JP2021518657A5 - - Google Patents

Info

Publication number
JP2021518657A5
JP2021518657A5 JP2020549592A JP2020549592A JP2021518657A5 JP 2021518657 A5 JP2021518657 A5 JP 2021518657A5 JP 2020549592 A JP2020549592 A JP 2020549592A JP 2020549592 A JP2020549592 A JP 2020549592A JP 2021518657 A5 JP2021518657 A5 JP 2021518657A5
Authority
JP
Japan
Prior art keywords
dies
manufacturing
profile
identifying
die
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020549592A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021518657A (ja
JP7105904B2 (ja
Filing date
Publication date
Priority claimed from US16/038,973 external-priority patent/US10867877B2/en
Application filed filed Critical
Publication of JP2021518657A publication Critical patent/JP2021518657A/ja
Publication of JP2021518657A5 publication Critical patent/JP2021518657A5/ja
Application granted granted Critical
Publication of JP7105904B2 publication Critical patent/JP7105904B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020549592A 2018-03-20 2019-03-19 製造データに基づく半導体デバイスのターゲットされたリコール Active JP7105904B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862645406P 2018-03-20 2018-03-20
US62/645,406 2018-03-20
US16/038,973 2018-07-18
US16/038,973 US10867877B2 (en) 2018-03-20 2018-07-18 Targeted recall of semiconductor devices based on manufacturing data
PCT/US2019/022833 WO2019183008A1 (en) 2018-03-20 2019-03-19 Targeted recall of semiconductor devices based on manufacturing data

Publications (3)

Publication Number Publication Date
JP2021518657A JP2021518657A (ja) 2021-08-02
JP2021518657A5 true JP2021518657A5 (https=) 2022-03-29
JP7105904B2 JP7105904B2 (ja) 2022-07-25

Family

ID=67983244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020549592A Active JP7105904B2 (ja) 2018-03-20 2019-03-19 製造データに基づく半導体デバイスのターゲットされたリコール

Country Status (7)

Country Link
US (1) US10867877B2 (https=)
JP (1) JP7105904B2 (https=)
KR (1) KR102450010B1 (https=)
CN (1) CN111868903B (https=)
DE (1) DE112019001445T5 (https=)
TW (1) TWI787484B (https=)
WO (1) WO2019183008A1 (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7219046B2 (ja) * 2018-10-12 2023-02-07 株式会社アドバンテスト 解析装置、解析方法および解析プログラム
JP7219045B2 (ja) * 2018-10-12 2023-02-07 株式会社アドバンテスト 解析装置、解析方法および解析プログラム
US10930597B2 (en) * 2019-03-27 2021-02-23 Kla-Tencor Corporation Die screening using inline defect information
US11615533B2 (en) * 2019-07-12 2023-03-28 Bruker Nano, Inc. Methods and systems for product failure prediction based on X-ray image re-examination
US11293970B2 (en) * 2020-01-12 2022-04-05 Kla Corporation Advanced in-line part average testing
US11754625B2 (en) * 2020-01-30 2023-09-12 Kla Corporation System and method for identifying latent reliability defects in semiconductor devices
JP7518180B2 (ja) * 2020-03-03 2024-07-17 ピーディーエフ ソリューションズ,インコーポレイテッド 寿命初期故障を起こしやすいダイの予測
WO2022098354A1 (en) 2020-11-05 2022-05-12 Kla Corporation Systems and methods for measurement of misregistration and amelioration thereof
CN114512415B (zh) * 2020-11-17 2025-09-02 台湾积体电路制造股份有限公司 半导体测试元件及半导体测试方法
US20220196723A1 (en) * 2020-12-18 2022-06-23 Kla Corporation System and method for automatically identifying defect-based test coverage gaps in semiconductor devices
US11656274B2 (en) * 2021-02-15 2023-05-23 Kla Corporation Systems and methods for evaluating the reliability of semiconductor die packages
US12422376B2 (en) * 2021-03-24 2025-09-23 Kla Corporation Imaging reflectometry for inline screening
US11798827B2 (en) 2021-05-06 2023-10-24 Kla Corporation Systems and methods for semiconductor adaptive testing using inline defect part average testing
US11624775B2 (en) * 2021-06-07 2023-04-11 Kla Corporation Systems and methods for semiconductor defect-guided burn-in and system level tests
US11614480B2 (en) * 2021-06-08 2023-03-28 Kla Corporation System and method for Z-PAT defect-guided statistical outlier detection of semiconductor reliability failures
US12007428B2 (en) * 2021-10-08 2024-06-11 Advantest Corporation Systems and methods for multidimensional dynamic part average testing
CN117074923B (zh) * 2023-10-11 2023-12-12 蓝芯存储技术(赣州)有限公司 芯片老化测试方法、装置、设备及存储介质
CN118858892B (zh) * 2024-07-17 2025-08-22 深圳市立可自动化设备有限公司 半导体芯片测试方法及系统
CN119556177B (zh) * 2025-01-24 2025-06-10 山东科技大学 一种燃料电池故障诊断方法、设备及介质

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7796801B2 (en) 1999-08-26 2010-09-14 Nanogeometry Research Inc. Pattern inspection apparatus and method
US7474001B2 (en) 2001-11-21 2009-01-06 Hermes-Microvision, Inc. Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturing
US7062411B2 (en) 2003-06-11 2006-06-13 Scientific Systems Research Limited Method for process control of semiconductor manufacturing equipment
JP3913715B2 (ja) * 2003-06-18 2007-05-09 株式会社東芝 不良検出方法
US7291507B2 (en) * 2004-09-23 2007-11-06 Pixim, Inc. Using a time invariant statistical process variable of a semiconductor chip as the chip identifier
JP4799574B2 (ja) * 2008-02-29 2011-10-26 株式会社東芝 線状パターンの検知方法および装置
US7878336B2 (en) * 2008-09-09 2011-02-01 Cheng Mei Instrument Technology Co., Ltd. System and method for inspection of chips on tray
JP5416025B2 (ja) 2010-04-22 2014-02-12 株式会社神戸製鋼所 表面形状測定装置および半導体ウェハ検査装置
US8627251B2 (en) * 2012-04-25 2014-01-07 Taiwan Semiconductor Manufacturing Co., Ltd. Systems and methods of automatically detecting failure patterns for semiconductor wafer fabrication processes
US8948495B2 (en) * 2012-08-01 2015-02-03 Kla-Tencor Corp. Inspecting a wafer and/or predicting one or more characteristics of a device being formed on a wafer
US9466101B2 (en) 2013-05-01 2016-10-11 Taiwan Semiconductor Manufacturing Company Limited Detection of defects on wafer during semiconductor fabrication
US10127652B2 (en) * 2014-02-06 2018-11-13 Kla-Tencor Corp. Defect detection and classification based on attributes determined from a standard reference image
JP2017009379A (ja) * 2015-06-19 2017-01-12 株式会社ニューフレアテクノロジー 検査装置および検査方法
US9891267B2 (en) * 2016-06-14 2018-02-13 Nxp Usa, Inc. Kernel based cluster fault analysis
US10761128B2 (en) 2017-03-23 2020-09-01 Kla-Tencor Corporation Methods and systems for inline parts average testing and latent reliability defect detection
US11435393B2 (en) 2017-11-03 2022-09-06 Tokyo Electron Limited Enhancement of yield of functional microelectronic devices

Similar Documents

Publication Publication Date Title
JP2021518657A5 (https=)
TWI651789B (zh) 用於對疊對誤差之前饋和反饋校正之統計疊對誤差預測、根本原因分析及程序控制
KR101466798B1 (ko) 제조 공정에서의 제품 불량의 원인 설비를 탐지하는 방법 및 장치
US9891267B2 (en) Kernel based cluster fault analysis
US20140006570A1 (en) Method and system for customer specific test system allocation in a production environment
KR20070073859A (ko) 가중된 주성분 분석에 기초한 고장 검출 시스템 및 방법
US11480951B2 (en) Method and device for producing a product and computer program product
KR20060034690A (ko) 결함 검출에 기초하여 계측 디스패칭을 수행하는 방법 및장치
JP7664405B2 (ja) 半導体ダイパッケージの信頼性を評価するためのシステムおよび方法
CN115362457B (zh) 预测容易发生过早使用寿命失效的裸片
TW202312002A (zh) 用於重建構半導體構件在晶圓上的位置的方法與設備
US20230238262A1 (en) Semiconductor manufacturing process prediction method and semiconductor manufacturing process prediction device
US6905895B1 (en) Predicting process excursions based upon tool state variables
US6697691B1 (en) Method and apparatus for fault model analysis in manufacturing tools
US8239151B2 (en) Method and apparatus for analysis of continuous data using binary parsing
JP2020004070A (ja) 半導体製品品質管理サーバ、半導体装置、および半導体製品品質管理システム
US7236848B2 (en) Data representation relating to a non-sampled workpiece
US7315765B1 (en) Automated control thread determination based upon post-process consideration
CN117592242A (zh) 用于在总测试时间方面优化测试集合的方法和设备
TW202310110A (zh) 晶圓缺陷測試設備、晶圓缺陷測試系統以及晶圓的製造方法
WO2014024178A1 (en) Method of improving wafer yield
US20100014745A1 (en) Inspecting method and inspecting equipment
JP5061719B2 (ja) 基板検査装置及び方法
JP2006513561A (ja) パラレル欠陥検出
TWI514492B (zh) 驗證晶圓之電性測試是否存在偏移誤差的方法