JP2023034627A

JP2023034627A - 転写フィルム、導体パターンを有する積層体の製造方法

転写フィルム、導体パターンを有する積層体の製造方法 Download PDF

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Publication number: JP2023034627A
Authority: JP; Japan
Prior art keywords: photosensitive composition; composition layer; mass; layer; resin
Prior art date: 2021-08-31
Legal status : Pending

Application number

JP2021140953A

Other languages

English (en)

Japanese (ja)

Inventor

悠鬼塚

Yu Onizuka

Current Assignee

Fujifilm Corp

Original Assignee

Fujifilm Corp

Priority date

2021-08-31

Filing date

2021-08-31

Publication date

2023-03-13

2021-08-31 Application filed by Fujifilm Corp filed Critical Fujifilm Corp

2021-08-31 Priority to JP2021140953A priority Critical patent/JP2023034627A/ja

2022-08-26 Priority to TW111132191A priority patent/TW202311049A/zh

2022-08-29 Priority to KR1020220108045A priority patent/KR20230033612A/ko

2022-08-29 Priority to CN202211043699.0A priority patent/CN115729036A/zh

2023-03-13 Publication of JP2023034627A publication Critical patent/JP2023034627A/ja

Status Pending legal-status Critical Current

Links

238000000034 method Methods 0.000 title claims abstract description 124
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238000004519 manufacturing process Methods 0.000 title claims abstract description 41
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239000000203 mixture Substances 0.000 claims abstract description 218
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238000002834 transmittance Methods 0.000 claims abstract description 14
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238000007747 plating Methods 0.000 claims description 26
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239000000049 pigment Substances 0.000 description 65
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239000010949 copper Substances 0.000 description 21
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125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 9
238000006116 polymerization reaction Methods 0.000 description 9
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125000003118 aryl group Chemical group 0.000 description 8
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239000000654 additive Substances 0.000 description 7
238000003475 lamination Methods 0.000 description 7
150000002739 metals Chemical class 0.000 description 7
DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 7
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239000007787 solid Substances 0.000 description 7
DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 6
KFJDQPJLANOOOB-UHFFFAOYSA-N 2h-benzotriazole-4-carboxylic acid Chemical class OC(=O)C1=CC=CC2=NNN=C12 KFJDQPJLANOOOB-UHFFFAOYSA-N 0.000 description 6
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125000005529 alkyleneoxy group Chemical group 0.000 description 6
230000001588 bifunctional effect Effects 0.000 description 6
238000006243 chemical reaction Methods 0.000 description 6
229920001577 copolymer Polymers 0.000 description 6
239000004210 ether based solvent Substances 0.000 description 6
125000001153 fluoro group Chemical group F* 0.000 description 6
235000011187 glycerol Nutrition 0.000 description 6
125000005842 heteroatom Chemical group 0.000 description 6
125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
150000002596 lactones Chemical group 0.000 description 6
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
229910052753 mercury Inorganic materials 0.000 description 6
238000010526 radical polymerization reaction Methods 0.000 description 6
229910000029 sodium carbonate Inorganic materials 0.000 description 6
125000001424 substituent group Chemical group 0.000 description 6
WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
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150000001346 alkyl aryl ethers Chemical class 0.000 description 4
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JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical group C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 4
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150000004945 aromatic hydrocarbons Chemical group 0.000 description 3
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XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 3
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RHNJVKIVSXGYBD-UHFFFAOYSA-N 10-prop-2-enoyloxydecyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCCOC(=O)C=C RHNJVKIVSXGYBD-UHFFFAOYSA-N 0.000 description 2
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BIAWAXVRXKIUQB-UHFFFAOYSA-N 2-(2-phenylethenyl)pyridine Chemical class C=1C=CC=CC=1C=CC1=CC=CC=N1 BIAWAXVRXKIUQB-UHFFFAOYSA-N 0.000 description 2
QTUVQQKHBMGYEH-UHFFFAOYSA-N 2-(trichloromethyl)-1,3,5-triazine Chemical class ClC(Cl)(Cl)C1=NC=NC=N1 QTUVQQKHBMGYEH-UHFFFAOYSA-N 0.000 description 2
125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
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HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical group NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
102100033806 Alpha-protein kinase 3 Human genes 0.000 description 2
101710082399 Alpha-protein kinase 3 Proteins 0.000 description 2
KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical class C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 2
IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
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JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
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