TWI799656B - 多束掃描電子顯微鏡裝置、多束電子源及用於多束操作之方法 - Google Patents

多束掃描電子顯微鏡裝置、多束電子源及用於多束操作之方法 Download PDF

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Publication number
TWI799656B
TWI799656B TW108137245A TW108137245A TWI799656B TW I799656 B TWI799656 B TW I799656B TW 108137245 A TW108137245 A TW 108137245A TW 108137245 A TW108137245 A TW 108137245A TW I799656 B TWI799656 B TW I799656B
Authority
TW
Taiwan
Prior art keywords
microscopy apparatus
scanning electron
electron microscopy
electron source
beam scanning
Prior art date
Application number
TW108137245A
Other languages
English (en)
Other versions
TW202025200A (zh
Inventor
艾倫 Ｄ 布魯迪
Original Assignee
美商科磊股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商科磊股份有限公司 filed Critical 美商科磊股份有限公司
Publication of TW202025200A publication Critical patent/TW202025200A/zh
Application granted granted Critical
Publication of TWI799656B publication Critical patent/TWI799656B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04928—Telecentric systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/121—Lenses electrostatic characterised by shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
TW108137245A 2018-10-17 2019-10-16 多束掃描電子顯微鏡裝置、多束電子源及用於多束操作之方法 TWI799656B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16/163,263 2018-10-17
US16/163,263 US11373838B2 (en) 2018-10-17 2018-10-17 Multi-beam electron characterization tool with telecentric illumination

Publications (2)

Publication Number Publication Date
TW202025200A TW202025200A (zh) 2020-07-01
TWI799656B true TWI799656B (zh) 2023-04-21

Family

ID=70279226

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108137245A TWI799656B (zh) 2018-10-17 2019-10-16 多束掃描電子顯微鏡裝置、多束電子源及用於多束操作之方法

Country Status (7)

Country Link
US (1) US11373838B2 (zh)
EP (1) EP3853880A4 (zh)
JP (2) JP2022505064A (zh)
KR (1) KR102480545B1 (zh)
CN (1) CN112805803B (zh)
TW (1) TWI799656B (zh)
WO (1) WO2020081277A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11638938B2 (en) 2019-06-10 2023-05-02 Kla Corporation In situ process chamber chuck cleaning by cleaning substrate
US11607716B1 (en) 2020-06-23 2023-03-21 Kla Corporation Systems and methods for chuck cleaning
US11651934B2 (en) 2021-09-30 2023-05-16 Kla Corporation Systems and methods of creating multiple electron beams

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US20040264764A1 (en) * 2003-04-25 2004-12-30 Topcon Corporation Apparatus and method for three-dimensional coordinate measurement
US20100320382A1 (en) * 2007-02-22 2010-12-23 Applied Materials Israel, Ltd. High throughput sem tool
US20130273378A1 (en) * 2010-12-28 2013-10-17 Sekisui Chemical Co., Ltd. Interlayer for laminated glass and laminated glass
CN105319867A (zh) * 2014-07-30 2016-02-10 格罗方德半导体公司 控制紫外光的焦点的方法、控制器及其形成集成电路的装置
TW201703094A (zh) * 2015-05-08 2017-01-16 克萊譚克公司 用於電子束系統中像差校正之方法及系統
WO2017165308A1 (en) * 2016-03-24 2017-09-28 Kla-Tencor Corporation System and method for drift compensation on an electron beam based characterization tool

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NL8200691A (nl) 1982-02-22 1983-09-16 Philips Nv Kathodestraalbuis.
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US6333508B1 (en) 1999-10-07 2001-12-25 Lucent Technologies, Inc. Illumination system for electron beam lithography tool
JP2001168016A (ja) 1999-12-13 2001-06-22 Canon Inc 荷電粒子線露光装置と露光システム及びそれらの制御方法及びデバイス製造方法
CN1759465B (zh) * 2003-03-10 2010-06-16 迈普尔平版印刷Ip有限公司 用于产生多个小波束的装置
JP2005174568A (ja) 2003-12-08 2005-06-30 Ebara Corp 対物レンズ、電子線装置及びこれらを用いたデバイス製造方法
DE602006020899D1 (de) * 2005-09-06 2011-05-05 Applied Materials Israel Ltd Teilchenoptische Anordnung mit teilchenoptischer Komponente
EP2019415B1 (en) * 2007-07-24 2016-05-11 IMS Nanofabrication AG Multi-beam source
KR20110015555A (ko) 2008-04-15 2011-02-16 마퍼 리쏘그라피 아이피 비.브이. 비임렛 블랭커 배열체
DE102009008063A1 (de) * 2009-02-09 2010-08-19 Carl Zeiss Nts Gmbh Teilchenstrahlsystem
EP2478548B1 (en) 2009-09-18 2017-03-29 Mapper Lithography IP B.V. Charged particle optical system with multiple beams
JP5886663B2 (ja) * 2012-03-21 2016-03-16 株式会社日立ハイテクノロジーズ 電子線応用装置およびレンズアレイ
JP2013236053A (ja) * 2012-04-13 2013-11-21 Canon Inc 荷電粒子光学系、描画装置及び物品の製造方法
JP6116303B2 (ja) * 2013-03-25 2017-04-19 株式会社日立ハイテクサイエンス 集束イオンビーム装置
NL2013411B1 (en) * 2014-09-04 2016-09-27 Univ Delft Tech Multi electron beam inspection apparatus.
TWI751911B (zh) * 2015-03-24 2022-01-01 美商克萊譚克公司 用於具有改良之影像光束穩定性及詢問之帶電粒子顯微鏡之方法及系統
KR101725506B1 (ko) 2015-07-20 2017-04-12 한국표준과학연구원 시료의 광학 이미지를 얻을 수 있는 주사전자현미경
US10366862B2 (en) * 2015-09-21 2019-07-30 KLA-Tencor Corporaton Method and system for noise mitigation in a multi-beam scanning electron microscopy system
US10325753B2 (en) 2015-09-23 2019-06-18 Kla Tencor Corporation Method and system for focus adjustment of a multi-beam scanning electron microscopy system
US10497536B2 (en) * 2016-09-08 2019-12-03 Rockwell Collins, Inc. Apparatus and method for correcting arrayed astigmatism in a multi-column scanning electron microscopy system
US10840056B2 (en) 2017-02-03 2020-11-17 Kla Corporation Multi-column scanning electron microscopy system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040264764A1 (en) * 2003-04-25 2004-12-30 Topcon Corporation Apparatus and method for three-dimensional coordinate measurement
US20100320382A1 (en) * 2007-02-22 2010-12-23 Applied Materials Israel, Ltd. High throughput sem tool
US20130273378A1 (en) * 2010-12-28 2013-10-17 Sekisui Chemical Co., Ltd. Interlayer for laminated glass and laminated glass
CN105319867A (zh) * 2014-07-30 2016-02-10 格罗方德半导体公司 控制紫外光的焦点的方法、控制器及其形成集成电路的装置
TW201703094A (zh) * 2015-05-08 2017-01-16 克萊譚克公司 用於電子束系統中像差校正之方法及系統
WO2017165308A1 (en) * 2016-03-24 2017-09-28 Kla-Tencor Corporation System and method for drift compensation on an electron beam based characterization tool

Also Published As

Publication number Publication date
CN112805803A (zh) 2021-05-14
TW202025200A (zh) 2020-07-01
KR20210060644A (ko) 2021-05-26
US20200126752A1 (en) 2020-04-23
EP3853880A4 (en) 2022-10-26
JP2022505064A (ja) 2022-01-14
EP3853880A1 (en) 2021-07-28
KR102480545B1 (ko) 2022-12-22
US11373838B2 (en) 2022-06-28
WO2020081277A1 (en) 2020-04-23
CN112805803B (zh) 2024-06-21
JP2023138870A (ja) 2023-10-02

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