KR101059481B1 - 자외선 몰딩 방식을 통한 생체모방형 계층 구조를 갖는 초소수성 표면 제조 방법 - Google Patents
자외선 몰딩 방식을 통한 생체모방형 계층 구조를 갖는 초소수성 표면 제조 방법 Download PDFInfo
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- KR101059481B1 KR101059481B1 KR1020080114805A KR20080114805A KR101059481B1 KR 101059481 B1 KR101059481 B1 KR 101059481B1 KR 1020080114805 A KR1020080114805 A KR 1020080114805A KR 20080114805 A KR20080114805 A KR 20080114805A KR 101059481 B1 KR101059481 B1 KR 101059481B1
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- biomimetic
- superhydrophobic
- layer structure
- curable resin
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/0266—Local curing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/165—Monolayers, e.g. Langmuir-Blodgett
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Health & Medical Sciences (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Thermal Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
Description
Claims (19)
- 생체모방형 계층 구조의 초소수성 표면을 제조하는 방법으로서,기판 상에 나노분말 분산형의 자외선 경화 수지를 형성하는 과정과,상기 자외선 경화 수지의 상부에 패턴이 형성된 몰드의 패턴면을 접촉시키는 과정과,자외선를 가하여 상기 자외선 경화 수지를 경화시키는 과정과,상기 기판으로부터 상기 몰드를 탈거하는 과정과,상기 자외선 경화 수지의 패턴화된 경화 표면에 원자외선을 가하여 상기 경화 표면에서의 나노분말을 노출시키는 과정과,자기조립 모노레이어(SAM)를 이용하여 상기 패턴화된 경화 표면을 표면 처리하는 과정을 포함하는 생체모방형 계층 구조의 초소수성 표면 제조 방법.
- 제 1 항에 있어서,상기 자외선 경화 수지는, 자외선 경화형 아크릴레이트 올리고머, 반응성 희석제, 광개시제 및 나노분말을 포함하는 것을 특징으로 하는 생체모방형 계층 구조의 초소수성 표면 제조 방법.
- 제 2 항에 있어서,상기 나노분말은, 알루미나(Al2O3), 산화티탄(TiO2), 실리카(SiO2)와 같은 금속산화물 또는 무기산화물 중 어느 하나로 이루어진 것을 특징으로 하는 생체모방형 계층 구조의 초소수성 표면 제조 방법.
- 제 1 항에 있어서,상기 몰드의 패턴은 프리즘 또는 피라미드 형태의 마이크론 오더 크기의 패턴 어레이인 것을 특징으로 하는 생체모방형 계층 구조의 초소수성 표면 제조 방법.
- 제 4 항에 있어서,상기 몰드는, 유기 또는 무기 몰드인 것을 특징으로 하는 생체모방형 계층 구조의 초소수성 표면 제조 방법.
- 제 1 항에 있어서,상기 자외선은, 상기 몰드 또는 기판의 배면을 투과하는 형태로 가해지는 것을 특징으로 하는 생체모방형 계층 구조의 초소수성 표면 제조 방법.
- 삭제
- 삭제
- 제 1 항에 있어서,상기 노출 과정은, 상기 원자외선을 가하여 상기 경화 표면의 유기물을 선택 식각함으로써, 상기 경화 표면에 있는 나노분말의 표면을 노출시키는 것을 특징으로 하는 생체모방형 계층 구조의 초소수성 표면 제조 방법.
- 삭제
- 제 9 항에 있어서,상기 원자외선은, 300nm 이하의 파장을 가지는 자외선 조사를 통해 발생하는 것을 특징으로 하는 생체모방형 계층 구조의 초소수성 표면 제조 방법.
- 제 1 항에 있어서,상기 표면 처리를 위한 표면 처리제는, 불소기를 함유한 실란계 화합물 또는 불소를 함유한 클로라이드계 화합물인 것을 특징으로 하는 생체모방형 계층 구조의 초소수성 표면 제조 방법.
- 삭제
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WO2023129311A3 (en) * | 2021-12-27 | 2023-09-07 | Canon Kabushiki Kaisha | Photocurable composition with enhanced thermal stability |
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CN106498458B (zh) * | 2016-12-30 | 2018-06-29 | 福建钢泓金属科技股份有限公司 | 一种自清洁不锈钢板及其生产方法 |
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JP2006114882A (ja) | 2004-09-16 | 2006-04-27 | Asahi Glass Co Ltd | パターンの形成方法およびパターンを有する物品 |
JP2006110997A (ja) | 2004-09-16 | 2006-04-27 | Asahi Glass Co Ltd | 転写体の製造方法、光硬化性組成物、および微細構造体の製造方法 |
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JP2006114882A (ja) | 2004-09-16 | 2006-04-27 | Asahi Glass Co Ltd | パターンの形成方法およびパターンを有する物品 |
JP2006110997A (ja) | 2004-09-16 | 2006-04-27 | Asahi Glass Co Ltd | 転写体の製造方法、光硬化性組成物、および微細構造体の製造方法 |
Cited By (1)
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WO2023129311A3 (en) * | 2021-12-27 | 2023-09-07 | Canon Kabushiki Kaisha | Photocurable composition with enhanced thermal stability |
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