JP2020528563A5 - - Google Patents
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- Publication number
- JP2020528563A5 JP2020528563A5 JP2019560247A JP2019560247A JP2020528563A5 JP 2020528563 A5 JP2020528563 A5 JP 2020528563A5 JP 2019560247 A JP2019560247 A JP 2019560247A JP 2019560247 A JP2019560247 A JP 2019560247A JP 2020528563 A5 JP2020528563 A5 JP 2020528563A5
- Authority
- JP
- Japan
- Prior art keywords
- molecules
- chamber
- silane
- water
- silane compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000077 silane Inorganic materials 0.000 claims 14
- 238000000034 method Methods 0.000 claims 10
- -1 silane compound Chemical class 0.000 claims 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 8
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 6
- 239000011248 coating agent Substances 0.000 claims 5
- 238000000576 coating method Methods 0.000 claims 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 4
- 239000000126 substance Substances 0.000 claims 3
- 235000012239 silicon dioxide Nutrition 0.000 claims 2
- 239000000377 silicon dioxide Substances 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 229910052729 chemical element Inorganic materials 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- XCLIHDJZGPCUBT-UHFFFAOYSA-N dimethylsilanediol Chemical compound C[Si](C)(O)O XCLIHDJZGPCUBT-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762537291P | 2017-07-26 | 2017-07-26 | |
| US201762537270P | 2017-07-26 | 2017-07-26 | |
| US62/537,270 | 2017-07-26 | ||
| US62/537,291 | 2017-07-26 | ||
| US16/028,039 | 2018-07-05 | ||
| US16/028,039 US10752989B2 (en) | 2017-07-26 | 2018-07-05 | Methods of applying silane coatings |
| PCT/US2018/041117 WO2019022943A1 (en) | 2017-07-26 | 2018-07-06 | METHODS OF APPLICATION OF SILANE COATINGS |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020528563A JP2020528563A (ja) | 2020-09-24 |
| JP2020528563A5 true JP2020528563A5 (enExample) | 2021-08-12 |
| JP7427857B2 JP7427857B2 (ja) | 2024-02-06 |
Family
ID=65040828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019560247A Active JP7427857B2 (ja) | 2017-07-26 | 2018-07-06 | シランコーティングの適用方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US10752989B2 (enExample) |
| JP (1) | JP7427857B2 (enExample) |
| WO (1) | WO2019022943A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11079528B2 (en) | 2018-04-12 | 2021-08-03 | Moxtek, Inc. | Polarizer nanoimprint lithography |
| US11746418B2 (en) * | 2018-12-03 | 2023-09-05 | Moxtek, Inc. | Chemical vapor deposition of thick inorganic coating on a polarizer |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6785050B2 (en) * | 2002-05-09 | 2004-08-31 | Moxtek, Inc. | Corrosion resistant wire-grid polarizer and method of fabrication |
| JP2004138762A (ja) | 2002-10-17 | 2004-05-13 | Dainippon Printing Co Ltd | シリカ薄膜とその製造装置、及びシリカ薄膜を用いた透明積層フィルム |
| DE10248775A1 (de) * | 2002-10-18 | 2004-04-29 | Swissoptic Ag | Gasphasenabscheidung von perfluorierten Alkylsilanen |
| US20050271893A1 (en) * | 2004-06-04 | 2005-12-08 | Applied Microstructures, Inc. | Controlled vapor deposition of multilayered coatings adhered by an oxide layer |
| KR100762573B1 (ko) | 2004-06-04 | 2007-10-01 | 어플라이드 마이크로스트럭쳐스, 인코포레이티드 | 산화물층에 의해 부착된 다층 코팅의 제어되는 기상 증착 |
| JP5371495B2 (ja) * | 2009-03-09 | 2013-12-18 | 旭化成イーマテリアルズ株式会社 | 高耐久性ワイヤグリッド偏光板 |
| JP2011216862A (ja) | 2010-03-16 | 2011-10-27 | Tokyo Electron Ltd | 成膜方法及び成膜装置 |
| US8728956B2 (en) | 2010-04-15 | 2014-05-20 | Novellus Systems, Inc. | Plasma activated conformal film deposition |
| JP2012032690A (ja) * | 2010-08-02 | 2012-02-16 | Seiko Epson Corp | 光学物品およびその製造方法 |
| JP2012185349A (ja) * | 2011-03-07 | 2012-09-27 | Seiko Epson Corp | レンズ及びレンズの製造方法 |
| US8734903B2 (en) * | 2011-09-19 | 2014-05-27 | Pilkington Group Limited | Process for forming a silica coating on a glass substrate |
| US9995864B2 (en) * | 2015-04-03 | 2018-06-12 | Moxtek, Inc. | Wire grid polarizer with silane protective coating |
| US9703028B2 (en) | 2015-04-03 | 2017-07-11 | Moxtek, Inc. | Wire grid polarizer with phosphonate protective coating |
| US20160289458A1 (en) * | 2015-04-03 | 2016-10-06 | Moxtek, Inc. | Hydrophobic Phosphonate and Silane Chemistry |
-
2018
- 2018-07-05 US US16/028,039 patent/US10752989B2/en active Active
- 2018-07-06 WO PCT/US2018/041117 patent/WO2019022943A1/en not_active Ceased
- 2018-07-06 JP JP2019560247A patent/JP7427857B2/ja active Active
-
2020
- 2020-07-20 US US16/933,090 patent/US11822182B2/en active Active
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