JP2021525454A5 - - Google Patents
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- Publication number
- JP2021525454A5 JP2021525454A5 JP2020565321A JP2020565321A JP2021525454A5 JP 2021525454 A5 JP2021525454 A5 JP 2021525454A5 JP 2020565321 A JP2020565321 A JP 2020565321A JP 2020565321 A JP2020565321 A JP 2020565321A JP 2021525454 A5 JP2021525454 A5 JP 2021525454A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate support
- chuck body
- heater
- support assembly
- cooling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 17
- 238000001816 cooling Methods 0.000 claims 12
- 230000008878 coupling Effects 0.000 claims 7
- 238000010168 coupling process Methods 0.000 claims 7
- 238000005859 coupling reaction Methods 0.000 claims 7
- 239000000919 ceramic Substances 0.000 claims 5
- 239000002131 composite material Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical group [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000010926 purge Methods 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021179166A JP7662489B2 (ja) | 2018-05-31 | 2021-11-02 | 極めて均一性が高い加熱基板支持アセンブリ |
| JP2025001181A JP2025072361A (ja) | 2018-05-31 | 2025-01-06 | 極めて均一性が高い加熱基板支持アセンブリ |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862678540P | 2018-05-31 | 2018-05-31 | |
| US62/678,540 | 2018-05-31 | ||
| PCT/US2019/030741 WO2019231614A1 (en) | 2018-05-31 | 2019-05-03 | Extreme uniformity heated substrate support assembly |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021179166A Division JP7662489B2 (ja) | 2018-05-31 | 2021-11-02 | 極めて均一性が高い加熱基板支持アセンブリ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021525454A JP2021525454A (ja) | 2021-09-24 |
| JP2021525454A5 true JP2021525454A5 (enExample) | 2021-12-16 |
| JP7662339B2 JP7662339B2 (ja) | 2025-04-15 |
Family
ID=68693589
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020565321A Active JP7662339B2 (ja) | 2018-05-31 | 2019-05-03 | 極めて均一性が高い加熱基板支持アセンブリ |
| JP2021179166A Active JP7662489B2 (ja) | 2018-05-31 | 2021-11-02 | 極めて均一性が高い加熱基板支持アセンブリ |
| JP2025001181A Withdrawn JP2025072361A (ja) | 2018-05-31 | 2025-01-06 | 極めて均一性が高い加熱基板支持アセンブリ |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021179166A Active JP7662489B2 (ja) | 2018-05-31 | 2021-11-02 | 極めて均一性が高い加熱基板支持アセンブリ |
| JP2025001181A Withdrawn JP2025072361A (ja) | 2018-05-31 | 2025-01-06 | 極めて均一性が高い加熱基板支持アセンブリ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12488967B2 (enExample) |
| JP (3) | JP7662339B2 (enExample) |
| KR (3) | KR102471635B1 (enExample) |
| CN (1) | CN112088427A (enExample) |
| TW (1) | TWI702685B (enExample) |
| WO (1) | WO2019231614A1 (enExample) |
Families Citing this family (23)
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| TWI896439B (zh) * | 2020-03-30 | 2025-09-01 | 美商蘭姆研究公司 | 基板處理系統及基板支座溫度控制方法 |
| TWI868119B (zh) * | 2020-03-30 | 2025-01-01 | 美商蘭姆研究公司 | 基板處理系統及基板支座溫度控制方法 |
| US11493551B2 (en) | 2020-06-22 | 2022-11-08 | Advantest Test Solutions, Inc. | Integrated test cell using active thermal interposer (ATI) with parallel socket actuation |
| US11549981B2 (en) | 2020-10-01 | 2023-01-10 | Advantest Test Solutions, Inc. | Thermal solution for massively parallel testing |
| US11808812B2 (en) | 2020-11-02 | 2023-11-07 | Advantest Test Solutions, Inc. | Passive carrier-based device delivery for slot-based high-volume semiconductor test system |
| US11821913B2 (en) | 2020-11-02 | 2023-11-21 | Advantest Test Solutions, Inc. | Shielded socket and carrier for high-volume test of semiconductor devices |
| US12320841B2 (en) | 2020-11-19 | 2025-06-03 | Advantest Test Solutions, Inc. | Wafer scale active thermal interposer for device testing |
| US11567119B2 (en) | 2020-12-04 | 2023-01-31 | Advantest Test Solutions, Inc. | Testing system including active thermal interposer device |
| US11573262B2 (en) | 2020-12-31 | 2023-02-07 | Advantest Test Solutions, Inc. | Multi-input multi-zone thermal control for device testing |
| US12317378B2 (en) * | 2021-02-04 | 2025-05-27 | Applied Materials, Inc. | Multi-zone heater control for wafer processing equipment |
| US11881423B2 (en) * | 2021-02-09 | 2024-01-23 | Applied Materials, Inc. | Electrostatic chuck with metal bond |
| US11410869B1 (en) * | 2021-02-22 | 2022-08-09 | Applied Materials, Inc. | Electrostatic chuck with differentiated ceramics |
| US20220282371A1 (en) * | 2021-03-03 | 2022-09-08 | Applied Materials, Inc. | Electrostatic chuck with metal shaft |
| US11587640B2 (en) | 2021-03-08 | 2023-02-21 | Advantest Test Solutions, Inc. | Carrier based high volume system level testing of devices with pop structures |
| US12112971B2 (en) * | 2021-03-12 | 2024-10-08 | Applied Materials, Inc. | Multi-zone semiconductor substrate supports |
| TWI768786B (zh) * | 2021-03-24 | 2022-06-21 | 天虹科技股份有限公司 | 可準確調整溫度的承載盤及應用該承載盤的薄膜沉積裝置 |
| US20230011261A1 (en) * | 2021-07-09 | 2023-01-12 | Applied Materials, Inc. | Multi-zone heater with minimum rf loss |
| US12094748B2 (en) | 2021-08-18 | 2024-09-17 | Applied Materials, Inc. | Bipolar esc with balanced RF impedance |
| US20230060192A1 (en) * | 2021-09-02 | 2023-03-02 | Entegris, Inc. | Methods and apparatus for processing an electrostatic chuck |
| US11656273B1 (en) | 2021-11-05 | 2023-05-23 | Advantest Test Solutions, Inc. | High current device testing apparatus and systems |
| US20230420274A1 (en) * | 2022-06-22 | 2023-12-28 | Tel Manufacturing And Engineering Of America, Inc. | Radiatively-Cooled Substrate Holder |
| TWI890199B (zh) * | 2022-12-02 | 2025-07-11 | 日商鎧俠股份有限公司 | 半導體裝置冷卻裝置 |
| US12400896B2 (en) * | 2023-05-24 | 2025-08-26 | Applied Materials, Inc. | Fabrication of substrate support devices using inorganic dielectric bonding |
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| US5888304A (en) | 1996-04-02 | 1999-03-30 | Applied Materials, Inc. | Heater with shadow ring and purge above wafer surface |
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| JP5018244B2 (ja) | 2007-05-30 | 2012-09-05 | 住友大阪セメント株式会社 | 静電チャック |
| KR101437522B1 (ko) * | 2007-09-05 | 2014-09-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 플라즈마 반응기 챔버에서 웨이퍼 에지 가스 주입부를 갖는캐소드 라이너 |
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| WO2010061740A1 (ja) * | 2008-11-25 | 2010-06-03 | 京セラ株式会社 | ウエハ加熱装置、静電チャックおよびウエハ加熱装置の製造方法 |
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| DE102009046866A1 (de) * | 2009-11-19 | 2011-05-26 | Robert Bosch Gmbh | Fahrrad |
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| US10186444B2 (en) | 2015-03-20 | 2019-01-22 | Applied Materials, Inc. | Gas flow for condensation reduction with a substrate processing chuck |
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| US10973088B2 (en) * | 2016-04-18 | 2021-04-06 | Applied Materials, Inc. | Optically heated substrate support assembly with removable optical fibers |
| JP6611666B2 (ja) | 2016-05-16 | 2019-11-27 | 東京エレクトロン株式会社 | 載置台システム、基板処理装置及び温度制御方法 |
| JP6708518B2 (ja) * | 2016-08-09 | 2020-06-10 | 新光電気工業株式会社 | 基板固定装置及びその製造方法 |
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-
2019
- 2019-05-03 KR KR1020207033946A patent/KR102471635B1/ko active Active
- 2019-05-03 US US16/403,097 patent/US12488967B2/en active Active
- 2019-05-03 JP JP2020565321A patent/JP7662339B2/ja active Active
- 2019-05-03 WO PCT/US2019/030741 patent/WO2019231614A1/en not_active Ceased
- 2019-05-03 CN CN201980030055.8A patent/CN112088427A/zh active Pending
- 2019-05-03 KR KR1020257021454A patent/KR20250100800A/ko active Pending
- 2019-05-03 KR KR1020227041112A patent/KR20220163508A/ko not_active Ceased
- 2019-05-21 TW TW108117423A patent/TWI702685B/zh active
-
2021
- 2021-11-02 JP JP2021179166A patent/JP7662489B2/ja active Active
-
2025
- 2025-01-06 JP JP2025001181A patent/JP2025072361A/ja not_active Withdrawn
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