JP2025503368A - 向上した熱安定性を有する光硬化性組成物 - Google Patents

向上した熱安定性を有する光硬化性組成物 Download PDF

Info

Publication number
JP2025503368A
JP2025503368A JP2024523538A JP2024523538A JP2025503368A JP 2025503368 A JP2025503368 A JP 2025503368A JP 2024523538 A JP2024523538 A JP 2024523538A JP 2024523538 A JP2024523538 A JP 2024523538A JP 2025503368 A JP2025503368 A JP 2025503368A
Authority
JP
Japan
Prior art keywords
photocurable composition
amount
monomer
photocurable
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024523538A
Other languages
English (en)
Japanese (ja)
Other versions
JP2025503368A5 (https=
Inventor
フェン ワン，
ウェイジュン リウ，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of JP2025503368A publication Critical patent/JP2025503368A/ja
Publication of JP2025503368A5 publication Critical patent/JP2025503368A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0023—Digital printing methods characterised by the inks used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
    • C08F16/14—Monomers containing only one unsaturated aliphatic radical
    • C08F16/16—Monomers containing no hetero atoms other than the ether oxygen
    • C08F16/22—Carbocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Liquid Crystal (AREA)
  • Indole Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
  • Polymerization Catalysts (AREA)
JP2024523538A 2021-12-27 2022-11-23 向上した熱安定性を有する光硬化性組成物 Pending JP2025503368A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/646,108 2021-12-27
US17/646,108 US20230203210A1 (en) 2021-12-27 2021-12-27 Photocurable composition with enhanced thermal stability
PCT/US2022/050842 WO2023129311A2 (en) 2021-12-27 2022-11-23 Photocurable composition with enhanced thermal stability

Publications (2)

Publication Number Publication Date
JP2025503368A true JP2025503368A (ja) 2025-02-04
JP2025503368A5 JP2025503368A5 (https=) 2025-05-22

Family

ID=86898320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024523538A Pending JP2025503368A (ja) 2021-12-27 2022-11-23 向上した熱安定性を有する光硬化性組成物

Country Status (6)

Country Link
US (1) US20230203210A1 (https=)
EP (1) EP4457566A4 (https=)
JP (1) JP2025503368A (https=)
KR (1) KR20240107193A (https=)
CN (1) CN118318207A (https=)
WO (1) WO2023129311A2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12275854B2 (en) 2022-11-21 2025-04-15 Canon Kabushiki Kaisha Curable composition, film forming method and article manufacturing method
TW202535989A (zh) * 2023-12-28 2025-09-16 德商默克專利有限公司 化合物
TW202545859A (zh) * 2023-12-28 2025-12-01 德商默克專利有限公司 化合物
WO2025142787A2 (en) 2023-12-28 2025-07-03 Canon Kabushiki Kaisha Curable composition
TW202536000A (zh) 2023-12-28 2025-09-16 日商佳能股份有限公司 可硬化之組成物
JP2025121753A (ja) 2024-02-07 2025-08-20 キヤノン株式会社 膜形成方法、および物品製造方法
TW202600500A (zh) 2024-03-15 2026-01-01 德商默克專利有限公司 可硬化之組成物

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61167901A (ja) * 1985-01-22 1986-07-29 Asahi Glass Co Ltd 有機光学材料
JPH073025A (ja) * 1993-06-18 1995-01-06 Tokuyama Corp 光重合性組成物
JP2000017003A (ja) * 1998-06-29 2000-01-18 Sharp Corp 光重合性組成物、該組成物を使用した光機能性膜作製法および光機能性膜
JP2001181316A (ja) * 1999-12-27 2001-07-03 Sharp Corp 光重合性組成物、その組成物を用いた光機能性膜およびその光機能性膜の製造方法
JP2001282082A (ja) * 2000-01-25 2001-10-12 Natl Inst Of Advanced Industrial Science & Technology Meti ホログラム記録材料組成物、ホログラム記録媒体およびその製法
WO2008123094A1 (ja) * 2007-03-22 2008-10-16 Nippon Steel Chemical Co., Ltd. 体積位相型ホログラム記録材料及びそれを用いた光情報記録媒体
JP2009191159A (ja) * 2008-02-14 2009-08-27 Hitachi Chem Co Ltd 光学材料用高屈折率樹脂、光学材料用高屈折率樹脂組成物およびそれを用いた硬化物
JP2020100817A (ja) * 2018-12-20 2020-07-02 キヤノン株式会社 硬化後の収縮が小さい光硬化性組成物

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4234674A (en) * 1979-08-08 1980-11-18 Monsanto Company Amino-functional photopolymer compositions and photo-oxidation imaging processes employing same
KR101059481B1 (ko) * 2008-10-23 2011-08-25 서울대학교산학협력단 자외선 몰딩 방식을 통한 생체모방형 계층 구조를 갖는 초소수성 표면 제조 방법
JP5443806B2 (ja) * 2009-03-26 2014-03-19 新日鉄住金化学株式会社 末端変性可溶性多官能ビニル芳香族共重合体、硬化性樹脂組成物及び硬化物
JP2011184623A (ja) * 2010-03-10 2011-09-22 Dic Corp 硬化性樹脂組成物、その硬化物、及びプラスチックレンズ
KR20140029272A (ko) * 2012-08-30 2014-03-10 신닛테츠 수미킨 가가쿠 가부시키가이샤 방향족 비닐벤질에테르 화합물, 및 이것을 함유하는 경화성 조성물
CN105474096B (zh) * 2013-08-27 2019-11-12 日本瑞翁株式会社 辐射敏感树脂组合物、树脂膜及电子部件
EP3466994B1 (en) * 2016-05-30 2020-09-16 Nissan Chemical Corporation Reactive polysiloxane and polymerizable composition containing same
US11739208B2 (en) * 2020-08-14 2023-08-29 Kraton Corporation Block copolymers and uses thereof
US11981759B2 (en) * 2022-05-18 2024-05-14 Canon Kabushiki Kaisha Photocurable composition
US12275854B2 (en) * 2022-11-21 2025-04-15 Canon Kabushiki Kaisha Curable composition, film forming method and article manufacturing method

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61167901A (ja) * 1985-01-22 1986-07-29 Asahi Glass Co Ltd 有機光学材料
JPH073025A (ja) * 1993-06-18 1995-01-06 Tokuyama Corp 光重合性組成物
JP2000017003A (ja) * 1998-06-29 2000-01-18 Sharp Corp 光重合性組成物、該組成物を使用した光機能性膜作製法および光機能性膜
JP2001181316A (ja) * 1999-12-27 2001-07-03 Sharp Corp 光重合性組成物、その組成物を用いた光機能性膜およびその光機能性膜の製造方法
JP2001282082A (ja) * 2000-01-25 2001-10-12 Natl Inst Of Advanced Industrial Science & Technology Meti ホログラム記録材料組成物、ホログラム記録媒体およびその製法
WO2008123094A1 (ja) * 2007-03-22 2008-10-16 Nippon Steel Chemical Co., Ltd. 体積位相型ホログラム記録材料及びそれを用いた光情報記録媒体
JP2009191159A (ja) * 2008-02-14 2009-08-27 Hitachi Chem Co Ltd 光学材料用高屈折率樹脂、光学材料用高屈折率樹脂組成物およびそれを用いた硬化物
JP2020100817A (ja) * 2018-12-20 2020-07-02 キヤノン株式会社 硬化後の収縮が小さい光硬化性組成物

Also Published As

Publication number Publication date
EP4457566A2 (en) 2024-11-06
EP4457566A4 (en) 2025-10-08
KR20240107193A (ko) 2024-07-08
WO2023129311A2 (en) 2023-07-06
WO2023129311A3 (en) 2023-09-07
TW202330648A (zh) 2023-08-01
US20230203210A1 (en) 2023-06-29
CN118318207A (zh) 2024-07-09

Similar Documents

Publication Publication Date Title
JP2025503368A (ja) 向上した熱安定性を有する光硬化性組成物
JP7237915B2 (ja) 光硬化性組成物
CN113614118A (zh) 光固化性组合物
KR20230120130A (ko) 높은 열적 안정성을 갖는 경화된 층을 형성하기 위한 광경화성 조성물
TWI885350B (zh) 光可固化組成物
TWI916628B (zh) 具有提高的熱穩定性之光可固化組成物
JP2025508327A (ja) 反応性ポリマーを含む光硬化性組成物
JP7832925B2 (ja) 光硬化性組成物
KR20240113835A (ko) 향상된 열적 안정성을 갖는 광경화성 조성물
TW202511305A (zh) 用於噴墨適應性平坦化之熱可固化組成物
TWI909118B (zh) 包括非反應性聚合物之光可固化組成物
JP2024024590A (ja) 光硬化性組成物
WO2024123531A1 (en) Photocurable composition with high silicon content
KR20250161011A (ko) 광경화성 조성물
TW202216794A (zh) 光可固化組成物

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250514

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20250514

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20260212

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20260220

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20260416