JP2022098977A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP2022098977A JP2022098977A JP2020212680A JP2020212680A JP2022098977A JP 2022098977 A JP2022098977 A JP 2022098977A JP 2020212680 A JP2020212680 A JP 2020212680A JP 2020212680 A JP2020212680 A JP 2020212680A JP 2022098977 A JP2022098977 A JP 2022098977A
- Authority
- JP
- Japan
- Prior art keywords
- terminal
- region
- solder
- electrode
- main surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W40/00—Arrangements for thermal protection or thermal control
- H10W40/10—Arrangements for heating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
- H10D12/411—Insulated-gate bipolar transistors [IGBT]
- H10D12/441—Vertical IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/232—Emitter electrodes for IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
- H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
- H10D62/105—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]
- H10D62/106—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/498—Resistive arrangements or effects of, or between, wiring layers
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020212680A JP2022098977A (ja) | 2020-12-22 | 2020-12-22 | 半導体装置 |
| PCT/JP2021/043194 WO2022137966A1 (ja) | 2020-12-22 | 2021-11-25 | 半導体装置 |
| CN202180086142.2A CN116636004A (zh) | 2020-12-22 | 2021-11-25 | 半导体装置 |
| US18/331,749 US20230317599A1 (en) | 2020-12-22 | 2023-06-08 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020212680A JP2022098977A (ja) | 2020-12-22 | 2020-12-22 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2022098977A true JP2022098977A (ja) | 2022-07-04 |
| JP2022098977A5 JP2022098977A5 (https=) | 2023-03-03 |
Family
ID=82157659
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020212680A Pending JP2022098977A (ja) | 2020-12-22 | 2020-12-22 | 半導体装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20230317599A1 (https=) |
| JP (1) | JP2022098977A (https=) |
| CN (1) | CN116636004A (https=) |
| WO (1) | WO2022137966A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024006287A (ja) * | 2022-07-01 | 2024-01-17 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5266720B2 (ja) * | 2007-10-30 | 2013-08-21 | 株式会社デンソー | 半導体装置 |
| JP2010118548A (ja) * | 2008-11-13 | 2010-05-27 | Mitsubishi Electric Corp | 半導体装置 |
| JP2010165880A (ja) * | 2009-01-16 | 2010-07-29 | Toyota Industries Corp | 半導体装置 |
| JP5146490B2 (ja) * | 2010-06-07 | 2013-02-20 | 三菱電機株式会社 | 半導体素子 |
| JP5765324B2 (ja) * | 2012-12-10 | 2015-08-19 | トヨタ自動車株式会社 | 半導体装置 |
| JP2015146368A (ja) * | 2014-02-03 | 2015-08-13 | 株式会社東芝 | 半導体装置 |
| JP6485398B2 (ja) * | 2016-04-13 | 2019-03-20 | 株式会社デンソー | 電子装置及びその製造方法 |
| JP6638620B2 (ja) * | 2016-11-01 | 2020-01-29 | 株式会社デンソー | 半導体装置 |
| CN110050341B (zh) * | 2016-12-06 | 2024-05-28 | 株式会社东芝 | 半导体装置 |
| US10896863B2 (en) * | 2017-01-13 | 2021-01-19 | Mitsubishi Electric Corporation | Semiconductor device and method for manufacturing the same |
| US11398434B2 (en) * | 2017-09-20 | 2022-07-26 | Mitsubishi Electric Corporation | Semiconductor device, and method for manufacturing semiconductor device |
| JP7234858B2 (ja) * | 2019-08-22 | 2023-03-08 | 三菱電機株式会社 | 半導体装置及びインバータ |
| JP7476502B2 (ja) * | 2019-09-06 | 2024-05-01 | 富士電機株式会社 | 半導体装置 |
| JP7232743B2 (ja) * | 2019-10-24 | 2023-03-03 | 株式会社 日立パワーデバイス | 半導体装置及びそれを用いた整流素子、オルタネータ |
-
2020
- 2020-12-22 JP JP2020212680A patent/JP2022098977A/ja active Pending
-
2021
- 2021-11-25 WO PCT/JP2021/043194 patent/WO2022137966A1/ja not_active Ceased
- 2021-11-25 CN CN202180086142.2A patent/CN116636004A/zh active Pending
-
2023
- 2023-06-08 US US18/331,749 patent/US20230317599A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN116636004A (zh) | 2023-08-22 |
| WO2022137966A1 (ja) | 2022-06-30 |
| US20230317599A1 (en) | 2023-10-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230222 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230608 |
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| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240903 |
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| A02 | Decision of refusal |
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