JP2025029205A5 - - Google Patents
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- Publication number
- JP2025029205A5 JP2025029205A5 JP2024215844A JP2024215844A JP2025029205A5 JP 2025029205 A5 JP2025029205 A5 JP 2025029205A5 JP 2024215844 A JP2024215844 A JP 2024215844A JP 2024215844 A JP2024215844 A JP 2024215844A JP 2025029205 A5 JP2025029205 A5 JP 2025029205A5
- Authority
- JP
- Japan
- Prior art keywords
- containing film
- molybdenum
- tungsten
- silicon
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 238000000034 method Methods 0.000 claims 29
- 238000005530 etching Methods 0.000 claims 25
- 239000007789 gas Substances 0.000 claims 25
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 24
- 229910052750 molybdenum Inorganic materials 0.000 claims 24
- 239000011733 molybdenum Substances 0.000 claims 24
- 239000010703 silicon Substances 0.000 claims 24
- 229910052710 silicon Inorganic materials 0.000 claims 24
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 24
- 229910052721 tungsten Inorganic materials 0.000 claims 24
- 239000010937 tungsten Substances 0.000 claims 24
- 239000000758 substrate Substances 0.000 claims 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 7
- 229910052799 carbon Inorganic materials 0.000 claims 7
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 6
- 239000011737 fluorine Substances 0.000 claims 6
- 229910052731 fluorine Inorganic materials 0.000 claims 6
- 239000011241 protective layer Substances 0.000 claims 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021102876 | 2021-06-22 | ||
| JP2021102876 | 2021-06-22 | ||
| JP2021171587 | 2021-10-20 | ||
| JP2021171587 | 2021-10-20 | ||
| JP2022083897A JP7603634B2 (ja) | 2021-06-22 | 2022-05-23 | エッチング方法及びプラズマ処理装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022083897A Division JP7603634B2 (ja) | 2021-06-22 | 2022-05-23 | エッチング方法及びプラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025029205A JP2025029205A (ja) | 2025-03-05 |
| JP2025029205A5 true JP2025029205A5 (https=) | 2025-05-16 |
Family
ID=94822738
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024215844A Pending JP2025029205A (ja) | 2021-06-22 | 2024-12-10 | エッチング方法及びプラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2025029205A (https=) |
-
2024
- 2024-12-10 JP JP2024215844A patent/JP2025029205A/ja active Pending
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