TWI799656B - 多束掃描電子顯微鏡裝置、多束電子源及用於多束操作之方法 - Google Patents

多束掃描電子顯微鏡裝置、多束電子源及用於多束操作之方法 Download PDF

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Publication number
TWI799656B
TWI799656B TW108137245A TW108137245A TWI799656B TW I799656 B TWI799656 B TW I799656B TW 108137245 A TW108137245 A TW 108137245A TW 108137245 A TW108137245 A TW 108137245A TW I799656 B TWI799656 B TW I799656B
Authority
TW
Taiwan
Prior art keywords
lens
electron
lens element
assembly
grid
Prior art date
Application number
TW108137245A
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English (en)
Chinese (zh)
Other versions
TW202025200A (zh
Inventor
艾倫 Ｄ 布魯迪
Original Assignee
美商科磊股份有限公司
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Application filed by 美商科磊股份有限公司 filed Critical 美商科磊股份有限公司
Publication of TW202025200A publication Critical patent/TW202025200A/zh
Application granted granted Critical
Publication of TWI799656B publication Critical patent/TWI799656B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04928—Telecentric systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/121—Lenses electrostatic characterised by shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
TW108137245A 2018-10-17 2019-10-16 多束掃描電子顯微鏡裝置、多束電子源及用於多束操作之方法 TWI799656B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16/163,263 2018-10-17
US16/163,263 US11373838B2 (en) 2018-10-17 2018-10-17 Multi-beam electron characterization tool with telecentric illumination

Publications (2)

Publication Number Publication Date
TW202025200A TW202025200A (zh) 2020-07-01
TWI799656B true TWI799656B (zh) 2023-04-21

Family

ID=70279226

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108137245A TWI799656B (zh) 2018-10-17 2019-10-16 多束掃描電子顯微鏡裝置、多束電子源及用於多束操作之方法

Country Status (7)

Country Link
US (1) US11373838B2 (https=)
EP (1) EP3853880A4 (https=)
JP (2) JP2022505064A (https=)
KR (1) KR102480545B1 (https=)
CN (1) CN112805803B (https=)
TW (1) TWI799656B (https=)
WO (1) WO2020081277A1 (https=)

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US11638938B2 (en) 2019-06-10 2023-05-02 Kla Corporation In situ process chamber chuck cleaning by cleaning substrate
US11607716B1 (en) 2020-06-23 2023-03-21 Kla Corporation Systems and methods for chuck cleaning
JP7689866B2 (ja) * 2021-05-25 2025-06-09 株式会社ミツトヨ 顕微鏡ユニット
JP2023046921A (ja) * 2021-09-24 2023-04-05 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置、マルチ電子ビーム検査装置、及びマルチ電子ビーム画像取得方法
US11651934B2 (en) 2021-09-30 2023-05-16 Kla Corporation Systems and methods of creating multiple electron beams

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US20100320382A1 (en) * 2007-02-22 2010-12-23 Applied Materials Israel, Ltd. High throughput sem tool
US20130273378A1 (en) * 2010-12-28 2013-10-17 Sekisui Chemical Co., Ltd. Interlayer for laminated glass and laminated glass
CN105319867A (zh) * 2014-07-30 2016-02-10 格罗方德半导体公司 控制紫外光的焦点的方法、控制器及其形成集成电路的装置
TW201703094A (zh) * 2015-05-08 2017-01-16 克萊譚克公司 用於電子束系統中像差校正之方法及系統
WO2017165308A1 (en) * 2016-03-24 2017-09-28 Kla-Tencor Corporation System and method for drift compensation on an electron beam based characterization tool

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US20040264764A1 (en) * 2003-04-25 2004-12-30 Topcon Corporation Apparatus and method for three-dimensional coordinate measurement
US20100320382A1 (en) * 2007-02-22 2010-12-23 Applied Materials Israel, Ltd. High throughput sem tool
US20130273378A1 (en) * 2010-12-28 2013-10-17 Sekisui Chemical Co., Ltd. Interlayer for laminated glass and laminated glass
CN105319867A (zh) * 2014-07-30 2016-02-10 格罗方德半导体公司 控制紫外光的焦点的方法、控制器及其形成集成电路的装置
TW201703094A (zh) * 2015-05-08 2017-01-16 克萊譚克公司 用於電子束系統中像差校正之方法及系統
WO2017165308A1 (en) * 2016-03-24 2017-09-28 Kla-Tencor Corporation System and method for drift compensation on an electron beam based characterization tool

Also Published As

Publication number Publication date
JP2023138870A (ja) 2023-10-02
US20200126752A1 (en) 2020-04-23
US11373838B2 (en) 2022-06-28
JP7587649B2 (ja) 2024-11-20
EP3853880A1 (en) 2021-07-28
JP2022505064A (ja) 2022-01-14
TW202025200A (zh) 2020-07-01
CN112805803A (zh) 2021-05-14
KR102480545B1 (ko) 2022-12-22
EP3853880A4 (en) 2022-10-26
KR20210060644A (ko) 2021-05-26
WO2020081277A1 (en) 2020-04-23
CN112805803B (zh) 2024-06-21

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