JP2023184577A5 - - Google Patents

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Publication number
JP2023184577A5
JP2023184577A5 JP2023179430A JP2023179430A JP2023184577A5 JP 2023184577 A5 JP2023184577 A5 JP 2023184577A5 JP 2023179430 A JP2023179430 A JP 2023179430A JP 2023179430 A JP2023179430 A JP 2023179430A JP 2023184577 A5 JP2023184577 A5 JP 2023184577A5
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JP
Japan
Prior art keywords
plane
less
single crystal
crystal substrate
main surface
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Pending
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JP2023179430A
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English (en)
Japanese (ja)
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JP2023184577A (ja
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Priority claimed from JP2021049332A external-priority patent/JP7704399B2/ja
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Priority to JP2023179430A priority Critical patent/JP2023184577A/ja
Publication of JP2023184577A publication Critical patent/JP2023184577A/ja
Publication of JP2023184577A5 publication Critical patent/JP2023184577A5/ja
Pending legal-status Critical Current

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JP2023179430A 2021-03-24 2023-10-18 Ga2O3系単結晶基板並びにGa2O3系単結晶基板の製造方法 Pending JP2023184577A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023179430A JP2023184577A (ja) 2021-03-24 2023-10-18 Ga2O3系単結晶基板並びにGa2O3系単結晶基板の製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021049332A JP7704399B2 (ja) 2021-03-24 2021-03-24 Ga2O3系単結晶基板並びにAlxGa(1-x)N系半導体積層体の製造方法
JP2023179430A JP2023184577A (ja) 2021-03-24 2023-10-18 Ga2O3系単結晶基板並びにGa2O3系単結晶基板の製造方法

Related Parent Applications (1)

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JP2021049332A Division JP7704399B2 (ja) 2021-03-24 2021-03-24 Ga2O3系単結晶基板並びにAlxGa(1-x)N系半導体積層体の製造方法

Publications (2)

Publication Number Publication Date
JP2023184577A JP2023184577A (ja) 2023-12-28
JP2023184577A5 true JP2023184577A5 (https=) 2024-03-27

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ID=83397419

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021049332A Active JP7704399B2 (ja) 2021-03-24 2021-03-24 Ga2O3系単結晶基板並びにAlxGa(1-x)N系半導体積層体の製造方法
JP2023179430A Pending JP2023184577A (ja) 2021-03-24 2023-10-18 Ga2O3系単結晶基板並びにGa2O3系単結晶基板の製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2021049332A Active JP7704399B2 (ja) 2021-03-24 2021-03-24 Ga2O3系単結晶基板並びにAlxGa(1-x)N系半導体積層体の製造方法

Country Status (5)

Country Link
US (1) US20240011192A1 (https=)
EP (1) EP4317547A4 (https=)
JP (2) JP7704399B2 (https=)
TW (1) TW202302934A (https=)
WO (1) WO2022202747A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025250905A1 (en) * 2024-05-31 2025-12-04 Luxium Solutions, Llc Apparatus and method for growth of gallium oxide crystal with an offcut

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000211993A (ja) 1999-01-22 2000-08-02 Mitsubishi Electric Corp 半導体ウェハの製造方法、半導体製造装置、および、半導体装置
KR100787272B1 (ko) * 2003-02-24 2007-12-20 각코호진 와세다다이가쿠 Ga2O3계 발광 소자 및 그 제조 방법
EP2221855A4 (en) * 2007-11-21 2013-08-07 Mitsubishi Chem Corp NITRIDE SEMICONDUCTOR AND NITRIDE SEMICONDUCTOR CRYSTAL GROWTH PROCESS
JP5051455B2 (ja) 2008-01-16 2012-10-17 日立電線株式会社 エピタキシャル成長用窒化物半導体基板の製造方法
JP5104830B2 (ja) * 2008-09-08 2012-12-19 住友電気工業株式会社 基板
JP5786179B2 (ja) 2010-03-12 2015-09-30 並木精密宝石株式会社 酸化ガリウム単結晶及びその製造方法
WO2012137781A1 (ja) 2011-04-08 2012-10-11 株式会社タムラ製作所 半導体積層体及びその製造方法、並びに半導体素子
US9461124B2 (en) * 2011-09-08 2016-10-04 Tamura Corporation Ga2O3 semiconductor element
JP5865440B2 (ja) * 2014-06-30 2016-02-17 株式会社タムラ製作所 β−Ga2O3系単結晶基板の製造方法
JP5747110B1 (ja) * 2014-06-30 2015-07-08 株式会社タムラ製作所 Ga2O3系単結晶基板
JP5749839B1 (ja) * 2014-06-30 2015-07-15 株式会社タムラ製作所 β−Ga2O3系単結晶基板
JP2017157725A (ja) 2016-03-02 2017-09-07 株式会社タムラ製作所 窒化物半導体テンプレート及びその製造方法、並びに紫外線led

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