JP2023530260A5 - - Google Patents
Info
- Publication number
- JP2023530260A5 JP2023530260A5 JP2022575929A JP2022575929A JP2023530260A5 JP 2023530260 A5 JP2023530260 A5 JP 2023530260A5 JP 2022575929 A JP2022575929 A JP 2022575929A JP 2022575929 A JP2022575929 A JP 2022575929A JP 2023530260 A5 JP2023530260 A5 JP 2023530260A5
- Authority
- JP
- Japan
- Prior art keywords
- relief pattern
- filler material
- photoacid
- selected portion
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063037798P | 2020-06-11 | 2020-06-11 | |
| US63/037,798 | 2020-06-11 | ||
| US17/221,416 US11682559B2 (en) | 2020-06-11 | 2021-04-02 | Method to form narrow slot contacts |
| US17/221,416 | 2021-04-02 | ||
| PCT/US2021/030927 WO2021252107A1 (en) | 2020-06-11 | 2021-05-05 | Method to form narrow slot contacts |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023530260A JP2023530260A (ja) | 2023-07-14 |
| JP2023530260A5 true JP2023530260A5 (https=) | 2024-03-06 |
Family
ID=78825896
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022575929A Pending JP2023530260A (ja) | 2020-06-11 | 2021-05-05 | 幅狭スロット接点を形成する方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US11682559B2 (https=) |
| JP (1) | JP2023530260A (https=) |
| CN (1) | CN115868012B (https=) |
| TW (1) | TWI896676B (https=) |
| WO (1) | WO2021252107A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11682559B2 (en) * | 2020-06-11 | 2023-06-20 | Tokyo Electron Limited | Method to form narrow slot contacts |
| KR102839122B1 (ko) * | 2023-01-23 | 2025-07-28 | 닛산 가가쿠 가부시키가이샤 | 금속 산화물 레지스트 패턴 형성용 유기 수지 조성물 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5507380B2 (ja) * | 2010-02-23 | 2014-05-28 | 東京応化工業株式会社 | パターン形成方法 |
| JP5518575B2 (ja) * | 2010-05-27 | 2014-06-11 | 東京応化工業株式会社 | パターン形成方法 |
| US9851639B2 (en) * | 2012-03-31 | 2017-12-26 | International Business Machines Corporation | Photoacid generating polymers containing a urethane linkage for lithography |
| US20140225252A1 (en) * | 2013-02-12 | 2014-08-14 | Brewer Science Inc. | On-track reverse lithography to thin mask for fabrication of dark-field features |
| JP5790678B2 (ja) | 2013-02-15 | 2015-10-07 | 信越化学工業株式会社 | パターン形成方法 |
| US9291909B2 (en) * | 2013-05-17 | 2016-03-22 | Az Electronic Materials (Luxembourg) S.A.R.L. | Composition comprising a polymeric thermal acid generator and processes thereof |
| JP6003873B2 (ja) | 2013-11-28 | 2016-10-05 | 信越化学工業株式会社 | レジスト材料並びにこれを用いたパターン形成方法 |
| US9406526B2 (en) * | 2014-04-10 | 2016-08-02 | Tokyo Electron Limited | Method for patterning contact openings on a substrate |
| CN106662816B (zh) * | 2014-07-08 | 2020-10-23 | 东京毅力科创株式会社 | 负性显影剂相容性的光致抗蚀剂组合物及使用方法 |
| CN106249540A (zh) | 2015-06-03 | 2016-12-21 | 陶氏环球技术有限责任公司 | 图案处理方法 |
| US10061199B2 (en) * | 2015-06-24 | 2018-08-28 | Tokyo Electron Limited | Methods of forming a mask for substrate patterning |
| KR102634069B1 (ko) * | 2015-09-30 | 2024-02-05 | 도쿄엘렉트론가부시키가이샤 | 극자외선 리소그래피를 사용하여 기판을 패터닝하기 위한 방법 |
| JP6995873B2 (ja) * | 2017-10-19 | 2022-01-17 | 富士フイルム株式会社 | 回路基板の製造方法及びタッチパネルの製造方法 |
| US11079681B2 (en) * | 2018-11-21 | 2021-08-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography method for positive tone development |
| US11682559B2 (en) * | 2020-06-11 | 2023-06-20 | Tokyo Electron Limited | Method to form narrow slot contacts |
-
2021
- 2021-04-02 US US17/221,416 patent/US11682559B2/en active Active
- 2021-05-05 JP JP2022575929A patent/JP2023530260A/ja active Pending
- 2021-05-05 WO PCT/US2021/030927 patent/WO2021252107A1/en not_active Ceased
- 2021-05-05 CN CN202180039903.9A patent/CN115868012B/zh active Active
- 2021-06-07 TW TW110120553A patent/TWI896676B/zh active
-
2023
- 2023-05-05 US US18/312,650 patent/US12488989B2/en active Active
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