JP2025517471A5 - - Google Patents
Info
- Publication number
- JP2025517471A5 JP2025517471A5 JP2024569229A JP2024569229A JP2025517471A5 JP 2025517471 A5 JP2025517471 A5 JP 2025517471A5 JP 2024569229 A JP2024569229 A JP 2024569229A JP 2024569229 A JP2024569229 A JP 2024569229A JP 2025517471 A5 JP2025517471 A5 JP 2025517471A5
- Authority
- JP
- Japan
- Prior art keywords
- weight
- approximately
- neat
- composition according
- mea
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202263365154P | 2022-05-23 | 2022-05-23 | |
| US63/365,154 | 2022-05-23 | ||
| PCT/US2023/065163 WO2023230394A1 (en) | 2022-05-23 | 2023-03-30 | Formulated alkaline chemistry for polysilicon exhume |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025517471A JP2025517471A (ja) | 2025-06-05 |
| JP2025517471A5 true JP2025517471A5 (https=) | 2026-01-23 |
Family
ID=86007459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024569229A Pending JP2025517471A (ja) | 2022-05-23 | 2023-03-30 | ポリシリコンエッチング用に配合されたアルカリ化学物質 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250304856A1 (https=) |
| EP (1) | EP4508676A1 (https=) |
| JP (1) | JP2025517471A (https=) |
| KR (1) | KR20250012632A (https=) |
| CN (1) | CN119452457A (https=) |
| TW (1) | TW202346541A (https=) |
| WO (1) | WO2023230394A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6233779B2 (ja) * | 2013-11-18 | 2017-11-22 | 富士フイルム株式会社 | 変性レジストの剥離方法、これに用いる変性レジストの剥離液および半導体基板製品の製造方法 |
| US10400167B2 (en) | 2015-11-25 | 2019-09-03 | Versum Materials Us, Llc | Etching compositions and methods for using same |
| US11180697B2 (en) | 2018-11-19 | 2021-11-23 | Versum Materials Us, Llc | Etching solution having silicon oxide corrosion inhibitor and method of using the same |
| TWI864116B (zh) * | 2019-09-30 | 2024-12-01 | 美商慧盛材料美國有限責任公司 | 用於製造半導體裝置期間之選擇性移除氮化矽之蝕刻組合物及方法 |
| KR102951694B1 (ko) * | 2019-10-29 | 2026-04-13 | 동우 화인켐 주식회사 | 식각액 조성물, 이를 이용한 패턴 형성 방법 및 어레이 기판의 제조 방법, 및 이에 따라 제조된 어레이 기판 |
| KR102862934B1 (ko) * | 2020-09-09 | 2025-09-22 | 동우 화인켐 주식회사 | 실리콘 식각액 조성물, 이를 이용한 패턴 형성 방법 및 어레이 기판의 제조 방법, 및 이에 따라 제조된 어레이 기판 |
-
2023
- 2023-03-30 WO PCT/US2023/065163 patent/WO2023230394A1/en not_active Ceased
- 2023-03-30 KR KR1020247042441A patent/KR20250012632A/ko active Pending
- 2023-03-30 EP EP23717384.4A patent/EP4508676A1/en active Pending
- 2023-03-30 JP JP2024569229A patent/JP2025517471A/ja active Pending
- 2023-03-30 CN CN202380046390.3A patent/CN119452457A/zh active Pending
- 2023-03-30 US US18/864,038 patent/US20250304856A1/en active Pending
- 2023-03-31 TW TW112112561A patent/TW202346541A/zh unknown
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