JP2023032160A5 - - Google Patents

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Publication number
JP2023032160A5
JP2023032160A5 JP2021138109A JP2021138109A JP2023032160A5 JP 2023032160 A5 JP2023032160 A5 JP 2023032160A5 JP 2021138109 A JP2021138109 A JP 2021138109A JP 2021138109 A JP2021138109 A JP 2021138109A JP 2023032160 A5 JP2023032160 A5 JP 2023032160A5
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JP
Japan
Prior art keywords
temperature
temperature sensor
workpiece
region
area
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Application number
JP2021138109A
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English (en)
Japanese (ja)
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JP2023032160A (ja
JP7565252B2 (ja
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Priority claimed from JP2021138109A external-priority patent/JP7565252B2/ja
Priority to JP2021138109A priority Critical patent/JP7565252B2/ja
Priority to CN202210878151.1A priority patent/CN115722425B/zh
Priority to CN202311543732.0A priority patent/CN118268215A/zh
Priority to TW111127862A priority patent/TWI844060B/zh
Priority to KR1020220097343A priority patent/KR102752956B1/ko
Publication of JP2023032160A publication Critical patent/JP2023032160A/ja
Publication of JP2023032160A5 publication Critical patent/JP2023032160A5/ja
Publication of JP7565252B2 publication Critical patent/JP7565252B2/ja
Application granted granted Critical
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Anticipated expiration legal-status Critical

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JP2021138109A 2021-08-26 2021-08-26 加熱処理装置 Active JP7565252B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2021138109A JP7565252B2 (ja) 2021-08-26 2021-08-26 加熱処理装置
CN202210878151.1A CN115722425B (zh) 2021-08-26 2022-07-25 加热处理装置
CN202311543732.0A CN118268215A (zh) 2021-08-26 2022-07-25 加热处理装置
TW111127862A TWI844060B (zh) 2021-08-26 2022-07-26 加熱處理裝置
KR1020220097343A KR102752956B1 (ko) 2021-08-26 2022-08-04 가열 처리 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021138109A JP7565252B2 (ja) 2021-08-26 2021-08-26 加熱処理装置

Publications (3)

Publication Number Publication Date
JP2023032160A JP2023032160A (ja) 2023-03-09
JP2023032160A5 true JP2023032160A5 (https=) 2023-06-21
JP7565252B2 JP7565252B2 (ja) 2024-10-10

Family

ID=85292598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021138109A Active JP7565252B2 (ja) 2021-08-26 2021-08-26 加熱処理装置

Country Status (4)

Country Link
JP (1) JP7565252B2 (https=)
KR (1) KR102752956B1 (https=)
CN (2) CN115722425B (https=)
TW (1) TWI844060B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7465855B2 (ja) * 2021-09-27 2024-04-11 芝浦メカトロニクス株式会社 加熱処理装置、搬入搬出治具、および有機膜の形成方法
JP7761983B2 (ja) * 2023-03-22 2025-10-29 芝浦メカトロニクス株式会社 加熱処理装置
JP7751615B2 (ja) * 2023-09-26 2025-10-08 芝浦メカトロニクス株式会社 加熱処理装置
CN117524930B (zh) * 2023-11-07 2025-05-06 拓荆创益(沈阳)半导体设备有限公司 一种半导体腔室双加热盘的温度控制系统和方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251128A (ja) * 1985-04-30 1986-11-08 Toshiba Corp 半導体基板の熱処理方法および装置
JP3380988B2 (ja) 1993-04-21 2003-02-24 東京エレクトロン株式会社 熱処理装置
JP3831478B2 (ja) * 1997-05-14 2006-10-11 芝浦メカトロニクス株式会社 真空乾燥処理装置
JP4017276B2 (ja) * 1999-02-10 2007-12-05 大日本スクリーン製造株式会社 熱処理装置
US7037797B1 (en) 2000-03-17 2006-05-02 Mattson Technology, Inc. Localized heating and cooling of substrates
MY135074A (en) * 2001-08-27 2008-01-31 Mitsubishi Materials Corp Sensor mounting device and sensor
TWI268556B (en) * 2005-02-28 2006-12-11 Viatron Tech Inc System for heat treatment of semiconductor device
JP4988401B2 (ja) * 2007-03-29 2012-08-01 大日本スクリーン製造株式会社 基板熱処理装置
JP5029535B2 (ja) * 2007-10-12 2012-09-19 東京エレクトロン株式会社 熱処理装置、熱処理方法及び記憶媒体
CN102177407A (zh) * 2008-08-08 2011-09-07 芝浦机械电子株式会社 热处理装置及热处理方法
CN101712026B (zh) * 2009-11-17 2012-07-11 常州市超顺电子技术有限公司 涂胶铜箔焙烘箱
WO2014111622A1 (en) * 2013-01-18 2014-07-24 Feracitas Oy A method for improving an air circulation and a way for heating air in a glass tempering oven
CN105953540A (zh) * 2016-05-25 2016-09-21 刘明月 一种片状中药茯苓烘烤设备专用烘烤装置
JP7008727B2 (ja) 2017-12-15 2022-01-25 芝浦メカトロニクス株式会社 有機膜形成装置
KR102226624B1 (ko) * 2018-03-30 2021-03-12 시바우라 메카트로닉스 가부시끼가이샤 유기막 형성 장치, 및 유기막의 제조 방법
JP6871959B2 (ja) 2018-03-30 2021-05-19 芝浦メカトロニクス株式会社 有機膜形成装置、および有機膜の製造方法
CN110391132B (zh) * 2018-04-16 2023-05-16 芝浦机械电子株式会社 有机膜形成装置
JP6940541B2 (ja) * 2018-04-16 2021-09-29 芝浦メカトロニクス株式会社 有機膜形成装置

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