JP2022538095A - 高記憶密度化3次元フラッシュメモリデバイス - Google Patents
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- 239000000758 substrate Substances 0.000 claims abstract description 48
- 239000004065 semiconductor Substances 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims abstract description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 18
- 229910052710 silicon Inorganic materials 0.000 claims description 18
- 239000010703 silicon Substances 0.000 claims description 18
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 6
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- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
10 基板
111 垂直NORストリング
112 グローバルソース線 (GSL)、信号ライン
113 ワード線(WL)
114 グローバルビット線(GBL)、信号ライン
200 基板
206 柱身バイアスソース
211 ビットラインアクセス選択トランジスタ
223 ワード線
256 コンタクト
257 コンタクト
270 垂直NORストリングのTFT
310 絶縁分離
314-0~314-7 グローバルビット線(GBL)
320、320a、320b チャネルブレーカ
323p ワード線スタック
334 電荷蓄積素子
354a~354d ローカルビット線(LBL)
355、355a~355d ローカルソース線(LSL)
356 チャネル領域、環状シリコンチャネル
356a、356b、356-1~356-8 チャネル領域
Claims (20)
- 十分な平坦面を有する基板と、
前記基板上方に配置された半導体材料の複数の活性円柱であって、前記複数の活性円柱の各々が、前記基板の前記平坦面に直交する第1の方向に沿って延在し、前記複数の活性円柱が、2次元のアレイに配置されており、前記複数の活性円柱の各々が、前記第1の方向に沿って延在する少なくとも2つのローカルビット線と少なくとも1つのローカルソース線とを備える、複数の活性円柱と、
前記少なくとも2つのローカルビット線のうちの第1のローカルビット線と、前記少なくとも1つのローカルソース線との間の第1のチャネル領域と、
前記少なくとも2つのローカルビット線のうちの第2のローカルビット線と、前記少なくとも1つのローカルソース線との間の第2のチャネル領域と、
前記複数の活性円柱の周りを覆っているワード線スタックと、
前記ワード線スタックと前記複数の活性円柱の各々との間に配置された電荷蓄積要素と、を含む、3次元フラッシュメモリデバイス。 - 前記ワード線スタックが、前記基板の前記平坦面に平行な第2の方向に沿って延在する、請求項1に記載の3次元フラッシュメモリデバイス。
- 前記少なくとも2つのローカルビット線が、2つのグローバルビット線にそれぞれ電気的に結合されている、請求項2に記載の3次元フラッシュメモリデバイス。
- 前記2つのグローバルビット線が、前記第2の方向に平行でなく、前記基板の前記平坦面に平行な第3の方向に沿って延在する、請求項3に記載の3次元フラッシュメモリデバイス。
- 前記2つのグローバルビット線の各々が、ビットラインアクセス選択トランジスタに電気的に結合されており、前記ビットラインアクセス選択トランジスタが、前記2つのグローバルビット線の各々を前記少なくとも2つのローカルビット線の各々に接続する、請求項3に記載の3次元フラッシュメモリデバイス。
- 前記電荷蓄積要素が、電荷捕捉層を含む、請求項1に記載の3次元フラッシュメモリデバイス。
- 前記電荷捕捉層が、窒化シリコンを含む、請求項6に記載の3次元フラッシュメモリデバイス。
- 前記第1のチャネル領域を前記第2のチャネル領域から分離する、チャネルブレーカをさらに含む、請求項1に記載の3次元フラッシュメモリデバイス。
- 前記複数の活性円柱が、互い違いに配設されている、請求項1に記載の3次元フラッシュメモリデバイス。
- 前記基板が、シリコン基板を含む、請求項1に記載の3次元フラッシュメモリデバイス。
- 十分な平坦面を有する基板と、
前記基板上方に配置された半導体材料の複数の活性円柱であって、前記複数の活性円柱の各々が、前記基板の前記平坦面に直交する第1の方向に沿って延在し、前記複数の活性円柱が、2次元のアレイに配置されており、前記複数の活性円柱の各々は、前記第1の方向に沿って延在する、複数のローカルビット線および複数のローカルソース線を備える、複数の活性円柱と、
前記複数のローカルビット線と複数のローカルソース線との間の複数のチャネル領域と、
前記複数の活性円柱の周りを覆っているワード線スタックと、
前記ワード線スタックと前記複数の活性円柱の各々との間に配置された電荷蓄積要素と、を含む、3次元フラッシュメモリデバイス。 - 前記ワード線スタックが、前記基板の前記平坦面に平行な第2の方向に沿って延在する、請求項11に記載の3次元フラッシュメモリデバイス。
- 前記複数のローカルビット線が、複数のグローバルビット線にそれぞれ電気的に結合されている、請求項12に記載の3次元フラッシュメモリデバイス。
- 前記複数のグローバルビット線が、前記第2の方向に平行でなく、前記基板の前記平坦面に平行な第3の方向に沿って延在する、請求項13に記載の3次元フラッシュメモリデバイス。
- 前記複数のグローバルビット線の各々が、ビットラインアクセス選択トランジスタに電気的に結合されており、前記ビットラインアクセス選択トランジスタが、前記複数のグローバルビット線の各々を前記複数のローカルビット線の各々に接続する、請求項13に記載の3次元フラッシュメモリデバイス。
- 前記電荷蓄積要素が、電荷捕捉層を含む、請求項11に記載の3次元フラッシュメモリデバイス。
- 前記電荷捕捉層が、窒化シリコンを含む、請求項16に記載の3次元フラッシュメモリデバイス。
- 前記複数のローカルビット線のうちの2つの間のチャネルブレーカをさらに備える、請求項11に記載の3次元フラッシュメモリデバイス。
- 前記複数の活性円柱が、互い違いに配設されている、請求項11に記載の3次元フラッシュメモリデバイス。
- 前記基板が、シリコン基板を含む、請求項11に記載の3次元フラッシュメモリデバイス。
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US20170148517A1 (en) * | 2015-11-25 | 2017-05-25 | Eli Harari | Three-dimensional vertical nor flash thin film transistor strings |
WO2017091338A1 (en) * | 2015-11-25 | 2017-06-01 | Eli Harari | Three-dimensional vertical nor flash thin film transistor strings |
JP2019504479A (ja) * | 2015-11-25 | 2019-02-14 | サンライズ メモリー コーポレイション | 3次元垂直norフラッシュ薄膜トランジスタストリング |
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US20200411539A1 (en) | 2020-12-31 |
WO2020258246A1 (en) | 2020-12-30 |
CN111613623A (zh) | 2020-09-01 |
EP3963628A1 (en) | 2022-03-09 |
CN111613623B (zh) | 2021-02-19 |
EP3963628A4 (en) | 2022-12-14 |
TW202101679A (zh) | 2021-01-01 |
CN110520990A (zh) | 2019-11-29 |
KR20220010027A (ko) | 2022-01-25 |
JP7325552B2 (ja) | 2023-08-14 |
US11211400B2 (en) | 2021-12-28 |
TWI725648B (zh) | 2021-04-21 |
US20220045099A1 (en) | 2022-02-10 |
US11956962B2 (en) | 2024-04-09 |
EP3963628B1 (en) | 2023-12-06 |
CN110520990B (zh) | 2020-05-22 |
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