JP2022505064A5 - - Google Patents

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Publication number
JP2022505064A5
JP2022505064A5 JP2021520961A JP2021520961A JP2022505064A5 JP 2022505064 A5 JP2022505064 A5 JP 2022505064A5 JP 2021520961 A JP2021520961 A JP 2021520961A JP 2021520961 A JP2021520961 A JP 2021520961A JP 2022505064 A5 JP2022505064 A5 JP 2022505064A5
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JP
Japan
Prior art keywords
lens
electron
lens element
assembly
curved grid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021520961A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022505064A (ja
Filing date
Publication date
Priority claimed from US16/163,263 external-priority patent/US11373838B2/en
Application filed filed Critical
Publication of JP2022505064A publication Critical patent/JP2022505064A/ja
Publication of JP2022505064A5 publication Critical patent/JP2022505064A5/ja
Priority to JP2023132058A priority Critical patent/JP7587649B2/ja
Pending legal-status Critical Current

Links

JP2021520961A 2018-10-17 2019-10-08 テレセントリック照明を有するマルチビーム電子特性評価ツール Pending JP2022505064A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023132058A JP7587649B2 (ja) 2018-10-17 2023-08-14 テレセントリック照明を有するマルチビーム電子特性評価ツール

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/163,263 2018-10-17
US16/163,263 US11373838B2 (en) 2018-10-17 2018-10-17 Multi-beam electron characterization tool with telecentric illumination
PCT/US2019/055077 WO2020081277A1 (en) 2018-10-17 2019-10-08 Multi-beam electron characterization tool with telecentric illumination

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023132058A Division JP7587649B2 (ja) 2018-10-17 2023-08-14 テレセントリック照明を有するマルチビーム電子特性評価ツール

Publications (2)

Publication Number Publication Date
JP2022505064A JP2022505064A (ja) 2022-01-14
JP2022505064A5 true JP2022505064A5 (https=) 2022-10-11

Family

ID=70279226

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021520961A Pending JP2022505064A (ja) 2018-10-17 2019-10-08 テレセントリック照明を有するマルチビーム電子特性評価ツール
JP2023132058A Active JP7587649B2 (ja) 2018-10-17 2023-08-14 テレセントリック照明を有するマルチビーム電子特性評価ツール

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023132058A Active JP7587649B2 (ja) 2018-10-17 2023-08-14 テレセントリック照明を有するマルチビーム電子特性評価ツール

Country Status (7)

Country Link
US (1) US11373838B2 (https=)
EP (1) EP3853880A4 (https=)
JP (2) JP2022505064A (https=)
KR (1) KR102480545B1 (https=)
CN (1) CN112805803B (https=)
TW (1) TWI799656B (https=)
WO (1) WO2020081277A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11638938B2 (en) 2019-06-10 2023-05-02 Kla Corporation In situ process chamber chuck cleaning by cleaning substrate
US11607716B1 (en) 2020-06-23 2023-03-21 Kla Corporation Systems and methods for chuck cleaning
JP7689866B2 (ja) * 2021-05-25 2025-06-09 株式会社ミツトヨ 顕微鏡ユニット
JP2023046921A (ja) * 2021-09-24 2023-04-05 株式会社ニューフレアテクノロジー マルチ電子ビーム画像取得装置、マルチ電子ビーム検査装置、及びマルチ電子ビーム画像取得方法
US11651934B2 (en) 2021-09-30 2023-05-16 Kla Corporation Systems and methods of creating multiple electron beams

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1134769B (de) * 1959-08-22 1962-08-16 Zeiss Carl Fa Vorrichtung zur Kompensation des OEffnungsfehlers einer rotations-symmetrischen, raumladungsfreien elektronenoptischen Linse
NL8200691A (nl) * 1982-02-22 1983-09-16 Philips Nv Kathodestraalbuis.
NL8400841A (nl) * 1984-03-16 1985-10-16 Philips Nv Kathodestraalbuis.
US6333508B1 (en) * 1999-10-07 2001-12-25 Lucent Technologies, Inc. Illumination system for electron beam lithography tool
JP2001168016A (ja) 1999-12-13 2001-06-22 Canon Inc 荷電粒子線露光装置と露光システム及びそれらの制御方法及びデバイス製造方法
KR101068607B1 (ko) * 2003-03-10 2011-09-30 마퍼 리쏘그라피 아이피 비.브이. 복수 개의 빔렛 발생 장치
US7539340B2 (en) * 2003-04-25 2009-05-26 Topcon Corporation Apparatus and method for three-dimensional coordinate measurement
JP2005174568A (ja) 2003-12-08 2005-06-30 Ebara Corp 対物レンズ、電子線装置及びこれらを用いたデバイス製造方法
JP5663717B2 (ja) * 2005-09-06 2015-02-04 カール ツァイス マイクロスコピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ Ｇｍｂｈ 荷電粒子システム
JP2010519697A (ja) 2007-02-22 2010-06-03 アプライド マテリアルズ イスラエル リミテッド 高スループットｓｅｍツール
EP2019415B1 (en) * 2007-07-24 2016-05-11 IMS Nanofabrication AG Multi-beam source
WO2009127659A2 (en) 2008-04-15 2009-10-22 Mapper Lithography Ip B.V. Beamlet blanker arrangement
DE102009008063A1 (de) * 2009-02-09 2010-08-19 Carl Zeiss Nts Gmbh Teilchenstrahlsystem
TW201133534A (en) 2009-09-18 2011-10-01 Mapper Lithography Ip Bv Multiple beam charged particle optical system
US20130273378A1 (en) * 2010-12-28 2013-10-17 Sekisui Chemical Co., Ltd. Interlayer for laminated glass and laminated glass
JP5886663B2 (ja) * 2012-03-21 2016-03-16 株式会社日立ハイテクノロジーズ 電子線応用装置およびレンズアレイ
JP2013236053A (ja) * 2012-04-13 2013-11-21 Canon Inc 荷電粒子光学系、描画装置及び物品の製造方法
JP6116303B2 (ja) * 2013-03-25 2017-04-19 株式会社日立ハイテクサイエンス 集束イオンビーム装置
US20160033879A1 (en) * 2014-07-30 2016-02-04 GlobalFoundries, Inc. Methods and controllers for controlling focus of ultraviolet light from a lithographic imaging system, and apparatuses for forming an integrated circuit employing the same
NL2013411B1 (en) * 2014-09-04 2016-09-27 Univ Delft Tech Multi electron beam inspection apparatus.
JP6701228B2 (ja) * 2015-03-24 2020-05-27 ケーエルエー コーポレイション 像ビームの安定化及び識別性が改善された荷電粒子顕微システム及び方法
WO2016182948A1 (en) * 2015-05-08 2016-11-17 Kla-Tencor Corporation Method and system for aberration correction in electron beam system
KR101725506B1 (ko) 2015-07-20 2017-04-12 한국표준과학연구원 시료의 광학 이미지를 얻을 수 있는 주사전자현미경
US10366862B2 (en) * 2015-09-21 2019-07-30 KLA-Tencor Corporaton Method and system for noise mitigation in a multi-beam scanning electron microscopy system
US10325753B2 (en) 2015-09-23 2019-06-18 Kla Tencor Corporation Method and system for focus adjustment of a multi-beam scanning electron microscopy system
US9892885B2 (en) 2016-03-24 2018-02-13 Kla-Tencor Corporation System and method for drift compensation on an electron beam based characterization tool
US10497536B2 (en) * 2016-09-08 2019-12-03 Rockwell Collins, Inc. Apparatus and method for correcting arrayed astigmatism in a multi-column scanning electron microscopy system
US10840056B2 (en) 2017-02-03 2020-11-17 Kla Corporation Multi-column scanning electron microscopy system

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