ES2003717A6 - Un procedimiento para la produccion de una imagen - Google Patents

Un procedimiento para la produccion de una imagen

Info

Publication number
ES2003717A6
ES2003717A6 ES8701381A ES8701381A ES2003717A6 ES 2003717 A6 ES2003717 A6 ES 2003717A6 ES 8701381 A ES8701381 A ES 8701381A ES 8701381 A ES8701381 A ES 8701381A ES 2003717 A6 ES2003717 A6 ES 2003717A6
Authority
ES
Spain
Prior art keywords
radiation
activated
initiator
residue
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES8701381A
Other languages
English (en)
Spanish (es)
Inventor
Edward Irwing
Christopher Pau Banks
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB868611480A external-priority patent/GB8611480D0/en
Priority claimed from GB868614529A external-priority patent/GB8614529D0/en
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES2003717A6 publication Critical patent/ES2003717A6/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Paints Or Removers (AREA)
ES8701381A 1986-05-10 1987-05-08 Un procedimiento para la produccion de una imagen Expired ES2003717A6 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB868611480A GB8611480D0 (en) 1986-05-10 1986-05-10 Forming images
GB868614529A GB8614529D0 (en) 1986-06-14 1986-06-14 Forming images

Publications (1)

Publication Number Publication Date
ES2003717A6 true ES2003717A6 (es) 1988-11-01

Family

ID=26290751

Family Applications (1)

Application Number Title Priority Date Filing Date
ES8701381A Expired ES2003717A6 (es) 1986-05-10 1987-05-08 Un procedimiento para la produccion de una imagen

Country Status (12)

Country Link
US (1) US4849320A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP2660835B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE1001615A4 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1315592C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CH (1) CH678897A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3715181C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ES (1) ES2003717A6 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2598522B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2191199B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT1205008B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL8701100A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
SE (1) SE467379B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

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Also Published As

Publication number Publication date
IT8720448A0 (it) 1987-05-08
US4849320A (en) 1989-07-18
GB2191199B (en) 1990-06-13
NL8701100A (nl) 1987-12-01
CA1315592C (en) 1993-04-06
GB8710794D0 (en) 1987-06-10
SE467379B (sv) 1992-07-06
JP2660835B2 (ja) 1997-10-08
GB2191199A (en) 1987-12-09
CH678897A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-11-15
SE8701902L (sv) 1987-11-11
IT1205008B (it) 1989-03-10
FR2598522B1 (fr) 1994-05-27
DE3715181C2 (de) 1998-10-29
BE1001615A4 (fr) 1989-12-19
FR2598522A1 (fr) 1987-11-13
JPS62273529A (ja) 1987-11-27
DE3715181A1 (de) 1987-11-12
SE8701902D0 (sv) 1987-05-08

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