CN112805803B - 具有远心照明的多束电子特性工具 - Google Patents
具有远心照明的多束电子特性工具 Download PDFInfo
- Publication number
- CN112805803B CN112805803B CN201980065139.5A CN201980065139A CN112805803B CN 112805803 B CN112805803 B CN 112805803B CN 201980065139 A CN201980065139 A CN 201980065139A CN 112805803 B CN112805803 B CN 112805803B
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- China
- Prior art keywords
- lens
- electron
- lens element
- assembly
- grid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/049—Focusing means
- H01J2237/0492—Lens systems
- H01J2237/04928—Telecentric systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/12—Lenses electrostatic
- H01J2237/121—Lenses electrostatic characterised by shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31749—Focused ion beam
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/163,263 | 2018-10-17 | ||
| US16/163,263 US11373838B2 (en) | 2018-10-17 | 2018-10-17 | Multi-beam electron characterization tool with telecentric illumination |
| PCT/US2019/055077 WO2020081277A1 (en) | 2018-10-17 | 2019-10-08 | Multi-beam electron characterization tool with telecentric illumination |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112805803A CN112805803A (zh) | 2021-05-14 |
| CN112805803B true CN112805803B (zh) | 2024-06-21 |
Family
ID=70279226
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201980065139.5A Active CN112805803B (zh) | 2018-10-17 | 2019-10-08 | 具有远心照明的多束电子特性工具 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11373838B2 (https=) |
| EP (1) | EP3853880A4 (https=) |
| JP (2) | JP2022505064A (https=) |
| KR (1) | KR102480545B1 (https=) |
| CN (1) | CN112805803B (https=) |
| TW (1) | TWI799656B (https=) |
| WO (1) | WO2020081277A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11638938B2 (en) | 2019-06-10 | 2023-05-02 | Kla Corporation | In situ process chamber chuck cleaning by cleaning substrate |
| US11607716B1 (en) | 2020-06-23 | 2023-03-21 | Kla Corporation | Systems and methods for chuck cleaning |
| JP7689866B2 (ja) * | 2021-05-25 | 2025-06-09 | 株式会社ミツトヨ | 顕微鏡ユニット |
| JP2023046921A (ja) * | 2021-09-24 | 2023-04-05 | 株式会社ニューフレアテクノロジー | マルチ電子ビーム画像取得装置、マルチ電子ビーム検査装置、及びマルチ電子ビーム画像取得方法 |
| US11651934B2 (en) | 2021-09-30 | 2023-05-16 | Kla Corporation | Systems and methods of creating multiple electron beams |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1134769B (de) * | 1959-08-22 | 1962-08-16 | Zeiss Carl Fa | Vorrichtung zur Kompensation des OEffnungsfehlers einer rotations-symmetrischen, raumladungsfreien elektronenoptischen Linse |
| NL8200691A (nl) | 1982-02-22 | 1983-09-16 | Philips Nv | Kathodestraalbuis. |
| NL8400841A (nl) * | 1984-03-16 | 1985-10-16 | Philips Nv | Kathodestraalbuis. |
| US6333508B1 (en) | 1999-10-07 | 2001-12-25 | Lucent Technologies, Inc. | Illumination system for electron beam lithography tool |
| JP2001168016A (ja) | 1999-12-13 | 2001-06-22 | Canon Inc | 荷電粒子線露光装置と露光システム及びそれらの制御方法及びデバイス製造方法 |
| KR101068607B1 (ko) * | 2003-03-10 | 2011-09-30 | 마퍼 리쏘그라피 아이피 비.브이. | 복수 개의 빔렛 발생 장치 |
| US7539340B2 (en) * | 2003-04-25 | 2009-05-26 | Topcon Corporation | Apparatus and method for three-dimensional coordinate measurement |
| JP2005174568A (ja) | 2003-12-08 | 2005-06-30 | Ebara Corp | 対物レンズ、電子線装置及びこれらを用いたデバイス製造方法 |
| JP5663717B2 (ja) * | 2005-09-06 | 2015-02-04 | カール ツァイス マイクロスコピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ Ｇｍｂｈ | 荷電粒子システム |
| US9153413B2 (en) * | 2007-02-22 | 2015-10-06 | Applied Materials Israel, Ltd. | Multi-beam scanning electron beam device and methods of using the same |
| EP2019415B1 (en) * | 2007-07-24 | 2016-05-11 | IMS Nanofabrication AG | Multi-beam source |
| JP5268170B2 (ja) | 2008-04-15 | 2013-08-21 | マッパー・リソグラフィー・アイピー・ビー．ブイ． | 投影レンズ構成体 |
| DE102009008063A1 (de) * | 2009-02-09 | 2010-08-19 | Carl Zeiss Nts Gmbh | Teilchenstrahlsystem |
| US8294117B2 (en) | 2009-09-18 | 2012-10-23 | Mapper Lithography Ip B.V. | Multiple beam charged particle optical system |
| WO2012091116A1 (ja) * | 2010-12-28 | 2012-07-05 | 積水化学工業株式会社 | 合わせガラス用中間膜及び合わせガラス |
| JP5886663B2 (ja) * | 2012-03-21 | 2016-03-16 | 株式会社日立ハイテクノロジーズ | 電子線応用装置およびレンズアレイ |
| JP2013236053A (ja) * | 2012-04-13 | 2013-11-21 | Canon Inc | 荷電粒子光学系、描画装置及び物品の製造方法 |
| JP6116303B2 (ja) * | 2013-03-25 | 2017-04-19 | 株式会社日立ハイテクサイエンス | 集束イオンビーム装置 |
| US20160033879A1 (en) * | 2014-07-30 | 2016-02-04 | GlobalFoundries, Inc. | Methods and controllers for controlling focus of ultraviolet light from a lithographic imaging system, and apparatuses for forming an integrated circuit employing the same |
| NL2013411B1 (en) * | 2014-09-04 | 2016-09-27 | Univ Delft Tech | Multi electron beam inspection apparatus. |
| TWI722855B (zh) * | 2015-03-24 | 2021-03-21 | 美商克萊譚克公司 | 用於具有改良之影像光束穩定性及詢問之帶電粒子顯微鏡之方法及系統 |
| WO2016182948A1 (en) * | 2015-05-08 | 2016-11-17 | Kla-Tencor Corporation | Method and system for aberration correction in electron beam system |
| KR101725506B1 (ko) | 2015-07-20 | 2017-04-12 | 한국표준과학연구원 | 시료의 광학 이미지를 얻을 수 있는 주사전자현미경 |
| US10366862B2 (en) | 2015-09-21 | 2019-07-30 | KLA-Tencor Corporaton | Method and system for noise mitigation in a multi-beam scanning electron microscopy system |
| US10325753B2 (en) | 2015-09-23 | 2019-06-18 | Kla Tencor Corporation | Method and system for focus adjustment of a multi-beam scanning electron microscopy system |
| US9892885B2 (en) | 2016-03-24 | 2018-02-13 | Kla-Tencor Corporation | System and method for drift compensation on an electron beam based characterization tool |
| US10497536B2 (en) * | 2016-09-08 | 2019-12-03 | Rockwell Collins, Inc. | Apparatus and method for correcting arrayed astigmatism in a multi-column scanning electron microscopy system |
| US10840056B2 (en) | 2017-02-03 | 2020-11-17 | Kla Corporation | Multi-column scanning electron microscopy system |
-
2018
- 2018-10-17 US US16/163,263 patent/US11373838B2/en active Active
-
2019
- 2019-10-08 KR KR1020217014594A patent/KR102480545B1/ko active Active
- 2019-10-08 CN CN201980065139.5A patent/CN112805803B/zh active Active
- 2019-10-08 WO PCT/US2019/055077 patent/WO2020081277A1/en not_active Ceased
- 2019-10-08 EP EP19873602.7A patent/EP3853880A4/en active Pending
- 2019-10-08 JP JP2021520961A patent/JP2022505064A/ja active Pending
- 2019-10-16 TW TW108137245A patent/TWI799656B/zh active
-
2023
- 2023-08-14 JP JP2023132058A patent/JP7587649B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023138870A (ja) | 2023-10-02 |
| US20200126752A1 (en) | 2020-04-23 |
| US11373838B2 (en) | 2022-06-28 |
| JP7587649B2 (ja) | 2024-11-20 |
| EP3853880A1 (en) | 2021-07-28 |
| JP2022505064A (ja) | 2022-01-14 |
| TW202025200A (zh) | 2020-07-01 |
| TWI799656B (zh) | 2023-04-21 |
| CN112805803A (zh) | 2021-05-14 |
| KR102480545B1 (ko) | 2022-12-22 |
| EP3853880A4 (en) | 2022-10-26 |
| KR20210060644A (ko) | 2021-05-26 |
| WO2020081277A1 (en) | 2020-04-23 |
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Legal Events
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |