JP7427857B2 - シランコーティングの適用方法 - Google Patents

シランコーティングの適用方法 Download PDF

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JP7427857B2
JP7427857B2 JP2019560247A JP2019560247A JP7427857B2 JP 7427857 B2 JP7427857 B2 JP 7427857B2 JP 2019560247 A JP2019560247 A JP 2019560247A JP 2019560247 A JP2019560247 A JP 2019560247A JP 7427857 B2 JP7427857 B2 JP 7427857B2
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silane
molecules
chamber
water
coating
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JP2020528563A (ja
JP2020528563A5 (enExample
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ディワン、アナブハフ
リンフォード、マット
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モックステック・インコーポレーテッド
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G02F1/133548—Wire-grid polarisers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/03—Viewing layer characterised by chemical composition
    • C09K2323/033—Silicon compound, e.g. glass or organosilicon

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Polarising Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP2019560247A 2017-07-26 2018-07-06 シランコーティングの適用方法 Active JP7427857B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201762537270P 2017-07-26 2017-07-26
US201762537291P 2017-07-26 2017-07-26
US62/537,291 2017-07-26
US62/537,270 2017-07-26
US16/028,039 US10752989B2 (en) 2017-07-26 2018-07-05 Methods of applying silane coatings
US16/028,039 2018-07-05
PCT/US2018/041117 WO2019022943A1 (en) 2017-07-26 2018-07-06 METHODS OF APPLICATION OF SILANE COATINGS

Publications (3)

Publication Number Publication Date
JP2020528563A JP2020528563A (ja) 2020-09-24
JP2020528563A5 JP2020528563A5 (enExample) 2021-08-12
JP7427857B2 true JP7427857B2 (ja) 2024-02-06

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JP2019560247A Active JP7427857B2 (ja) 2017-07-26 2018-07-06 シランコーティングの適用方法

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US (2) US10752989B2 (enExample)
JP (1) JP7427857B2 (enExample)
WO (1) WO2019022943A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11079528B2 (en) 2018-04-12 2021-08-03 Moxtek, Inc. Polarizer nanoimprint lithography
US11746418B2 (en) * 2018-12-03 2023-09-05 Moxtek, Inc. Chemical vapor deposition of thick inorganic coating on a polarizer

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006507517A (ja) 2002-05-09 2006-03-02 モックステック・インコーポレーテッド 耐蝕性ワイヤ−グリッド偏光子及び製造法
JP2007505220A (ja) 2004-06-04 2007-03-08 アプライド マイクロストラクチャーズ，インコーポレイテッド 酸化層により接着される多層コーティングの制御された気相堆積
JP2012185349A (ja) 2011-03-07 2012-09-27 Seiko Epson Corp レンズ及びレンズの製造方法
JP2014526432A (ja) 2011-09-19 2014-10-06 ピルキントン グループ リミテッド ガラス基板上にシリカコーティングを形成するプロセス
US20160291209A1 (en) 2015-04-03 2016-10-06 Brigham Young University Wire Grid Polarizer with Silane Protective Coating
US20160289458A1 (en) 2015-04-03 2016-10-06 Moxtek, Inc. Hydrophobic Phosphonate and Silane Chemistry

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004138762A (ja) 2002-10-17 2004-05-13 Dainippon Printing Co Ltd シリカ薄膜とその製造装置、及びシリカ薄膜を用いた透明積層フィルム
DE10248775A1 (de) * 2002-10-18 2004-04-29 Swissoptic Ag Gasphasenabscheidung von perfluorierten Alkylsilanen
WO2005121397A2 (en) 2004-06-04 2005-12-22 Applied Microstructures, Inc. Controlled vapor deposition of multilayered coatings adhered by an oxide layer
JP5371495B2 (ja) * 2009-03-09 2013-12-18 旭化成イーマテリアルズ株式会社 高耐久性ワイヤグリッド偏光板
JP2011216862A (ja) 2010-03-16 2011-10-27 Tokyo Electron Ltd 成膜方法及び成膜装置
US8728956B2 (en) 2010-04-15 2014-05-20 Novellus Systems, Inc. Plasma activated conformal film deposition
JP2012032690A (ja) * 2010-08-02 2012-02-16 Seiko Epson Corp 光学物品およびその製造方法
US9703028B2 (en) 2015-04-03 2017-07-11 Moxtek, Inc. Wire grid polarizer with phosphonate protective coating

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006507517A (ja) 2002-05-09 2006-03-02 モックステック・インコーポレーテッド 耐蝕性ワイヤ−グリッド偏光子及び製造法
JP2007505220A (ja) 2004-06-04 2007-03-08 アプライド マイクロストラクチャーズ，インコーポレイテッド 酸化層により接着される多層コーティングの制御された気相堆積
JP2012185349A (ja) 2011-03-07 2012-09-27 Seiko Epson Corp レンズ及びレンズの製造方法
JP2014526432A (ja) 2011-09-19 2014-10-06 ピルキントン グループ リミテッド ガラス基板上にシリカコーティングを形成するプロセス
US20160291209A1 (en) 2015-04-03 2016-10-06 Brigham Young University Wire Grid Polarizer with Silane Protective Coating
US20160289458A1 (en) 2015-04-03 2016-10-06 Moxtek, Inc. Hydrophobic Phosphonate and Silane Chemistry

Also Published As

Publication number Publication date
JP2020528563A (ja) 2020-09-24
US20200347495A1 (en) 2020-11-05
US10752989B2 (en) 2020-08-25
US20190032202A1 (en) 2019-01-31
WO2019022943A1 (en) 2019-01-31
US11822182B2 (en) 2023-11-21

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