JP2021027267A - 垂直共振器型発光素子 - Google Patents
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- JP2021027267A JP2021027267A JP2019146049A JP2019146049A JP2021027267A JP 2021027267 A JP2021027267 A JP 2021027267A JP 2019146049 A JP2019146049 A JP 2019146049A JP 2019146049 A JP2019146049 A JP 2019146049A JP 2021027267 A JP2021027267 A JP 2021027267A
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- 239000004065 semiconductor Substances 0.000 claims abstract description 182
- 239000000758 substrate Substances 0.000 claims abstract description 104
- 238000005498 polishing Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 3
- 238000002347 injection Methods 0.000 abstract description 7
- 239000007924 injection Substances 0.000 abstract description 7
- 239000000243 solution Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 168
- 230000003287 optical effect Effects 0.000 description 34
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000000203 mixture Substances 0.000 description 9
- 239000002184 metal Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000017525 heat dissipation Effects 0.000 description 4
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical group [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
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- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
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- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
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- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/42—Arrays of surface emitting lasers
- H01S5/423—Arrays of surface emitting lasers having a vertical cavity
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
11 p電極(接続電極)
12、21 第1の反射鏡
13、22 透光電極(第1の電極)
15 光半導体層
16 第2の反射鏡
17、24 半導体基板
Claims (9)
- 第1の多層膜反射鏡と、
前記第1の多層膜反射鏡上に形成された透光性の第1の電極と、
前記第1の電極層上に形成された第1の導電型を有する第1の半導体層と、
前記第1の半導体層上に形成された発光層と、
前記発光層上に形成され、前記第1の導電型とは反対の第2の導電型を有する第2の半導体層と、
前記第2の半導体層上に形成され、前記第2の導電型を有する複数の半導体膜からなり、前記第1の反射鏡と共に共振器を構成する第2の多層膜反射鏡と、
前記第2の多層膜反射鏡上に形成され、上面及び前記上面から突出する凸部を有し、前記第2の導電型を有する半導体基板と、
前記半導体基板の前記上面上に形成された第2の電極と、を有することを特徴とする垂直共振器型発光素子。 - 前記半導体基板の前記凸部は、研磨されることで鏡面化された頂面を有することを特徴とする請求項1に記載の垂直共振器型発光素子。
- 前記半導体基板の前記凸部は、前記頂面の近傍に形成され、当該研磨されることで前記第2の導電型が損なわれたダメージ層を有することを特徴とする請求項2に記載の垂直共振器型発光素子。
- 前記半導体基板の前記上面は、当該研磨された後に当該研磨面がエッチングによって除去された前記半導体基板の表面領域であることを特徴とする請求項2又は3に記載の垂直共振器型発光素子。
- 前記第2の多層膜反射鏡は、前記発光層から放出された光に対して前記第1の多層膜反射鏡よりも小さな反射率を有することを特徴とする請求項1乃至4のいずれか1つに記載の垂直共振器型発光素子。
- 前記第1の多層膜反射鏡を埋め込むように前記第1の多層膜反射鏡上に形成され、前記第1の電極に接続された接続電極を有することを特徴とする請求項1乃至5のいずれか1つに記載の垂直共振器型発光素子。
- 前記接続電極は、前記第1の多層膜反射鏡を貫通して前記第1の電極に接続されていることを特徴とする請求項6に記載の垂直共振器型発光素子。
- 前記半導体基板の前記凸部を覆うように形成された反射防止層を有することを特徴とする請求項1乃至7のいずれか1つに記載の垂直共振器型発光素子。
- 前記第2の電極は、前記凸部から離間して形成されている請求項1乃至8のいずれか1つに記載の垂直共振器型発光素子。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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JP2019146049A JP7330805B2 (ja) | 2019-08-08 | 2019-08-08 | 垂直共振器型発光素子 |
US17/633,486 US20220285917A1 (en) | 2019-08-08 | 2020-07-15 | Vertical cavity light-emitting element |
CN202080056286.9A CN114207969A (zh) | 2019-08-08 | 2020-07-15 | 垂直谐振器型发光元件 |
EP20850937.2A EP4012855A4 (en) | 2019-08-08 | 2020-07-15 | VERTICAL RESONATOR TYPE ELECTROLUMINESCENT ELEMENT |
PCT/JP2020/027475 WO2021024719A1 (ja) | 2019-08-08 | 2020-07-15 | 垂直共振器型発光素子 |
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JP7330805B2 JP7330805B2 (ja) | 2023-08-22 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2015126040A (ja) * | 2013-12-26 | 2015-07-06 | 株式会社リコー | 発光デバイス、光源装置及びレーザ装置 |
US20150311673A1 (en) * | 2014-04-29 | 2015-10-29 | Princeton Optronics Inc. | Polarization Control in High Peak Power, High Brightness VCSEL |
WO2017047317A1 (ja) * | 2015-09-15 | 2017-03-23 | ソニー株式会社 | 面発光レーザ |
JP2017098328A (ja) * | 2015-11-19 | 2017-06-01 | 学校法人 名城大学 | 垂直共振器型発光素子 |
JP2017212270A (ja) * | 2016-05-24 | 2017-11-30 | スタンレー電気株式会社 | 面発光レーザ装置 |
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JP3990846B2 (ja) * | 1999-08-27 | 2007-10-17 | キヤノン株式会社 | 面型光素子、その製造方法、およびこれを用いた装置 |
US6888871B1 (en) * | 2000-07-12 | 2005-05-03 | Princeton Optronics, Inc. | VCSEL and VCSEL array having integrated microlenses for use in a semiconductor laser pumped solid state laser system |
JP6479308B2 (ja) * | 2013-08-09 | 2019-03-06 | ソニー株式会社 | 面発光レーザ素子及びその製造方法 |
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- 2020-07-15 WO PCT/JP2020/027475 patent/WO2021024719A1/ja unknown
- 2020-07-15 CN CN202080056286.9A patent/CN114207969A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2015126040A (ja) * | 2013-12-26 | 2015-07-06 | 株式会社リコー | 発光デバイス、光源装置及びレーザ装置 |
US20150311673A1 (en) * | 2014-04-29 | 2015-10-29 | Princeton Optronics Inc. | Polarization Control in High Peak Power, High Brightness VCSEL |
WO2017047317A1 (ja) * | 2015-09-15 | 2017-03-23 | ソニー株式会社 | 面発光レーザ |
JP2017098328A (ja) * | 2015-11-19 | 2017-06-01 | 学校法人 名城大学 | 垂直共振器型発光素子 |
JP2017212270A (ja) * | 2016-05-24 | 2017-11-30 | スタンレー電気株式会社 | 面発光レーザ装置 |
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JP7330805B2 (ja) | 2023-08-22 |
EP4012855A1 (en) | 2022-06-15 |
WO2021024719A1 (ja) | 2021-02-11 |
CN114207969A (zh) | 2022-03-18 |
US20220285917A1 (en) | 2022-09-08 |
EP4012855A4 (en) | 2023-09-06 |
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