JP2022505064A - テレセントリック照明を有するマルチビーム電子特性評価ツール - Google Patents

テレセントリック照明を有するマルチビーム電子特性評価ツール Download PDF

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Publication number
JP2022505064A
JP2022505064A JP2021520961A JP2021520961A JP2022505064A JP 2022505064 A JP2022505064 A JP 2022505064A JP 2021520961 A JP2021520961 A JP 2021520961A JP 2021520961 A JP2021520961 A JP 2021520961A JP 2022505064 A JP2022505064 A JP 2022505064A
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JP
Japan
Prior art keywords
lens
lens element
assembly
electron
grid
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Pending
Application number
JP2021520961A
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English (en)
Japanese (ja)
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JPWO2020081277A5 (https=
JP2022505064A5 (https=
Inventor
アラン ディー ブロディー
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KLA Corp
Original Assignee
KLA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Corp filed Critical KLA Corp
Publication of JP2022505064A publication Critical patent/JP2022505064A/ja
Publication of JPWO2020081277A5 publication Critical patent/JPWO2020081277A5/ja
Publication of JP2022505064A5 publication Critical patent/JP2022505064A5/ja
Priority to JP2023132058A priority Critical patent/JP7587649B2/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04928—Telecentric systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/121—Lenses electrostatic characterised by shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2021520961A 2018-10-17 2019-10-08 テレセントリック照明を有するマルチビーム電子特性評価ツール Pending JP2022505064A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023132058A JP7587649B2 (ja) 2018-10-17 2023-08-14 テレセントリック照明を有するマルチビーム電子特性評価ツール

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/163,263 2018-10-17
US16/163,263 US11373838B2 (en) 2018-10-17 2018-10-17 Multi-beam electron characterization tool with telecentric illumination
PCT/US2019/055077 WO2020081277A1 (en) 2018-10-17 2019-10-08 Multi-beam electron characterization tool with telecentric illumination

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023132058A Division JP7587649B2 (ja) 2018-10-17 2023-08-14 テレセントリック照明を有するマルチビーム電子特性評価ツール

Publications (3)

Publication Number Publication Date
JP2022505064A true JP2022505064A (ja) 2022-01-14
JPWO2020081277A5 JPWO2020081277A5 (https=) 2022-10-11
JP2022505064A5 JP2022505064A5 (https=) 2022-10-11

Family

ID=70279226

Family Applications (2)

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JP2021520961A Pending JP2022505064A (ja) 2018-10-17 2019-10-08 テレセントリック照明を有するマルチビーム電子特性評価ツール
JP2023132058A Active JP7587649B2 (ja) 2018-10-17 2023-08-14 テレセントリック照明を有するマルチビーム電子特性評価ツール

Family Applications After (1)

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JP2023132058A Active JP7587649B2 (ja) 2018-10-17 2023-08-14 テレセントリック照明を有するマルチビーム電子特性評価ツール

Country Status (7)

Country Link
US (1) US11373838B2 (https=)
EP (1) EP3853880A4 (https=)
JP (2) JP2022505064A (https=)
KR (1) KR102480545B1 (https=)
CN (1) CN112805803B (https=)
TW (1) TWI799656B (https=)
WO (1) WO2020081277A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11638938B2 (en) 2019-06-10 2023-05-02 Kla Corporation In situ process chamber chuck cleaning by cleaning substrate
US11607716B1 (en) 2020-06-23 2023-03-21 Kla Corporation Systems and methods for chuck cleaning
JP7689866B2 (ja) * 2021-05-25 2025-06-09 株式会社ミツトヨ 顕微鏡ユニット
JP2023046921A (ja) * 2021-09-24 2023-04-05 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置、マルチ電子ビーム検査装置、及びマルチ電子ビーム画像取得方法
US11651934B2 (en) 2021-09-30 2023-05-16 Kla Corporation Systems and methods of creating multiple electron beams

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009032691A (ja) * 2007-07-24 2009-02-12 Ims Nanofabrication Ag マルチビーム源
JP2009507351A (ja) * 2005-09-06 2009-02-19 カール・ツァイス・エスエムティー・アーゲー 粒子光学部品
JP2013196951A (ja) * 2012-03-21 2013-09-30 Hitachi High-Technologies Corp 電子線応用装置およびレンズアレイ
JP2013236053A (ja) * 2012-04-13 2013-11-21 Canon Inc 荷電粒子光学系、描画装置及び物品の製造方法
US20170243717A1 (en) * 2014-09-04 2017-08-24 Technische Universiteit Delft Multi electron beam inspection apparatus
US20180068825A1 (en) * 2016-09-08 2018-03-08 Kla-Tencor Corporation Apparatus and Method for Correcting Arrayed Astigmatism in a Multi-Column Scanning Electron Microscopy System

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1134769B (de) * 1959-08-22 1962-08-16 Zeiss Carl Fa Vorrichtung zur Kompensation des OEffnungsfehlers einer rotations-symmetrischen, raumladungsfreien elektronenoptischen Linse
NL8200691A (nl) 1982-02-22 1983-09-16 Philips Nv Kathodestraalbuis.
NL8400841A (nl) * 1984-03-16 1985-10-16 Philips Nv Kathodestraalbuis.
US6333508B1 (en) 1999-10-07 2001-12-25 Lucent Technologies, Inc. Illumination system for electron beam lithography tool
JP2001168016A (ja) 1999-12-13 2001-06-22 Canon Inc 荷電粒子線露光装置と露光システム及びそれらの制御方法及びデバイス製造方法
KR101068607B1 (ko) * 2003-03-10 2011-09-30 마퍼 리쏘그라피 아이피 비.브이. 복수 개의 빔렛 발생 장치
US7539340B2 (en) * 2003-04-25 2009-05-26 Topcon Corporation Apparatus and method for three-dimensional coordinate measurement
JP2005174568A (ja) 2003-12-08 2005-06-30 Ebara Corp 対物レンズ、電子線装置及びこれらを用いたデバイス製造方法
US9153413B2 (en) * 2007-02-22 2015-10-06 Applied Materials Israel, Ltd. Multi-beam scanning electron beam device and methods of using the same
JP5268170B2 (ja) 2008-04-15 2013-08-21 マッパー・リソグラフィー・アイピー・ビー．ブイ． 投影レンズ構成体
DE102009008063A1 (de) * 2009-02-09 2010-08-19 Carl Zeiss Nts Gmbh Teilchenstrahlsystem
US8294117B2 (en) 2009-09-18 2012-10-23 Mapper Lithography Ip B.V. Multiple beam charged particle optical system
WO2012091116A1 (ja) * 2010-12-28 2012-07-05 積水化学工業株式会社 合わせガラス用中間膜及び合わせガラス
JP6116303B2 (ja) * 2013-03-25 2017-04-19 株式会社日立ハイテクサイエンス 集束イオンビーム装置
US20160033879A1 (en) * 2014-07-30 2016-02-04 GlobalFoundries, Inc. Methods and controllers for controlling focus of ultraviolet light from a lithographic imaging system, and apparatuses for forming an integrated circuit employing the same
TWI722855B (zh) * 2015-03-24 2021-03-21 美商克萊譚克公司 用於具有改良之影像光束穩定性及詢問之帶電粒子顯微鏡之方法及系統
WO2016182948A1 (en) * 2015-05-08 2016-11-17 Kla-Tencor Corporation Method and system for aberration correction in electron beam system
KR101725506B1 (ko) 2015-07-20 2017-04-12 한국표준과학연구원 시료의 광학 이미지를 얻을 수 있는 주사전자현미경
US10366862B2 (en) 2015-09-21 2019-07-30 KLA-Tencor Corporaton Method and system for noise mitigation in a multi-beam scanning electron microscopy system
US10325753B2 (en) 2015-09-23 2019-06-18 Kla Tencor Corporation Method and system for focus adjustment of a multi-beam scanning electron microscopy system
US9892885B2 (en) 2016-03-24 2018-02-13 Kla-Tencor Corporation System and method for drift compensation on an electron beam based characterization tool
US10840056B2 (en) 2017-02-03 2020-11-17 Kla Corporation Multi-column scanning electron microscopy system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009507351A (ja) * 2005-09-06 2009-02-19 カール・ツァイス・エスエムティー・アーゲー 粒子光学部品
JP2009032691A (ja) * 2007-07-24 2009-02-12 Ims Nanofabrication Ag マルチビーム源
JP2013196951A (ja) * 2012-03-21 2013-09-30 Hitachi High-Technologies Corp 電子線応用装置およびレンズアレイ
JP2013236053A (ja) * 2012-04-13 2013-11-21 Canon Inc 荷電粒子光学系、描画装置及び物品の製造方法
US20170243717A1 (en) * 2014-09-04 2017-08-24 Technische Universiteit Delft Multi electron beam inspection apparatus
US20180068825A1 (en) * 2016-09-08 2018-03-08 Kla-Tencor Corporation Apparatus and Method for Correcting Arrayed Astigmatism in a Multi-Column Scanning Electron Microscopy System

Also Published As

Publication number Publication date
JP2023138870A (ja) 2023-10-02
US20200126752A1 (en) 2020-04-23
US11373838B2 (en) 2022-06-28
JP7587649B2 (ja) 2024-11-20
EP3853880A1 (en) 2021-07-28
TW202025200A (zh) 2020-07-01
TWI799656B (zh) 2023-04-21
CN112805803A (zh) 2021-05-14
KR102480545B1 (ko) 2022-12-22
EP3853880A4 (en) 2022-10-26
KR20210060644A (ko) 2021-05-26
WO2020081277A1 (en) 2020-04-23
CN112805803B (zh) 2024-06-21

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