JP7565252B2 - 加熱処理装置 - Google Patents

加熱処理装置 Download PDF

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Publication number
JP7565252B2
JP7565252B2 JP2021138109A JP2021138109A JP7565252B2 JP 7565252 B2 JP7565252 B2 JP 7565252B2 JP 2021138109 A JP2021138109 A JP 2021138109A JP 2021138109 A JP2021138109 A JP 2021138109A JP 7565252 B2 JP7565252 B2 JP 7565252B2
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JP
Japan
Prior art keywords
workpiece
temperature
panel
processing section
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021138109A
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English (en)
Japanese (ja)
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JP2023032160A (ja
JP2023032160A5 (https=
Inventor
雅彦 黒澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Priority to JP2021138109A priority Critical patent/JP7565252B2/ja
Priority to CN202210878151.1A priority patent/CN115722425B/zh
Priority to CN202311543732.0A priority patent/CN118268215A/zh
Priority to TW111127862A priority patent/TWI844060B/zh
Priority to KR1020220097343A priority patent/KR102752956B1/ko
Publication of JP2023032160A publication Critical patent/JP2023032160A/ja
Publication of JP2023032160A5 publication Critical patent/JP2023032160A5/ja
Application granted granted Critical
Publication of JP7565252B2 publication Critical patent/JP7565252B2/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B05D3/0263—After-treatment with IR heaters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0466—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
    • B05D3/048—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas for cooling
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Chamber type furnaces specially adapted for treating semiconductor wafers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Furnace Details (AREA)
JP2021138109A 2021-08-26 2021-08-26 加熱処理装置 Active JP7565252B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2021138109A JP7565252B2 (ja) 2021-08-26 2021-08-26 加熱処理装置
CN202210878151.1A CN115722425B (zh) 2021-08-26 2022-07-25 加热处理装置
CN202311543732.0A CN118268215A (zh) 2021-08-26 2022-07-25 加热处理装置
TW111127862A TWI844060B (zh) 2021-08-26 2022-07-26 加熱處理裝置
KR1020220097343A KR102752956B1 (ko) 2021-08-26 2022-08-04 가열 처리 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021138109A JP7565252B2 (ja) 2021-08-26 2021-08-26 加熱処理装置

Publications (3)

Publication Number Publication Date
JP2023032160A JP2023032160A (ja) 2023-03-09
JP2023032160A5 JP2023032160A5 (https=) 2023-06-21
JP7565252B2 true JP7565252B2 (ja) 2024-10-10

Family

ID=85292598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021138109A Active JP7565252B2 (ja) 2021-08-26 2021-08-26 加熱処理装置

Country Status (4)

Country Link
JP (1) JP7565252B2 (https=)
KR (1) KR102752956B1 (https=)
CN (2) CN115722425B (https=)
TW (1) TWI844060B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7465855B2 (ja) * 2021-09-27 2024-04-11 芝浦メカトロニクス株式会社 加熱処理装置、搬入搬出治具、および有機膜の形成方法
JP7761983B2 (ja) * 2023-03-22 2025-10-29 芝浦メカトロニクス株式会社 加熱処理装置
JP7751615B2 (ja) * 2023-09-26 2025-10-08 芝浦メカトロニクス株式会社 加熱処理装置
CN117524930B (zh) * 2023-11-07 2025-05-06 拓荆创益(沈阳)半导体设备有限公司 一种半导体腔室双加热盘的温度控制系统和方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003526940A (ja) 2000-03-17 2003-09-09 マットソン サーマル プロダクツ インコーポレイテッド 基板の局部加熱および局部冷却
JP2019205991A (ja) 2018-03-30 2019-12-05 芝浦メカトロニクス株式会社 有機膜形成装置、および有機膜の製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251128A (ja) * 1985-04-30 1986-11-08 Toshiba Corp 半導体基板の熱処理方法および装置
JP3380988B2 (ja) 1993-04-21 2003-02-24 東京エレクトロン株式会社 熱処理装置
JP3831478B2 (ja) * 1997-05-14 2006-10-11 芝浦メカトロニクス株式会社 真空乾燥処理装置
JP4017276B2 (ja) * 1999-02-10 2007-12-05 大日本スクリーン製造株式会社 熱処理装置
MY135074A (en) * 2001-08-27 2008-01-31 Mitsubishi Materials Corp Sensor mounting device and sensor
TWI268556B (en) * 2005-02-28 2006-12-11 Viatron Tech Inc System for heat treatment of semiconductor device
JP4988401B2 (ja) * 2007-03-29 2012-08-01 大日本スクリーン製造株式会社 基板熱処理装置
JP5029535B2 (ja) * 2007-10-12 2012-09-19 東京エレクトロン株式会社 熱処理装置、熱処理方法及び記憶媒体
CN102177407A (zh) * 2008-08-08 2011-09-07 芝浦机械电子株式会社 热处理装置及热处理方法
CN101712026B (zh) * 2009-11-17 2012-07-11 常州市超顺电子技术有限公司 涂胶铜箔焙烘箱
WO2014111622A1 (en) * 2013-01-18 2014-07-24 Feracitas Oy A method for improving an air circulation and a way for heating air in a glass tempering oven
CN105953540A (zh) * 2016-05-25 2016-09-21 刘明月 一种片状中药茯苓烘烤设备专用烘烤装置
JP7008727B2 (ja) 2017-12-15 2022-01-25 芝浦メカトロニクス株式会社 有機膜形成装置
KR102226624B1 (ko) * 2018-03-30 2021-03-12 시바우라 메카트로닉스 가부시끼가이샤 유기막 형성 장치, 및 유기막의 제조 방법
CN110391132B (zh) * 2018-04-16 2023-05-16 芝浦机械电子株式会社 有机膜形成装置
JP6940541B2 (ja) * 2018-04-16 2021-09-29 芝浦メカトロニクス株式会社 有機膜形成装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003526940A (ja) 2000-03-17 2003-09-09 マットソン サーマル プロダクツ インコーポレイテッド 基板の局部加熱および局部冷却
JP2019205991A (ja) 2018-03-30 2019-12-05 芝浦メカトロニクス株式会社 有機膜形成装置、および有機膜の製造方法

Also Published As

Publication number Publication date
CN118268215A (zh) 2024-07-02
CN115722425B (zh) 2024-01-23
JP2023032160A (ja) 2023-03-09
KR102752956B1 (ko) 2025-01-09
TWI844060B (zh) 2024-06-01
CN115722425A (zh) 2023-03-03
TW202310671A (zh) 2023-03-01
KR20230031137A (ko) 2023-03-07

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