JP2020521269A - 電極フィラメントを有するプラズマ反応器 - Google Patents
電極フィラメントを有するプラズマ反応器 Download PDFInfo
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Abstract
Description
加工対象物は、プラズマチャンバ内で静止した状態で保持することができる。
加工対象物がプラズマチャンバ内で移動するように、プラットフォームは、直線的に移動又は回転することができる。
Claims (25)
- プラズマチャンバを提供する内部空間を有し天井を有するチャンバ本体、
前記プラズマチャンバに処理ガスを供給するガス供給器、
前記チャンバを排気するための前記プラズマチャンバに連結されたポンプ、
前記天井に対面する加工対象物を保持するための加工対象物支持体、
絶縁枠及び前記天井と前記加工対象物支持体との間で前記プラズマチャンバを通って側方に延在するフィラメントを備えたチャンバ内電極アセンブリであって、前記フィラメントが、前記絶縁枠から延在する絶縁シェルによって少なくとも部分的に囲まれた導体を含む、チャンバ内電極アセンブリ、並びに
前記チャンバ内電極アセンブリの前記導体に第1のRF電力を供給するための第1のRF電源を備える、プラズマ反応器。 - 前記絶縁シェルが、前記プラズマチャンバ内で前記導体の全体を囲み前記導体の全体に沿って延在する円筒形状シェルを備える、請求項1に記載のプラズマ反応器。
- 前記絶縁シェルが、シリコン、若しくは、酸化物、窒化物、若しくは炭化物材料、又はそれらの組み合わせから形成されている、請求項1に記載のプラズマ反応器。
- 前記絶縁シェルが、シリカ、サファイア、又は炭化ケイ素から形成されている、請求項3に記載のプラズマ反応器。
- 前記円筒形状シェルがチャネルを形成し、前記導体が前記チャネル内で宙吊りにされ前記チャネルを通って延在し、又は前記導体が中空チャネルを備える、請求項1に記載のプラズマ反応器。
- 前記チャネルを通して流体を循環させるように構成された流体源を更に備える、請求項5に記載のプラズマ反応器。
- 前記流体が、非酸化性ガスを含む、請求項6に記載のプラズマ反応器。
- 前記流体から熱を除去し又は前記流体に熱を供給するように構成された熱交換器を備える、請求項6に記載のプラズマ反応器。
- 前記チャンバ内電極アセンブリが、前記天井と前記加工対象物支持体との間で前記プラズマチャンバを通って側方に延在する複数の同一平面にあるフィラメントを備える、請求項1に記載のプラズマ反応器。
- 前記複数の同一平面にあるフィラメントが、均一に間隔を空けられている、請求項9に記載のプラズマ反応器。
- 前記複数の同一平面にあるフィラメントが、直線的なフィラメントを備える、請求項9に記載のプラズマ反応器。
- 前記複数の同一平面にあるフィラメントが、前記プラズマチャンバを通って平行に延在する、請求項11に記載のプラズマ反応器。
- 前記シェルが、前記絶縁枠に融着されている、請求項1に記載のプラズマ反応器。
- 前記シェルと前記絶縁枠が、同じ材料組成である、請求項1に記載のプラズマ反応器。
- 前記絶縁枠が、シリカ又はセラミック材料から形成されている、請求項1のプラズマ反応器。
- プラズマチャンバを提供し天井を有する内部空間を有するチャンバ本体、
前記プラズマチャンバに処理ガスを供給するガス供給器、
前記チャンバを排気するための前記プラズマチャンバに連結されたポンプ、
加工対象物を保持するための加工対象物支持体、
絶縁枠及びフィラメントを備えたチャンバ内電極アセンブリであって、前記フィラメントが、前記天井から下向きに延在する第1の部分及び前記天井と前記加工対象物支持体との間で前記プラズマチャンバを通って側方に延在する第2の部分を含み、前記フィラメントが、絶縁シェルによって少なくとも部分的に囲まれた導体を含む、チャンバ内電極アセンブリ、並びに
前記チャンバ内電極アセンブリの前記導体に第1のRF電力を供給するための第1のRF電源を備える、プラズマ反応器。 - 前記チャンバ内電極アセンブリが複数のフィラメントを備え、各フィラメントが、前記天井から下向きに延在する第1の部分、及び、前記天井と前記加工対象物支持体と間で前記プラズマチャンバを通って側方に延在する第2の部分を備える、請求項16に記載のプラズマ反応器。
- 前記複数のフィラメントの前記第2の部分が同一平面にある、請求項16に記載のプラズマ反応器。
- 前記支持体が、前記天井と前記フィラメントの前記第2の部分との間の空間を囲む下向きに突出した側壁を備える、請求項16に記載のプラズマ反応器。
- 前記側壁が、酸化ケイ素又はセラミック材料から形成されている、請求項19に記載のプラズマ反応器。
- 前記天井が絶縁枠を備え、前記フィラメントが前記絶縁枠から外に延在する、請求項19に記載のプラズマ反応器。
- 前記シェルが、前記枠に融着されている、請求項21に記載のプラズマ反応器。
- 前記シェルと前記支持体が、同じ材料組成である、請求項21に記載のプラズマ反応器。
- プラズマチャンバを提供する内部空間を有し天井及び上端電極を保持するための絶縁支持体を有するチャンバ本体、
前記プラズマチャンバに処理ガスを供給するガス供給器、
前記チャンバを排気するための前記プラズマチャンバに連結されたポンプ、
前記上端電極に対面する加工対象物を保持するための加工対象物支持体、
前記上端電極と前記加工対象物支持体との間で前記プラズマチャンバを通って側方に延在するフィラメントを備えたチャンバ内電極アセンブリであって、前記フィラメントが、前記絶縁枠から延在する絶縁シェルによって少なくとも部分的に囲まれた導体を含む、チャンバ内電極アセンブリ、並びに
前記チャンバ内電極アセンブリの前記導体に第1のRF電力を供給するための第1のRF電源を備える、プラズマ反応器。 - プラズマチャンバを提供する内部空間を有し天井を有するチャンバ本体、
前記プラズマチャンバに処理ガスを供給するガス供給器、
前記チャンバを排気するための前記プラズマチャンバに連結されたポンプ、
加工対象物を保持するための加工対象物支持体、
チャンバ内電極アセンブリであって、絶縁枠、第1の方向に沿って前記天井と前記加工対象物支持体との間で前記プラズマチャンバを通って側方に延在する第1の複数の同一平面にあるフィラメント、及び前記第1の方向と垂直な第2の方向に沿ってプラズマチャンバを通って平行に延在する第2の複数の同一平面にあるフィラメントを備え、前記第1及び第2の複数のフィラメントのそれぞれのフィラメントが、絶縁シェルによって少なくとも部分的に囲まれた導体を含む、チャンバ内電極アセンブリ、並びに
前記チャンバ内電極アセンブリの前記導体に第1のRF電力を供給する第1のRF電源を備える、プラズマ反応器。
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US15/630,748 US20180308661A1 (en) | 2017-04-24 | 2017-06-22 | Plasma reactor with electrode filaments |
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US20180308666A1 (en) | 2018-10-25 |
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US20180308661A1 (en) | 2018-10-25 |
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