KR102480545B1 - 텔레센트릭 조명을 갖는 다중 빔 전자 특성화 도구 - Google Patents

텔레센트릭 조명을 갖는 다중 빔 전자 특성화 도구 Download PDF

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KR102480545B1
KR102480545B1 KR1020217014594A KR20217014594A KR102480545B1 KR 102480545 B1 KR102480545 B1 KR 102480545B1 KR 1020217014594 A KR1020217014594 A KR 1020217014594A KR 20217014594 A KR20217014594 A KR 20217014594A KR 102480545 B1 KR102480545 B1 KR 102480545B1
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South Korea
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lens
electron
lens element
assembly
grid
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Korean (ko)
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KR20210060644A (ko
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앨런 디. 브로디
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케이엘에이 코포레이션
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/12Lenses electrostatic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10Lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/049Focusing means
    • H01J2237/0492Lens systems
    • H01J2237/04928Telecentric systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10Lenses
    • H01J2237/12Lenses electrostatic
    • H01J2237/121Lenses electrostatic characterised by shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/31749Focused ion beam

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020217014594A 2018-10-17 2019-10-08 텔레센트릭 조명을 갖는 다중 빔 전자 특성화 도구 Active KR102480545B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/163,263 2018-10-17
US16/163,263 US11373838B2 (en) 2018-10-17 2018-10-17 Multi-beam electron characterization tool with telecentric illumination
PCT/US2019/055077 WO2020081277A1 (en) 2018-10-17 2019-10-08 Multi-beam electron characterization tool with telecentric illumination

Publications (2)

Publication Number Publication Date
KR20210060644A KR20210060644A (ko) 2021-05-26
KR102480545B1 true KR102480545B1 (ko) 2022-12-22

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KR1020217014594A Active KR102480545B1 (ko) 2018-10-17 2019-10-08 텔레센트릭 조명을 갖는 다중 빔 전자 특성화 도구

Country Status (7)

Country Link
US (1) US11373838B2 (https=)
EP (1) EP3853880A4 (https=)
JP (2) JP2022505064A (https=)
KR (1) KR102480545B1 (https=)
CN (1) CN112805803B (https=)
TW (1) TWI799656B (https=)
WO (1) WO2020081277A1 (https=)

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* Cited by examiner, † Cited by third party
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US11638938B2 (en) 2019-06-10 2023-05-02 Kla Corporation In situ process chamber chuck cleaning by cleaning substrate
US11607716B1 (en) 2020-06-23 2023-03-21 Kla Corporation Systems and methods for chuck cleaning
JP7689866B2 (ja) * 2021-05-25 2025-06-09 株式会社ミツトヨ 顕微鏡ユニット
JP2023046921A (ja) * 2021-09-24 2023-04-05 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置、マルチ電子ビーム検査装置、及びマルチ電子ビーム画像取得方法
US11651934B2 (en) 2021-09-30 2023-05-16 Kla Corporation Systems and methods of creating multiple electron beams

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US20100320382A1 (en) 2007-02-22 2010-12-23 Applied Materials Israel, Ltd. High throughput sem tool
US20110068276A1 (en) 2009-09-18 2011-03-24 Pieter Kruit Multiple beam charged particle optical system
JP2018528596A (ja) 2015-09-21 2018-09-27 ケーエルエー−テンカー コーポレイション マルチビーム走査型電子顕微鏡におけるノイズ緩和方法及びシステム

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US7539340B2 (en) * 2003-04-25 2009-05-26 Topcon Corporation Apparatus and method for three-dimensional coordinate measurement
JP5663717B2 (ja) * 2005-09-06 2015-02-04 カール ツァイス マイクロスコピー ゲーエムベーハーCarl Zeiss Microscopy Gmbh 荷電粒子システム
EP2019415B1 (en) * 2007-07-24 2016-05-11 IMS Nanofabrication AG Multi-beam source
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JP2005174568A (ja) 2003-12-08 2005-06-30 Ebara Corp 対物レンズ、電子線装置及びこれらを用いたデバイス製造方法
US20100320382A1 (en) 2007-02-22 2010-12-23 Applied Materials Israel, Ltd. High throughput sem tool
US20110068276A1 (en) 2009-09-18 2011-03-24 Pieter Kruit Multiple beam charged particle optical system
JP2018528596A (ja) 2015-09-21 2018-09-27 ケーエルエー−テンカー コーポレイション マルチビーム走査型電子顕微鏡におけるノイズ緩和方法及びシステム

Also Published As

Publication number Publication date
JP2023138870A (ja) 2023-10-02
US20200126752A1 (en) 2020-04-23
US11373838B2 (en) 2022-06-28
JP7587649B2 (ja) 2024-11-20
EP3853880A1 (en) 2021-07-28
JP2022505064A (ja) 2022-01-14
TW202025200A (zh) 2020-07-01
TWI799656B (zh) 2023-04-21
CN112805803A (zh) 2021-05-14
EP3853880A4 (en) 2022-10-26
KR20210060644A (ko) 2021-05-26
WO2020081277A1 (en) 2020-04-23
CN112805803B (zh) 2024-06-21

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