JP2024541191A5 - - Google Patents
Info
- Publication number
- JP2024541191A5 JP2024541191A5 JP2024521776A JP2024521776A JP2024541191A5 JP 2024541191 A5 JP2024541191 A5 JP 2024541191A5 JP 2024521776 A JP2024521776 A JP 2024521776A JP 2024521776 A JP2024521776 A JP 2024521776A JP 2024541191 A5 JP2024541191 A5 JP 2024541191A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- negative photoresist
- photoresist composition
- composition
- groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163255974P | 2021-10-15 | 2021-10-15 | |
| US63/255,974 | 2021-10-15 | ||
| PCT/US2022/039032 WO2023064023A1 (en) | 2021-10-15 | 2022-08-01 | High refractive index photoresist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024541191A JP2024541191A (ja) | 2024-11-08 |
| JP2024541191A5 true JP2024541191A5 (cg-RX-API-DMAC10.html) | 2025-08-06 |
Family
ID=83049938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024521776A Pending JP2024541191A (ja) | 2021-10-15 | 2022-08-01 | 高屈折率フォトレジスト組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20240337943A1 (cg-RX-API-DMAC10.html) |
| EP (1) | EP4416553A1 (cg-RX-API-DMAC10.html) |
| JP (1) | JP2024541191A (cg-RX-API-DMAC10.html) |
| KR (1) | KR20240093557A (cg-RX-API-DMAC10.html) |
| CN (1) | CN118103773A (cg-RX-API-DMAC10.html) |
| TW (1) | TW202334286A (cg-RX-API-DMAC10.html) |
| WO (1) | WO2023064023A1 (cg-RX-API-DMAC10.html) |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100795109B1 (ko) | 2001-02-23 | 2008-01-17 | 후지필름 가부시키가이샤 | 포지티브 감광성 조성물 |
| US7756384B2 (en) | 2004-11-08 | 2010-07-13 | Dow Corning Corporation | Method for forming anti-reflective coating |
| JP5074488B2 (ja) * | 2006-06-28 | 2012-11-14 | ダウ・コーニング・コーポレイション | 電子求引官能性を有する塩基性添加剤を含むシルセスキオキサン樹脂システム |
| JP5310051B2 (ja) * | 2009-02-12 | 2013-10-09 | Ｊｓｒ株式会社 | 感放射線性組成物、マイクロレンズおよびその形成方法 |
| JP2012014021A (ja) * | 2010-07-01 | 2012-01-19 | Fujifilm Corp | 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、反射防止膜、絶縁膜、光学デバイス及び電子デバイス |
| US10597495B2 (en) * | 2016-02-19 | 2020-03-24 | Dow Silicones Corporation | Aged polymeric silsesquioxanes |
| JP7265356B2 (ja) | 2016-05-03 | 2023-04-26 | ダウ シリコーンズ コーポレーション | シルセスキオキサン樹脂及びオキサアミン組成物 |
| CN109415513B (zh) * | 2016-06-16 | 2022-02-25 | 美国陶氏有机硅公司 | 富含硅的倍半硅氧烷树脂 |
| TWI742160B (zh) * | 2016-09-30 | 2021-10-11 | 美商道康寧公司 | 橋接聚矽氧樹脂、膜、電子裝置及相關方法 |
| JP6886268B2 (ja) * | 2016-10-18 | 2021-06-16 | 株式会社カネカ | ネガ型感光性樹脂組成物、硬化物および積層体 |
| KR102557109B1 (ko) * | 2017-03-29 | 2023-07-20 | 도레이 카부시키가이샤 | 네가티브형 감광성 수지 조성물, 경화막, 경화막을 구비하는 소자 및 유기 el 디스플레이, 그리고 그의 제조 방법 |
| KR102432033B1 (ko) * | 2018-07-05 | 2022-08-12 | 도레이 카부시키가이샤 | 수지 조성물, 차광막, 차광막의 제조 방법 및 격벽 구비 기판 |
| JP7109565B2 (ja) * | 2018-09-25 | 2022-07-29 | 富士フイルム株式会社 | 遮光性組成物、硬化膜、遮光膜、固体撮像素子 |
-
2022
- 2022-08-01 EP EP22758337.4A patent/EP4416553A1/en active Pending
- 2022-08-01 US US18/575,890 patent/US20240337943A1/en active Pending
- 2022-08-01 CN CN202280068662.5A patent/CN118103773A/zh active Pending
- 2022-08-01 KR KR1020247015573A patent/KR20240093557A/ko active Pending
- 2022-08-01 JP JP2024521776A patent/JP2024541191A/ja active Pending
- 2022-08-01 WO PCT/US2022/039032 patent/WO2023064023A1/en not_active Ceased
- 2022-09-20 TW TW111135483A patent/TW202334286A/zh unknown
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