JP2021519948A - フォトニクス構造光信号伝送領域の作製 - Google Patents
フォトニクス構造光信号伝送領域の作製 Download PDFInfo
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Abstract
Description
本出願は、2018年4月5日に出願された米国仮出願第62/653,232号、発明の名称「Fabricating Photonics Structure Light Signal Transmission Regions」の優先権の利益を主張し、その全体が参照により本明細書に組み込まれる2019年4月2日に出願された米国非仮出願第16/372,763号、発明の名称「Fabricating Photonics Structure Light Signal Transmission Regions」の優先権の利益を主張し、その全体が参照により本明細書に組み込まれる。本出願は、2018年4月5日に出願された米国仮出願第62/653,232号、発明の名称「Fabricating Photonics Structure Light Signal Transmission Regions」の優先権の利益を主張し、その全体が参照により本明細書に組み込まれる。
本発明は、助成金契約番号HR0011ー12ー2ー0007の下で、米国の国防高等研究計画局(DARPA)の下で政府の支援を受けてなされた。政府は、本発明において一定の権利を有し得る。
Claims (24)
- 方法であって、
炭窒化シリコンで形成された層を、前記炭窒化シリコンで形成された層が、フォトニクス構造の光信号伝送領域を通って延在する第1の部分を含むように、さらに、前記炭窒化シリコンで形成された層が、導電材料形成物上に形成された第2の部分を含むように、堆積することであって、前記光信号伝送領域を通って延在する第1の部分は、誘電体スタック上に形成される、堆積することと、
前記光信号伝送領域内に前記誘電体スタックを露出させるために、前記誘電体スタック上に形成された、前記炭窒化シリコンで形成された層の前記第1の部分を除去することと、
被覆誘電材料の層を、前記被覆誘電材料の層の一部分が前記炭窒化シリコンで形成された層上に形成され、前記被覆誘電材料の層の一部分が前記光信号伝送領域内に形成された前記誘電体スタックの露出部分上に形成されるように、堆積することと、
前記被覆誘電材料の上面が水平面内に延在するように、前記被覆誘電材料の層を平坦化することと、を含む、方法。 - 前記方法は、前記第1の部分の前記除去に続き、前記光信号伝送領域から前記炭窒化シリコンで形成された層の残留量を洗浄することを含む、請求項1に記載の方法。
- 前記方法は、前記炭窒化シリコンで形成された層の前記堆積の前に、作製の中間段階で前記フォトニクス構造の平坦な上面を画定するために前記フォトニクス構造を平坦化することであって、それによって、前記平坦な上面が部分的に前記誘電体スタックによって画定され、かつ部分的に前記導電材料形成物によって画定される、平坦化することを含み、炭窒化シリコンで形成された層の前記堆積は、前記平坦な上面に前記炭窒化シリコンで形成された層を堆積することを含む、請求項1または2に記載の方法。
- フォトニクス構造の前記光信号伝送領域は、第1の垂直に延在する平面と離間した第2の垂直に延在する平面との間に画定され、前記炭窒化シリコンで形成された層の前記第1の部分の前記除去は、前記炭窒化シリコンで形成された層の高さを通した前記光信号伝送領域内の光信号の伝送を促進する、請求項1から3のいずれか一項に記載の方法。
- 前記炭窒化シリコンで形成された層の前記第1の部分の前記除去は、前記炭窒化シリコンで形成された層の高さを通した前記光信号伝送領域内の光信号の伝送を促進する、請求項1から4のいずれか一項に記載の方法。
- 炭窒化シリコンで形成された層の前記堆積によって、前記炭窒化シリコンで形成された層は、第1の垂直に延在する平面と第2の垂直に延在する平面との間に画定されたフォトニクス構造の光信号伝送領域を通って延在する前記第1の部分を含み、さらに、前記炭窒化シリコンで形成された層は、導電材料形成物上に形成された前記第2の部分を含み、前記光信号伝送領域を通って延在する前記第1の部分は、前記誘電体スタック上に形成され、さらに、前記炭窒化シリコンで形成された層は、第2の導電材料形成物上に形成された第3の部分を含み、前記第2の導電材料形成物は、前記導電材料形成物から離間され、かつ前記導電材料形成物と共通の高さにある、請求項1から5のいずれか一項に記載の方法。
- 前記導電材料形成物は、銅(Cu)で形成された金属化層によって画定された導電材料形成物である、請求項1から6のいずれか一項に記載の方法。
- 炭窒化シリコンで形成された層の前記堆積は、第1の高さで表面上に前記炭窒化シリコンで形成された層を堆積することを含み、前記方法は、前記誘電体スタック内にフォトニクスデバイスを作製することを含み、前記フォトニクスデバイスは前記第1の高さを通して光信号を送信または受信するように構成されている、請求項1から7のいずれか一項に記載の方法。
- 炭窒化シリコンで形成された層の前記堆積は、第1の高さで表面上に前記炭窒化シリコンで形成された層を堆積することを含み、前記方法は、前記誘電体スタック内に、前記第1の高さを通して光信号を送信または受信するフォトニクスデバイスを作製することを含む、請求項1から8のいずれか一項に記載の方法。
- 前記方法は、前記被覆誘電材料の層上にフォトニクス構造を作製することを含む、請求項1から9のいずれか一項に記載の方法。
- 前記方法が、前記被覆誘電材料の層上に導波管を作製することを含み、前記作製することは、前記被覆誘電材料の層上に導波管材料を堆積することと、導波管を画定するために前記導波管材料をパターン形成することと、前記導波管上に酸化物を堆積して、前記酸化物を平坦化することと、を含む、請求項1から10のいずれか一項に記載の方法。
- 方法であって、
窒化シリコンで形成された層を、前記窒化シリコンで形成された層が、フォトニクス構造の光信号伝送領域を通って延在する第1の部分を含むように、さらに、前記窒化シリコンで形成された層が、導電材料形成物上に形成された第2の部分を含むように、堆積することであって、前記光信号伝送領域を通って延在する前記第1の部分は、誘電体スタック上に形成される、堆積することと、
前記光信号伝送領域内に前記誘電体スタックを露出させるために、前記誘電体スタック上に形成された、前記窒化シリコンで形成された層の前記第1の部分の材料を除去することと、
被覆誘電材料の層を、前記被覆誘電材料の層の一部分が前記窒化シリコンで形成された層上に形成され、前記被覆誘電材料の層の一部分が前記光信号伝送領域内に形成された前記誘電体スタックの前記露出された部分上に形成されるように、堆積することと、
前記被覆誘電材料の上面が水平面内に延在するように、前記被覆誘電材料の層を平坦化することと、を含む、方法。 - フォトニクス構造の前記光信号伝送領域は、第1の垂直に延在する平面と離間した第2の垂直に延在する平面との間に画定され、前記窒化シリコンで形成された層の前記第1の部分の前記除去は、前記窒化シリコンで形成された層の高さを通した前記光信号伝送領域内の光信号の伝送を促進する、請求項12に記載の方法。
- 前記窒化シリコンで形成された層の前記第1の部分の前記除去は、前記窒化シリコンで形成された層の高さを通した前記光信号伝送領域内の光信号の伝送を促進する、請求項12または13に記載の方法。
- 前記方法は、前記除去に続いて、前記光信号伝送領域から前記窒化シリコンで形成された層の残留量の洗浄を含み、前記除去および前記洗浄の実施は、前記光信号伝送領域から除去される前記窒化シリコンで形成された層の材料全体を本質的にもたらす、請求項12から14のいずれか一項に記載の方法。
- 前記光信号伝送領域内に前記誘電体スタックを露出させるために、前記誘電体スタック上に形成された、前記窒化シリコンで形成された層の前記第1の部分の材料の前記除去は、有機リソグラフィパターン形成スタックの使用を含み、前記有機リソグラフィパターン形成スタックの残留部分を洗浄することを含む、請求項12から15のいずれか一項に記載の方法。
- 前記方法は、前記窒化シリコンで形成された層の前記堆積の前に、前記フォトニクス構造を平坦化して、窒化シリコンで形成された層の前記堆積の実行時に、前記フォトニクス構造が作製段階にあるようにすることを含み、前記フォトニクス構造の平坦な上面は、前記導電材料形成物および前記誘電体スタックによって画定されている、請求項12から16のいずれか一項に記載の方法。
- 前記方法は、前記窒化シリコンで形成された層の前記堆積の前に、前記フォトニクス構造を平坦化して、窒化シリコンで形成された層の前記堆積の実行時に、前記フォトニクス構造が作製段階にあるようにすることを含み、前記フォトニクス構造の平坦な上面は、前記導電材料形成物および前記誘電体スタックによって画定されており、窒化シリコンで形成された層の前記堆積は、前記フォトニクス構造の前記平坦な上面に前記窒化シリコンで形成された層を堆積することを含む、請求項12から17のいずれか一項に記載の方法。
- 窒化シリコンで形成された層の前記堆積は、前記窒化シリコンで形成された層の第3の部分が第2の導電材料形成物上に形成され、前記第2の導電材料形成物は、前記導電材料形成物から離間され、かつ前記導電材料形成物と共通の高さにあるように実行される、請求項12から18のいずれか一項に記載の方法。
- 前記導電材料形成物は、銅(Cu)で形成された金属化層導電材料形成物である、請求項12から19のいずれか一項に記載の方法。
- 前記光信号伝送領域内に前記誘電体スタックを露出させるために、前記誘電体スタック上に形成された、前記窒化シリコンで形成された層の前記第1の部分の材料の前記除去は、前記光信号伝送領域内で窒化シリコン導波管をパターン形成することを含み、前記窒化シリコン導波管は、前記窒化シリコンで形成された層によって画定される、請求項12から20のいずれか一項に記載の方法。
- 前記光信号伝送領域内に前記誘電体スタックを露出させるために、前記誘電体スタック上に形成された、前記窒化シリコンで形成された層の前記第1の部分の材料の前記除去は、前記光信号伝送領域内で、前記窒化シリコンで形成された層によって画定された窒化シリコン導波管をパターン形成することを含み、前記窒化シリコン導波管は、基準座標系の基準X軸と平行に延在する光透過軸を有し、前記第1の垂直に延在する平面および前記第2の垂直に延在する平面は、前記基準座標系のXZ平面に平行に延在する、請求項13に記載の方法。
- 窒化シリコンで形成された層の前記堆積は、第1の高さで表面上に前記窒化シリコンで形成された層を堆積することを含み、前記方法は、前記誘電体スタックを含む前記誘電体スタック内に、フォトニクスデバイスを作製することを含み、前記フォトニクスデバイスは、前記第1の高さを通して光信号を送信または受信するように構成されている、請求項12から22のいずれか一項に記載の方法。
- 窒化シリコンで形成された層の前記堆積は、第1の高さで表面上に前記窒化シリコンで形成された層を堆積することを含み、前記方法は、前記誘電体スタック内に、前記第1の高さを通して光信号を送信または受信するフォトニクスデバイスを作製することを含む、請求項12から23のいずれか一項に記載の方法。
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WO2019195367A1 (en) | 2019-10-10 |
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