JP2021057581A5 - - Google Patents

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JP2021057581A5
JP2021057581A5 JP2020151354A JP2020151354A JP2021057581A5 JP 2021057581 A5 JP2021057581 A5 JP 2021057581A5 JP 2020151354 A JP2020151354 A JP 2020151354A JP 2020151354 A JP2020151354 A JP 2020151354A JP 2021057581 A5 JP2021057581 A5 JP 2021057581A5
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JP2020151354A
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Japanese (ja)
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JP2021057581A (ja
JP7499655B2 (ja
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Priority to KR1020200126252A priority Critical patent/KR102376830B1/ko
Priority to TW109133645A priority patent/TWI756850B/zh
Priority to CN202011050857.6A priority patent/CN112582303B/zh
Publication of JP2021057581A publication Critical patent/JP2021057581A/ja
Publication of JP2021057581A5 publication Critical patent/JP2021057581A5/ja
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JP2020151354A 2019-09-30 2020-09-09 基板処理装置 Active JP7499655B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020200126252A KR102376830B1 (ko) 2019-09-30 2020-09-28 기판 처리 장치
TW109133645A TWI756850B (zh) 2019-09-30 2020-09-28 基板處理裝置
CN202011050857.6A CN112582303B (zh) 2019-09-30 2020-09-29 基板处理装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019179326 2019-09-30
JP2019179326 2019-09-30

Publications (3)

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JP2021057581A JP2021057581A (ja) 2021-04-08
JP2021057581A5 true JP2021057581A5 (https=) 2023-02-16
JP7499655B2 JP7499655B2 (ja) 2024-06-14

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JP2020151354A Active JP7499655B2 (ja) 2019-09-30 2020-09-09 基板処理装置

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JP (1) JP7499655B2 (https=)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7814341B2 (ja) * 2023-03-31 2026-02-16 芝浦メカトロニクス株式会社 基板処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5300464B2 (ja) 2008-12-26 2013-09-25 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP5584517B2 (ja) 2010-05-12 2014-09-03 東京エレクトロン株式会社 プラズマ処理装置及び半導体装置の製造方法
JP5795917B2 (ja) 2010-09-27 2015-10-14 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP6742708B2 (ja) 2015-09-29 2020-08-19 芝浦メカトロニクス株式会社 基板処理方法

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