JP7427857B2 - シランコーティングの適用方法 - Google Patents
シランコーティングの適用方法 Download PDFInfo
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- 229910000077 silane Inorganic materials 0.000 title claims description 94
- 238000000576 coating method Methods 0.000 title claims description 66
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims description 65
- 239000011248 coating agent Substances 0.000 title claims description 63
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 31
- -1 silane compound Chemical class 0.000 claims description 29
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 11
- 235000012239 silicon dioxide Nutrition 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 10
- 229910052729 chemical element Inorganic materials 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 238000005229 chemical vapour deposition Methods 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 13
- 238000000151 deposition Methods 0.000 description 11
- 230000001681 protective effect Effects 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 9
- 150000004756 silanes Chemical class 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000000383 hazardous chemical Substances 0.000 description 4
- 231100000206 health hazard Toxicity 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000001165 hydrophobic group Chemical group 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 125000004404 heteroalkyl group Chemical group 0.000 description 2
- 125000001072 heteroaryl group Chemical group 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002195 soluble material Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000003107 substituted aryl group Chemical group 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000001017 electron-beam sputter deposition Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 239000013461 intermediate chemical Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
- G02F1/133548—Wire-grid polarisers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/03—Viewing layer characterised by chemical composition
- C09K2323/033—Silicon compound, e.g. glass or organosilicon
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- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Polarising Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
Description
本明細書で使用する、「アルキル」は、分岐、非分岐、環式、飽和、不飽和、置換された、非置換のアルキル、および、ヘテロアルキル炭化水素基を指す。本明細書で使用する、「置換されたアルキル」は、
1または複数の置換基で置換されたアルキルを指し、「ヘテロアルキル」という用語は、少なくとも1つの炭素原子がヘテロ原子で置き換えられているアルキルを指す。蒸着を容易にするために、アルキルは、例えば、炭素原子が2個以下、炭素原子が3個以下、炭素原子が5個以下、または、炭素原子が10個以下のように、比較的低級であってよい。
式中、rは、例えば、>5、>10、>100、または、>500のようなポリマの長さを示し得る。R1は、例えば、疎水基または親水基のような、任意の化学元素または基であり得る。R1は、例えば、CF3(CF2)n(CH2)mのようなパーフルオロ化された基を含み得る炭素鎖を備えてよく、式中、nおよびmは、4≦n≦10および2≦m≦5の範囲内の整数である。疎水基の他の例は、参照により本明細書に組み込まれる米国特許公開第2016/0291226号に説明されている。
式中、各R4は、例えば、本明細書に記載されるように疎水基、または、親水基のような任意の化学元素または基を含んでよく、かつ、Xは、デバイス10への結合を含んでよい。各R1は、独立に、-OSi(CH3)3であり得、R2は、上で定義される通り、または、任意の他の化学元素または基である。
Claims (10)
- ワイヤグリッド偏光子上にシラン化合物を化学気相成長させる方法であって、
前記ワイヤグリッド偏光子をチャンバ内に配置する段階と、
前記チャンバ内にシラン化合物と水とを導入する段階であって、前記シラン化合物と前記水とは、前記チャンバ内で気相である、段階と、
前記チャンバ内で前記シラン化合物と前記水とを同時に前記気相に維持し、かつ、前記チャンバ内で前記シラン化合物と前記水とを反応させて、(R1)2Si(OH)2分子を形成する段階であって、式中、各R1は、独立に任意の化学元素または基である、段階と、
前記(R1)2Si(OH)2分子と前記ワイヤグリッド偏光子および他の(R1)2Si(OH)2分子との化学反応により、前記ワイヤグリッド偏光子上にシランコーティングを形成する段階とを備える
方法。 - 前記(R1)2Si(OH)2分子は、R1Si(OH)3を含み、前記R1Si(OH)3は、ガス状分子であり、かつ
R1Si(OH)3において、R1は、パーフルオロ化された基を含む炭素鎖を有する、
請求項1に記載の方法。 - 前記シラン化合物は、R1Si(R2)3分子を含み、
各R2は、独立に-Cl、-OR3、-OCOR3、または、-N(R3)2であり、
各R3は、独立に-CH3、-CH2CH3、または、-CH2CH2CH3であり、
前記(R1)2Si(OH)2分子はR1Si(OH)3分子を含み、前記R1Si(OH)3分子は、ガス状分子である、
請求項1または請求項2に記載の方法。 - 前記シランコーティングの厚さを2nm以上20nm以下の間とするように、前記チャンバ内の前記水の量を制御する段階をさらに備える、
請求項1から請求項4のいずれか1項に記載の方法。 - 前記チャンバ内に前記シラン化合物と前記水とを導入する前に、前記ワイヤグリッド偏光子上に二酸化シリコンのコンフォーマルコーティングを適用する段階であって、前記二酸化シリコンのコンフォーマルコーティングは、0.5nm以上30nm以下の厚さを有する、段階をさらに備える、
請求項1から請求項5のいずれか1項に記載の方法。 - 前記シランコーティングの形成は、シランと前記ワイヤグリッド偏光子との間に共有結合を形成する段階と、各層のシランと隣接する層のシランとの間で共有結合を形成する段階とを含む、
請求項1から請求項6のいずれか1項に記載の方法。 - 前記シラン化合物と前記水とを前記チャンバ内で、同時に、少なくとも5分間、前記気相に維持する段階をさらに備える、
請求項1から請求項7のいずれか1項に記載の方法。 - 前記チャンバ内の、前記気相である前記水の密度は、0.3g/m3と30g/m3との間である、
請求項1から請求項9のいずれか1項に記載の方法。
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US201762537270P | 2017-07-26 | 2017-07-26 | |
US201762537291P | 2017-07-26 | 2017-07-26 | |
US62/537,291 | 2017-07-26 | ||
US62/537,270 | 2017-07-26 | ||
US16/028,039 US10752989B2 (en) | 2017-07-26 | 2018-07-05 | Methods of applying silane coatings |
US16/028,039 | 2018-07-05 | ||
PCT/US2018/041117 WO2019022943A1 (en) | 2017-07-26 | 2018-07-06 | METHODS OF APPLICATION OF SILANE COATINGS |
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US11079528B2 (en) | 2018-04-12 | 2021-08-03 | Moxtek, Inc. | Polarizer nanoimprint lithography |
US11746418B2 (en) * | 2018-12-03 | 2023-09-05 | Moxtek, Inc. | Chemical vapor deposition of thick inorganic coating on a polarizer |
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US20160291209A1 (en) | 2015-04-03 | 2016-10-06 | Brigham Young University | Wire Grid Polarizer with Silane Protective Coating |
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WO2019022943A1 (en) | 2019-01-31 |
JP2020528563A (ja) | 2020-09-24 |
US20200347495A1 (en) | 2020-11-05 |
US10752989B2 (en) | 2020-08-25 |
US11822182B2 (en) | 2023-11-21 |
US20190032202A1 (en) | 2019-01-31 |
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