JP2023515488A5 - - Google Patents
Info
- Publication number
- JP2023515488A5 JP2023515488A5 JP2022549874A JP2022549874A JP2023515488A5 JP 2023515488 A5 JP2023515488 A5 JP 2023515488A5 JP 2022549874 A JP2022549874 A JP 2022549874A JP 2022549874 A JP2022549874 A JP 2022549874A JP 2023515488 A5 JP2023515488 A5 JP 2023515488A5
- Authority
- JP
- Japan
- Prior art keywords
- illumination
- intensity distribution
- distribution signal
- image
- illumination intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202062978969P | 2020-02-20 | 2020-02-20 | |
| US62/978,969 | 2020-02-20 | ||
| US17/110,856 US11293880B2 (en) | 2020-02-20 | 2020-12-03 | Method and apparatus for beam stabilization and reference correction for EUV inspection |
| US17/110,856 | 2020-12-03 | ||
| PCT/US2021/017306 WO2021167816A1 (en) | 2020-02-20 | 2021-02-10 | Method and apparatus for beam stabilization and reference correction for euv inspection |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023515488A JP2023515488A (ja) | 2023-04-13 |
| JP2023515488A5 true JP2023515488A5 (cg-RX-API-DMAC7.html) | 2023-11-13 |
| JP7451737B2 JP7451737B2 (ja) | 2024-03-18 |
Family
ID=77365209
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022549874A Active JP7451737B2 (ja) | 2020-02-20 | 2021-02-10 | Ｅｕｖ検査用ビーム安定化兼基準補正方法及び装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11293880B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP4090947B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP7451737B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR102644776B1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI845814B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2021167816A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7237872B2 (ja) * | 2020-02-14 | 2023-03-13 | 株式会社東芝 | 検査装置、検査方法、及びプログラム |
| JP7273748B2 (ja) * | 2020-02-28 | 2023-05-15 | 株式会社東芝 | 検査装置、検査方法、及びプログラム |
| KR20240018489A (ko) * | 2021-06-09 | 2024-02-13 | 에이에스엠엘 네델란즈 비.브이. | 애퍼처 아포디제이션을 갖는 구조적 조명을 이용한 레티클 입자 검출을 위한 검사 시스템 |
| JP7703426B2 (ja) * | 2021-11-16 | 2025-07-07 | 株式会社ニューフレアテクノロジー | マスク検査装置及びマスク検査方法 |
| US11852978B2 (en) | 2022-03-07 | 2023-12-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | EUV lithography system with 3D sensing and tunning modules |
| US20240271996A1 (en) * | 2023-02-09 | 2024-08-15 | Kla Corporation | Optical beam sensor with center transmissive cut-out |
| DE102024203350B4 (de) * | 2024-04-11 | 2025-12-24 | Carl Zeiss Smt Gmbh | Energie-Detektions-Baugruppe für ein Beleuchtungssystem eines Maskeninspektionssystems zum Einsatz mit EUV-Beleuchtungslicht |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6963395B2 (en) | 2001-07-09 | 2005-11-08 | The Regents Of The University Of California | Method and apparatus for inspecting an EUV mask blank |
| US6794671B2 (en) | 2002-07-17 | 2004-09-21 | Particle Sizing Systems, Inc. | Sensors and methods for high-sensitivity optical particle counting and sizing |
| JP2005241290A (ja) * | 2004-02-24 | 2005-09-08 | Toshiba Corp | 画像入力装置及び検査装置 |
| US7749666B2 (en) * | 2005-08-09 | 2010-07-06 | Asml Netherlands B.V. | System and method for measuring and analyzing lithographic parameters and determining optimal process corrections |
| JP5350121B2 (ja) * | 2008-09-11 | 2013-11-27 | 株式会社ニューフレアテクノロジー | パターン検査装置及びパターン検査方法 |
| KR101258344B1 (ko) | 2008-10-31 | 2013-04-30 | 칼 짜이스 에스엠티 게엠베하 | Ｅｕｖ 마이크로리소그래피용 조명 광학 기기 |
| US8553217B2 (en) | 2009-06-19 | 2013-10-08 | Kla-Tencor Corporation | EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers |
| EP2663897A4 (en) | 2011-01-11 | 2018-01-03 | KLA-Tencor Corporation | Apparatus for euv imaging and methods of using same |
| JP5676419B2 (ja) | 2011-11-24 | 2015-02-25 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法およびその装置 |
| DE102013204442A1 (de) | 2013-03-14 | 2014-10-02 | Carl Zeiss Smt Gmbh | Optischer Wellenleiter zur Führung von Beleuchtungslicht |
| JP2016526702A (ja) | 2013-06-17 | 2016-09-05 | パウル・シェラー・インスティトゥート | Ｅｕｖリソグラフィのアクティニックマスク検査用の走査型コヒーレント回折イメージング方法およびシステム |
| CN108873623B (zh) * | 2013-06-18 | 2021-04-06 | Asml荷兰有限公司 | 光刻方法和光刻系统 |
| KR102513021B1 (ko) * | 2016-05-12 | 2023-03-21 | 에이에스엠엘 네델란즈 비.브이. | 측정치 획득 방법, 프로세스 단계 수행 장치, 계측 장치, 디바이스 제조 방법 |
| US10769769B2 (en) * | 2016-07-01 | 2020-09-08 | Kla-Tencor Corporation | Dual mode inspector |
| US11243470B2 (en) | 2016-09-12 | 2022-02-08 | Asml Netherlands B.V. | Method and apparatus for deriving corrections, method and apparatus for determining a property of a structure, device manufacturing method |
| JP6249513B1 (ja) | 2017-03-27 | 2017-12-20 | レーザーテック株式会社 | 補正方法、補正装置及び検査装置 |
| US20190049861A1 (en) * | 2017-08-11 | 2019-02-14 | Asml Netherlands B.V. | Methods and Apparatus for Determining the Position of a Spot of Radiation, Inspection Apparatus, Device Manufacturing Method |
| JP6462843B1 (ja) | 2017-12-28 | 2019-01-30 | レーザーテック株式会社 | 検出方法、検査方法、検出装置及び検査装置 |
| US10796065B2 (en) * | 2018-06-21 | 2020-10-06 | Kla-Tencor Corporation | Hybrid design layout to identify optical proximity correction-related systematic defects |
| US11499924B2 (en) | 2019-06-03 | 2022-11-15 | KLA Corp. | Determining one or more characteristics of light in an optical system |
-
2020
- 2020-12-03 US US17/110,856 patent/US11293880B2/en active Active
-
2021
- 2021-02-10 WO PCT/US2021/017306 patent/WO2021167816A1/en not_active Ceased
- 2021-02-10 JP JP2022549874A patent/JP7451737B2/ja active Active
- 2021-02-10 EP EP21757813.7A patent/EP4090947B1/en active Active
- 2021-02-10 KR KR1020227029626A patent/KR102644776B1/ko active Active
- 2021-02-20 TW TW110105891A patent/TWI845814B/zh active
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