JP2022172478A - ガラスセラミック組成物及びこれを組み込んだラミネートガラス - Google Patents
ガラスセラミック組成物及びこれを組み込んだラミネートガラス Download PDFInfo
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- 239000006112 glass ceramic composition Substances 0.000 title claims abstract description 147
- 239000011521 glass Substances 0.000 title abstract description 150
- 239000005340 laminated glass Substances 0.000 title description 63
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims abstract description 38
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims abstract description 36
- 229910001556 Li2Si2O5 Inorganic materials 0.000 claims abstract description 14
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 40
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 24
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 23
- 238000003279 ceramming Methods 0.000 claims description 22
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 11
- 229910052708 sodium Inorganic materials 0.000 claims description 11
- 239000002667 nucleating agent Substances 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 45
- 229910052681 coesite Inorganic materials 0.000 abstract description 22
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 22
- 239000000377 silicon dioxide Substances 0.000 abstract description 22
- 229910052682 stishovite Inorganic materials 0.000 abstract description 22
- 229910052905 tridymite Inorganic materials 0.000 abstract description 22
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 18
- 229910052593 corundum Inorganic materials 0.000 abstract description 18
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 18
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract description 9
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract description 9
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 74
- 238000005253 cladding Methods 0.000 description 71
- 239000012792 core layer Substances 0.000 description 37
- 239000000203 mixture Substances 0.000 description 29
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 27
- 238000000034 method Methods 0.000 description 24
- 235000012239 silicon dioxide Nutrition 0.000 description 21
- 238000002425 crystallisation Methods 0.000 description 20
- 230000008025 crystallization Effects 0.000 description 20
- 238000010899 nucleation Methods 0.000 description 19
- 230000006911 nucleation Effects 0.000 description 19
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 17
- 230000008569 process Effects 0.000 description 16
- 239000002241 glass-ceramic Substances 0.000 description 15
- 230000004927 fusion Effects 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 12
- 239000000919 ceramic Substances 0.000 description 11
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 10
- 239000013078 crystal Substances 0.000 description 8
- 238000003475 lamination Methods 0.000 description 8
- 238000002468 ceramisation Methods 0.000 description 7
- 239000006060 molten glass Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000005342 ion exchange Methods 0.000 description 5
- 239000003513 alkali Substances 0.000 description 4
- 239000006025 fining agent Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000006059 cover glass Substances 0.000 description 3
- 239000000156 glass melt Substances 0.000 description 3
- 229910001385 heavy metal Inorganic materials 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000005728 strengthening Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- -1 but not limited to Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000003280 down draw process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007499 fusion processing Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- OFMQVFWIIISRDO-UHFFFAOYSA-N [Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] Chemical compound [Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[Li+].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] OFMQVFWIIISRDO-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000005328 architectural glass Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000003416 augmentation Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 229910000174 eucryptite Inorganic materials 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003283 slot draw process Methods 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
- 229910000500 β-quartz Inorganic materials 0.000 description 1
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- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/027—Thermal properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/20—Uniting glass pieces by fusing without substantial reshaping
- C03B23/203—Uniting glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
- C03B32/02—Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
- C03C10/0027—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents containing SiO2, Al2O3, Li2O as main constituents
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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Abstract
Description
約60モル%~約75モル%のSiO2;
約5モル%~約10モル%のAl2O3;
約2モル%~約20モル%のアルカリ酸化物R2Oであって、上記アルカリ酸化物R2OはLi2O及びNa2Oを含む、アルカリ酸化物R2O;
0モル%~約5モル%のアルカリ土類酸化物ROであって、上記アルカリ土類酸化物ROはMgOを含む、アルカリ土類酸化物RO;
1未満の、比Al2O3(モル%)/(R2O(モル%)+RO(モル%));
Li2Si2O5の主要な結晶相;並びに
35kP(3.5kPa・s)超の液相粘度
を備える、ガラスセラミック組成物。
上記アルカリ酸化物R2Oは、約1モル%~約10モル%のLi2Oを含む、実施形態1に記載のガラスセラミック組成物。
上記アルカリ酸化物R2Oは、約1モル%~約10モル%のNa2Oを含む、実施形態1又は2に記載のガラスセラミック組成物。
上記アルカリ土類酸化物ROは、0モル%超及び約5モル%までのMgOを含む、実施形態1~3のいずれか1つに記載のガラスセラミック組成物。
Al2O3(モル%)に対するSiO2(モル%)の比は7超である、実施形態1~4のいずれか1つに記載のガラスセラミック組成物。
比(Li2O(モル%)+2*SiO2(モル%))/Al2O3(モル%)は13超である、実施形態1~5のいずれか1つに記載のガラスセラミック組成物。
比(R2O(モル%)+2*SiO2(モル%))/Al2O3(モル%)は8.5超である、実施形態1~6のいずれか1つに記載のガラスセラミック組成物。
約1モル%~約4モル%のTiO2を更に含む、実施形態1~7のいずれか1つに記載のガラスセラミック組成物。
比(SiO2(モル%)+Al2O3(モル%)+Li2O(モル%)+K2O(モル%)+Na2O(モル%))/(TiO2(モル%)+P2O5(モル%)+ZrO2(モル%))は26超である、実施形態8に記載のガラスセラミック組成物。
上記比(SiO2(モル%)+Al2O3(モル%)+Li2O(モル%)+K2O(モル%)+Na2O(モル%))/(TiO2(モル%)+P2O5(モル%)+ZrO2(モル%))は31超である、実施形態8又は9に記載のガラスセラミック組成物。
K2Oを約10モル%までの量で更に含む、実施形態1~10のいずれか1つに記載のガラスセラミック組成物。
ZrO2を約4モル%までの量で更に含む、実施形態1~11のいずれか1つに記載のガラスセラミック組成物。
上記液相粘度は約100kP(約10kPa・s)以上である、実施形態1~12のいずれか1つに記載のガラスセラミック組成物。
上記ガラスセラミック組成物は、約65×10‐7/℃以上及び約110×10‐7/℃以下のセラミック化前CTEPCを有する、実施形態1~13のいずれか1つに記載のガラスセラミック組成物。
上記ガラスセラミック組成物は、20×10‐7/℃以上及び約70×10‐7/℃以下のセラミック化後CTEACを有する、実施形態1~14のいずれか1つに記載のガラスセラミック組成物。
コア熱膨張係数CTECを有するガラスコア層;
上記ガラスコア層に直接融着された、少なくとも1つのガラスクラッド層であって、上記少なくとも1つのガラスクラッド層は:
約60モル%~約75モル%のSiO2;
約5モル%~約10モル%Al2O3;
約2モル%~約20モル%のアルカリ酸化物R2Oであって、上記アルカリ酸化物R2OはLi2O及びNa2Oを含む、アルカリ酸化物R2O;
0モル%~約5モル%のアルカリ土類酸化物ROであって、上記アルカリ土類酸化物ROはMgOからなり、比Al2O3(モル%)/(R2O(モル%)+RO(モル%))は1未満である、アルカリ土類酸化物RO;
上記少なくとも1つのガラスクラッド層の主要な結晶相は、Li2Si2O5であり;
上記少なくとも1つのガラスクラッド層は、20×10‐7/℃以上及び約70×10‐7/℃以下、かつ上記コア熱膨張係数CTEC未満である、クラッド熱膨張係数CTECLを有する、ガラスクラッド層
を備える、ラミネートガラス物品。
上記アルカリ酸化物R2Oは、約1モル%~約10モル%のLi2Oを含む、実施形態16に記載のラミネートガラス物品。
上記アルカリ酸化物R2Oは、約1モル%~約10モル%のNa2Oを含む、実施形態16又は実施形態17に記載のラミネートガラス物品。
上記少なくとも1つのガラスクラッド層は更に、約1モル%~約4モル%のTiO2を含む、実施形態16~18のいずれか1つに記載のラミネートガラス物品。
比(SiO2(モル%)+Al2O3(モル%)+Li2O(モル%)+K2O(モル%)+Na2O(モル%))/(TiO2(モル%)+P2O5(モル%)+ZrO2(モル%))は26超である、実施形態19に記載のラミネートガラス物品。
消費者向け若しくは市販の電子デバイスのカバーガラス若しくはガラス背面用途;携帯型電子デバイス用のタッチスクリーン又はタッチセンサ用途;集積回路用途;光電池用途;建築用ガラス用途;自動車若しくは車両ガラス用途;市販若しくは家庭用電化製品用途;照明若しくは標識用途;又は輸送用途における、実施形態1~15のいずれか1つに記載のガラスセラミック組成物又は実施形態16~20のいずれか1つに記載のラミネートガラス物品の使用。
コア熱膨張係数CTECを有するガラスコア層を、上記CTECの約20%以内のセラミック化前熱膨張係数CTEPCを有する少なくとも1つのガラスクラッド層に融着して、ラミネートガラス物品を形成するステップであって、上記少なくとも1つのガラスクラッド層は:
約60モル%~約75モル%のSiO2;
約5モル%~約10モル%Al2O3;
約2モル%~約20モル%のアルカリ酸化物R2Oであって、上記アルカリ酸化物R2OはLi2O及びNa2Oを含む、アルカリ酸化物R2O;並びに
0モル%~約5モル%のアルカリ土類酸化物ROであって、上記アルカリ土類酸化物ROはMgOからなり、比Al2O3(モル%)/(R2O(モル%)+RO(モル%))は1未満である、アルカリ土類酸化物RO
を含む、ステップ;並びに
上記ラミネートガラス物品を熱処理して上記少なくとも1つのガラスクラッド層をセラミック化することにより、上記ガラスクラッド層の上記熱膨張係数を、20×10‐7/℃以上及び約70×10‐7/℃以下、かつ上記コア熱膨張係数CTEC未満である、セラミック化後熱膨張係数CTEACへと低下させるステップであって、上記少なくとも1つのガラスクラッド層の主要な結晶質相はLi2Si2O5である、ステップ
を含む、方法。
上記セラミック化前CTEPCは約65×10‐7/℃以上及び約110×10‐7/℃以下である、実施形態22に記載の方法。
上記アルカリ酸化物R2Oは約1モル%~約10モル%のLi2Oを含む、実施形態22又は23に記載の方法。
上記アルカリ酸化物R2Oは、約1モル%~約10モル%のNa2Oを含む、実施形態22~24のいずれか1つに記載の方法。
上記少なくとも1つのガラスクラッド層は更に、約1モル%~約4モル%のTiO2を含む、実施形態22~25のいずれか1つに記載の方法。
比(SiO2(モル%)+Al2O3(モル%)+Li2O(モル%)+K2O(モル%)+Na2O(モル%))/(TiO2(モル%)+P2O5(モル%)+ZrO2(モル%))は26超である、実施形態26に記載の方法。
102 ガラスコア層
103a ガラスコア層102の第1の表面
103b ガラスコア層102の第2の表面
104a第1のガラスクラッド層
104b第2のガラスクラッド層
200 積層フュージョンプロセス装置
202 上側流出分分配器又はアイソパイプ
204 下側流出分分配器又はアイソパイプ
206 溶融ガラスセラミッククラッド組成物
208 溶融ガラスコア組成物
210 トラフ
212 トラフ
216 下側流出分分配器204の外側形成表面
218 下側流出分分配器204の外側形成表面
220 基部
222 上側流出分分配器202の外側形成表面
224 上側流出分分配器202の外側形成表面
Claims (1)
- 72モル%~73.77モル%のSiO2;
9.86モル%~10.01モル%のAl2O3;
13モル%~14.77モル%のアルカリ酸化物R2Oであって、前記アルカリ酸化物R2OはLi2O及びNa2Oを含み、前記アルカリ酸化物R2Oは5.53モル%~5.62モル%のLi2Oを含む、アルカリ酸化物R2O;
0モル%~5モル%のアルカリ土類酸化物ROであって、前記アルカリ土類酸化物ROはMgOを含む、アルカリ土類酸化物RO;
を含み、
1未満の、比Al2O3(モル%)/(R2O(モル%)+RO(モル%));
Li2Si2O5の主要な結晶相;並びに
35kP(3.5kPa・s)超の液相粘度
を備える、ガラスセラミック組成物であって、
TiO2、ZrO2、P2O5及びこれらの組み合わせからなる群から選択された核形成剤を更に含み、比(SiO2(モル%)+Al2O3(モル%)+Li2O(モル%)+K2O(モル%)+Na2O(モル%))/(TiO2(モル%)+P2O5(モル%)+ZrO2(モル%))は、26超かつ31未満であり、
20×10-7/℃以上70×10-7/℃以下のセラミック化後の熱膨張係数CTEACを有する、
ガラスセラミック組成物。
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