JP2025029205A - エッチング方法及びプラズマ処理装置 - Google Patents

エッチング方法及びプラズマ処理装置 Download PDF

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JP2025029205A
JP2025029205A JP2024215844A JP2024215844A JP2025029205A JP 2025029205 A JP2025029205 A JP 2025029205A JP 2024215844 A JP2024215844 A JP 2024215844A JP 2024215844 A JP2024215844 A JP 2024215844A JP 2025029205 A JP2025029205 A JP 2025029205A
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region
gas
tungsten
power
etching
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JP2025029205A5 (https=
Inventor
郁弥 高田
Fumiya Takata
正太 吉村
Shota Yoshimura
信也 森北
Shinya Morikita
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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JP2024215844A 2021-06-22 2024-12-10 エッチング方法及びプラズマ処理装置 Pending JP2025029205A (ja)

Applications Claiming Priority (5)

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JP2021102876 2021-06-22
JP2021102876 2021-06-22
JP2021171587 2021-10-20
JP2021171587 2021-10-20
JP2022083897A JP7603634B2 (ja) 2021-06-22 2022-05-23 エッチング方法及びプラズマ処理装置

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JP2022083897A Division JP7603634B2 (ja) 2021-06-22 2022-05-23 エッチング方法及びプラズマ処理装置

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JP2025029205A true JP2025029205A (ja) 2025-03-05
JP2025029205A5 JP2025029205A5 (https=) 2025-05-16

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JP2024215844A Pending JP2025029205A (ja) 2021-06-22 2024-12-10 エッチング方法及びプラズマ処理装置

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