
IT1205008B (it) 1989-03-10
GB2191199B (en) 1990-06-13
ES2003717A6 (es) 1988-11-01
SE8701902D0 (sv) 1987-05-08
FR2598522A1 (fr) 1987-11-13

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