JP2020516725A - 化学機械研磨後配合物及び使用方法 - Google Patents
化学機械研磨後配合物及び使用方法 Download PDFInfo
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- JP2020516725A JP2020516725A JP2019555603A JP2019555603A JP2020516725A JP 2020516725 A JP2020516725 A JP 2020516725A JP 2019555603 A JP2019555603 A JP 2019555603A JP 2019555603 A JP2019555603 A JP 2019555603A JP 2020516725 A JP2020516725 A JP 2020516725A
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- Prior art keywords
- acid
- hydroxide
- ether
- cleaning composition
- corrosion inhibitor
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 30
- 239000000126 substance Substances 0.000 title abstract description 18
- 238000005498 polishing Methods 0.000 title abstract description 12
- 150000001875 compounds Chemical class 0.000 title description 7
- 239000000203 mixture Substances 0.000 claims abstract description 166
- 238000004140 cleaning Methods 0.000 claims abstract description 111
- 239000000463 material Substances 0.000 claims abstract description 70
- 238000004377 microelectronic Methods 0.000 claims abstract description 50
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 44
- 229910052802 copper Inorganic materials 0.000 claims abstract description 44
- 239000010949 copper Substances 0.000 claims abstract description 44
- 239000000356 contaminant Substances 0.000 claims abstract description 39
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 23
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000005260 corrosion Methods 0.000 claims description 89
- 230000007797 corrosion Effects 0.000 claims description 89
- 239000003112 inhibitor Substances 0.000 claims description 88
- 150000003839 salts Chemical class 0.000 claims description 66
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 57
- -1 2-aminobutylanol Chemical compound 0.000 claims description 52
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 44
- 150000001412 amines Chemical class 0.000 claims description 44
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 42
- 239000006259 organic additive Substances 0.000 claims description 34
- 239000003002 pH adjusting agent Substances 0.000 claims description 32
- 239000002253 acid Substances 0.000 claims description 28
- HMBHAQMOBKLWRX-UHFFFAOYSA-N 2,3-dihydro-1,4-benzodioxine-3-carboxylic acid Chemical compound C1=CC=C2OC(C(=O)O)COC2=C1 HMBHAQMOBKLWRX-UHFFFAOYSA-N 0.000 claims description 27
- 229940075419 choline hydroxide Drugs 0.000 claims description 27
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims description 26
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 24
- 239000012964 benzotriazole Substances 0.000 claims description 24
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 22
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 claims description 22
- 235000018417 cysteine Nutrition 0.000 claims description 22
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 21
- 229960003237 betaine Drugs 0.000 claims description 20
- 235000006408 oxalic acid Nutrition 0.000 claims description 19
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- 230000004888 barrier function Effects 0.000 claims description 16
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 16
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims description 14
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 14
- 239000010941 cobalt Substances 0.000 claims description 14
- 229910017052 cobalt Inorganic materials 0.000 claims description 14
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 13
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 12
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 claims description 11
- IBLKWZIFZMJLFL-UHFFFAOYSA-N 1-phenoxypropan-2-ol Chemical compound CC(O)COC1=CC=CC=C1 IBLKWZIFZMJLFL-UHFFFAOYSA-N 0.000 claims description 11
- 239000006172 buffering agent Substances 0.000 claims description 11
- 239000003638 chemical reducing agent Substances 0.000 claims description 11
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 claims description 10
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 10
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 10
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 10
- HNDVDQJCIGZPNO-YFKPBYRVSA-N L-histidine Chemical compound OC(=O)[C@@H](N)CC1=CN=CN1 HNDVDQJCIGZPNO-YFKPBYRVSA-N 0.000 claims description 9
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 claims description 9
- 235000014304 histidine Nutrition 0.000 claims description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 8
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 claims description 8
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 8
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 8
- NJSSICCENMLTKO-HRCBOCMUSA-N [(1r,2s,4r,5r)-3-hydroxy-4-(4-methylphenyl)sulfonyloxy-6,8-dioxabicyclo[3.2.1]octan-2-yl] 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)O[C@H]1C(O)[C@@H](OS(=O)(=O)C=2C=CC(C)=CC=2)[C@@H]2OC[C@H]1O2 NJSSICCENMLTKO-HRCBOCMUSA-N 0.000 claims description 8
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 claims description 8
- YIOJGTBNHQAVBO-UHFFFAOYSA-N dimethyl-bis(prop-2-enyl)azanium Chemical compound C=CC[N+](C)(C)CC=C YIOJGTBNHQAVBO-UHFFFAOYSA-N 0.000 claims description 8
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 claims description 8
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 claims description 8
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 claims description 8
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 8
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 claims description 7
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 6
- 229910019142 PO4 Inorganic materials 0.000 claims description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 6
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 claims description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 6
- 239000007983 Tris buffer Substances 0.000 claims description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 6
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 claims description 6
- 235000019270 ammonium chloride Nutrition 0.000 claims description 6
- 239000001768 carboxy methyl cellulose Substances 0.000 claims description 6
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 6
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 6
- 239000011976 maleic acid Substances 0.000 claims description 6
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 6
- 239000004094 surface-active agent Substances 0.000 claims description 6
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 5
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 5
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 5
- 235000011187 glycerol Nutrition 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 5
- 239000011975 tartaric acid Substances 0.000 claims description 5
- 235000002906 tartaric acid Nutrition 0.000 claims description 5
- KMZOJSINLAGOMV-UHFFFAOYSA-N (prop-2-enoylamino) propane-1-sulfonate Chemical compound CCCS(=O)(=O)ONC(=O)C=C KMZOJSINLAGOMV-UHFFFAOYSA-N 0.000 claims description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 4
- GZMAAYIALGURDQ-UHFFFAOYSA-N 2-(2-hexoxyethoxy)ethanol Chemical compound CCCCCCOCCOCCO GZMAAYIALGURDQ-UHFFFAOYSA-N 0.000 claims description 4
- KKFDCBRMNNSAAW-UHFFFAOYSA-N 2-(morpholin-4-yl)ethanol Chemical compound OCCN1CCOCC1 KKFDCBRMNNSAAW-UHFFFAOYSA-N 0.000 claims description 4
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 claims description 4
- UPGSWASWQBLSKZ-UHFFFAOYSA-N 2-hexoxyethanol Chemical compound CCCCCCOCCO UPGSWASWQBLSKZ-UHFFFAOYSA-N 0.000 claims description 4
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 claims description 4
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 claims description 4
- 229920002134 Carboxymethyl cellulose Polymers 0.000 claims description 4
- 229920001661 Chitosan Polymers 0.000 claims description 4
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 claims description 4
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 claims description 4
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- KDXKERNSBIXSRK-YFKPBYRVSA-N L-lysine Chemical compound NCCCC[C@H](N)C(O)=O KDXKERNSBIXSRK-YFKPBYRVSA-N 0.000 claims description 4
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- 239000004472 Lysine Substances 0.000 claims description 4
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- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 claims description 4
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 claims description 4
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- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 claims description 4
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- YRHAJIIKYFCUTG-UHFFFAOYSA-M dimethyl-bis(prop-2-enyl)azanium;bromide Chemical compound [Br-].C=CC[N+](C)(C)CC=C YRHAJIIKYFCUTG-UHFFFAOYSA-M 0.000 claims description 4
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- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 claims description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 4
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/0005—Other compounding ingredients characterised by their effect
- C11D3/0047—Other compounding ingredients characterised by their effect pH regulated compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/0005—Other compounding ingredients characterised by their effect
- C11D3/0073—Anticorrosion compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/044—Hydroxides or bases
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2068—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2075—Carboxylic acids-salts thereof
- C11D3/2082—Polycarboxylic acids-salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/28—Heterocyclic compounds containing nitrogen in the ring
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
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Abstract
Description
洗浄の有効性=(洗浄前の物体の数−洗浄後の物体の数)/洗浄前の物体の数×100
注目すべきことに、洗浄の有効性の測定法は、単なる例として記載されており、それに限定されるものではない。あるいは、洗浄の有効性は、粒子状物質によって覆われた全表面の割合と考えてもよい。例えば、z平面走査を実施するようAFMをプログラムして一定の高さの閾値を上回る対象のトポグラフィー領域を特定し、次いで、対象の前記領域によって覆われた全表面の領域を計算してもよい。洗浄後に対象の前記領域によって覆われた面積が小さいほど、洗浄組成物がより効果的であることを当業者なら容易に理解するであろう。好ましくは、本明細書に記載の組成物を使用して、残留物/汚染物の少なくとも75%がマイクロ電子デバイスから除去され、より好ましくは残留物/汚染物の少なくとも90%、さらにより好ましくは少なくとも95%、最も好ましくは少なくとも99%が除去される。
−CMPスラリーを使用してマイクロ電子デバイスを研磨することと、
−CMP後残留物及び汚染物をマイクロ電子デバイスから除去するのに十分な時間、マイクロ電子デバイスを本明細書に記載の洗浄組成物と接触させて、CMP後残留物含有組成物を生成することと、
−マイクロ電子デバイスを実質的に洗浄するのに十分な時間の間、マイクロ電子デバイスを洗浄組成物と連続的に接触させることと
を含み、洗浄組成物が、少なくとも一種の有機アミン、水、少なくとも一種のpH調整剤、少なくとも一種の有機添加剤、少なくとも一種の腐食抑制剤、任意選択的に少なくとも一種の緩衝剤及び任意選択的に少なくとも一種の還元剤を含み、それらからなり、又はそれらから実質的になる、方法が記載される。
表1に示す以下の溶液を調製し、実験前に脱イオン水で60:1に希釈した。配合物Aは、0.05重量%システイン、0.16重量%水酸化コリン、4.5重量%MEA、残部の水を含んでいた。配合物B〜Lは、0.2重量%シュウ酸、0.1重量%システイン、4.950重量%MEA、配合物中で13.2のpHを得るための水酸化コリン及びKOHの混合物、並びに表1に一覧にした残りの成分を含んでいた。溶液を試験して、BTA除去効率(パーセント)及び銅エッチ速度(Å/min)を決定した。その結果も表1に示す。BTA除去効率実験は、その上で成長させたBTA層を有する銅基板を使用して実施した。BTAを含む基板を室温の表1の溶液に浸漬した。エリプソメトリーを使用して、溶液との接触前後にBTA膜厚を決定した。銅エッチ速度実験も銅基板を使用して室温で実施した。
表2に示す以下の溶液を調製し、実験前に脱イオン水で60:1に希釈した。配合物AA〜KKは、0.2重量%シュウ酸、0.075重量%システイン、4.95重量%MEA、配合物中で13.2のpHを得るための水酸化コリン及びKOHの混合物(配合物CCを除く)、並びに表2に一覧にした残りの成分を含んでいた。注目すべきことに、配合物CCは、約13.7のpHを生じる水酸化コリン及びKOHの混合物を含んでいた。溶液を試験して、BTA除去効率(パーセント)、銅エッチ速度(Å/min)及び低誘電率エッチ速度(Å/min)を決定した。その結果も表2に示す。BTA除去効率実験は、その上で成長させたBTA層を有する銅基板を使用して実施した。BTAを含む基板を室温の表2の溶液に浸漬した。エリプソメトリーを使用して、溶液との接触前後にBTA膜厚を決定した。銅エッチ速度実験及び低誘電率エッチ速度実験もそれぞれ低誘電率及び銅基板を使用して室温で実施した。
表3に示す以下の溶液を調製し、実験前に脱イオン水で60:1に希釈した。配合物LL〜OOは、0.2重量%シュウ酸、0.1重量%システイン、4.95重量%MEA、配合物中で13.2のpHを得るための水酸化コリン及びKOHの混合物、並びに表3に一覧にした残りの成分を含んでいた。濃縮物のpHは約13.2であった。溶液を試験して、BTA除去効率(パーセント)及び銅エッチ速度(Å/min)を決定した。その結果も表3に示す。BTA除去効率実験は、その上で成長させたBTA層を有する銅基板を使用して実施した。BTAを含む基板を室温の表3の溶液に浸漬した。エリプソメトリーを使用して、溶液との接触前後にBTA膜厚を決定した。銅エッチ速度実験も銅基板を使用して室温で実施した。
Claims (27)
- 少なくとも一種の有機アミン、水、少なくとも一種のpH調整剤、少なくとも一種の有機添加剤及び少なくとも一種の腐食抑制剤を含む洗浄組成物。
- (一種又は複数種の)有機アミン/(一種又は複数種の)腐食抑制剤の重量パーセント比が約1〜約100、好ましくは約5〜約50、より好ましくは約10〜約25、最も好ましくは約12〜約20の範囲内であり、(一種又は複数種の)pH調整剤/(一種又は複数種の)腐食抑制剤の重量パーセント比が約0.1〜約50、好ましくは約1〜約30、より好ましくは約2〜約20、最も好ましくは約4〜約10の範囲内であり、(一種又は複数種の)有機添加剤/(一種又は複数種の)腐食抑制剤の重量パーセント比が約0.01〜約50、好ましくは約0.1〜約25、より好ましくは約1〜約15、最も好ましくは約2〜約10の範囲内である、請求項1に記載の洗浄組成物。
- 少なくとも一種の有機アミンが、一般式NR1R2R3(式中、R1、R2及びR3は、互いに同じでも、異なっていてもよく、水素、直鎖又は分岐鎖のC1−C6アルキル、直鎖又は分岐鎖のC1−C6アルコール、及び式R4−O−R5(式中、R4及びR5は、互いに同じでも、異なっていてもよく、C1−C6アルキルからなる群から選択される。)を有する直鎖又は分岐鎖のエーテルからなる群から選択される。)を有する化学種を含む、請求項1又は2に記載の洗浄組成物。
- 少なくとも一種の有機アミンが、アミノエチルエタノールアミン、N−メチルアミノエタノール、アミノエトキシエタノール、アミノエトキシエトキシエタノール、ブトキシプロピルアミン、メトキシプロピルアミン、ブトキシイソプロピルアミン、2−エチルヘキシルイソプロポキシアミン、エタノールプロピルアミン、エチルエタノールアミン、n−ヒドロキシエチルモルホリン、アミノプロピルジエタノールアミン、ジメチルアミノエトキシエタノール、ジエタノールアミン、N−メチルジエタノールアミン、モノエタノールアミン、トリエタノールアミン、1−アミノ−2−プロパノール、3−アミノ−1−プロパノール、ジイソプロピルアミン、アミノメチルプロパンジオール、N,N−ジメチルアミノメチルプロパンジオール、アミノエチルプロパンジオール、N,N−ジメチルアミノエチルプロパンジオール、イソプロピルアミン、2−アミノ−1−ブタノール、アミノメチルプロパノール、アミノジメチルプロパノール、N,N−ジメチルアミノメチルプロパノール、イソブタノールアミン、ジイソプロパノールアミン、3−アミノ、4−ヒドロキシオクタン、2−アミノブチラノール(aminobutylanol)、トリス(ヒドロキシメチル)アミノメタン(TRIS)、N,N−ジメチルトリス(ヒドロキシメチル)アミノメタン、ヒドロキシプロプリアミン(hydroxyproplyamine)、ベンジルアミン、ヒドロキシエチルアミン、トリス(ヒドロキシエチル)アミノメタン、トリエチレンジアミン、テトラエチレンペンタミン(TEPA)、トリエチレンテトラアミン、エチレンジアミン、ヘキサメチレンジアミン、ジエチレントリアミン、トリエチルアミン、トリメチルアミン、ジグリコールアミン;モルホリン;ジシアナミド;及びそれらの組合せからなる群から選択される化学種、好ましくはモノエタノールアミンを含む、請求項1又は2に記載の洗浄組成物。
- 少なくとも一種のpH調整剤が式NR1R2R3R4OH又はPR1R2R3R4OH(式中、R1、R2、R3及びR4は、互いに同じでも、異なっていてもよく、水素、直鎖又は分岐鎖のC2−C6アルキル、C1−C6アルコキシ、及び置換又は非置換のC6−C10アリールからなる群から選択される。)を有する、請求項1から4のいずれか一項に記載の洗浄組成物。
- 少なくとも一種のpH調整剤が、テトラエチルアンモニウム水酸化物(TEAH)、テトラプロピルアンモニウム水酸化物(TPAH)、テトラブチルアンモニウム水酸化物(TBAH)、トリブチルメチルアンモニウム水酸化物(TBMAH)、ベンジルトリメチルアンモニウム水酸化物(BTMAH)、エチルトリメチルアンモニウム水酸化物、水酸化コリン、トリス(2−ヒドロキシエチル)メチルアンモニウム水酸化物、ジエチルジメチルアンモニウム水酸化物、トリエチルメチルアンモニウム水酸化物、トリスヒドロキシエチルメチルアンモニウム水酸化物、テトラブチルホスホニウム水酸化物(TBPH)、テトラメチルホスホニウム水酸化物、テトラエチルホスホニウム水酸化物、テトラプロピルホスホニウム水酸化物、ベンジルトリフェニルホスホニウム水酸化物、メチルトリフェニルホスホニウム水酸化物、エチルトリフェニルホスホニウム水酸化物、N−プロピルトリフェニルホスホニウム水酸化物及びそれらの組合せからなる群から選択される化学種、好ましくは水酸化コリンを含む、請求項1から4のいずれか一項に記載の洗浄組成物。
- 少なくとも一種のpH調整剤が、LiOH、KOH、RbOH、CsOH及びそれらの組合せからなる群から選択されるアルカリ金属水酸化物、好ましくはKOHを含む、請求項1から6のいずれか一項に記載の洗浄組成物。
- 少なくとも一種のpH調整剤が水酸化コリン及びKOHを含む、請求項1から4のいずれか一項に記載の洗浄組成物。
- 少なくとも一種の腐食抑制剤が、酢酸、アセトンオキシム、アクリル酸、アジピン酸、アラニン、アルギニン、アスパラギン、アスパラギン酸、ベタイン、ジメチルグリオキシム、ギ酸、フマル酸、グルコン酸、グルタミン酸、グルタミン、グルタル酸、グリセリン酸、グリセロール、グリコール酸、グリオキシル酸、ヒスチジン、イミノ二酢酸、イソフタル酸、イタコン酸、乳酸、ロイシン、リジン、マレイン酸、無水マレイン酸、リンゴ酸、マロン酸、マンデル酸、2,4−ペンタンジオン、フェニル酢酸、フェニルアラニン、フタル酸、プロリン、プロピオン酸、ピロカテコール、ピロメリト酸、キナ酸、セリン、ソルビトール、コハク酸、酒石酸、テレフタル酸、トリメリット酸、トリメシン酸、チロシン、バリン、キシリトール、シュウ酸、タンニン酸、ピコリン酸、1,3−シクロペンタンジオン、カテコール、ピロガロール、レゾルシノール、ヒドロキノン、シアヌル酸、バルビツル酸、1,2−ジメチルバルビツル酸、ピルビン酸、プロパンチオール、ベンゾヒドロキサム酸類、2,5−ジカルボキシプリジン(dicarboxypryidine)、4−(2−ヒドロキシエチル)モルホリン(HEM)、N−アミノエチルピペラジン(N−AEP)、エチレンジアミン四酢酸(EDTA)、1,2−シクロヘキサンジアミン−N,N,N’,N’−四酢酸(CDTA)、N−(ヒドロキシエチル)−エチレンジアミン三酢酸(HEdTA)、イミノ二酢酸(IDA)、2−(ヒドロキシエチル)イミノ二酢酸(HIDA)、ニトリロ三酢酸、チオウレア、1,1,3,3−テトラメチル尿素、尿素、尿素誘導体、グリシン、システイン、グルタミン酸、イソロイシン、メチオニン、ピペラジン、N−(2−アミノエチル)ピペラジン、ピロリジン、スレオニン、トリプトファン、サリチル酸、p−トルエンスルホン酸、サリチルヒロキサム酸(salicylhyroxyamic)、5−スルホサリチル酸及びそれらの組合せからなる群から選択される化学種、好ましくはシステイン、シュウ酸、ヒスチジン又はそれらの任意の組合せを含む、請求項1から8のいずれか一項に記載の洗浄組成物。
- 有機添加剤が、2−ピロリジノン、1−(2−ヒドロキシエチル)−2−ピロリジノン(HEP)、グリセロール、1,4−ブタンジオール、テトラメチレンスルホン、ジメチルスルホン、エチレングリコール、プロピレングリコール、ジプロピレングリコール、テトラグライム、ジグリム、ジエチレングリコールモノメチルエーテル、トリエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、トリエチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールモノブチルエーテル(DEGBE)、トリエチレングリコールモノブチルエーテル(TEGBE)、エチレングリコールモノヘキシルエーテル(EGHE)、ジエチレングリコールモノヘキシルエーテル(DEGHE)、エチレングリコールフェニルエーテル、プロピレングリコールメチルエーテル、ジプロピレングリコールメチルエーテル(DPGME)、トリプロピレングリコールメチルエーテル(TPGME)、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールエチルエーテル、プロピレングリコールn−プロピルエーテル、ジプロピレングリコールn−プロピルエーテル(DPGPE)、トリプロピレングリコールn−プロピルエーテル、プロピレングリコールn−ブチルエーテル、ジプロピレングリコールn−ブチルエーテル、トリプロピレングリコールn−ブチルエーテル、プロピレングリコールフェニルエーテル、ホスホン酸、1−ヒドロキシエチリデン−1,1−ジホスホン酸(HEDP)、1,5,9−トリアザシクロドデカン−N,N’,N’’−トリス(メチレンホスホン酸)(DOTRP)、1,4,7,10−テトラアザシクロドデカン−N,N’,N’’,N’’’−テトラキス(メチレンホスホン酸)(DOTP)、ニトリロトリス(メチレン)トリホスホン酸、ジエチレントリアミンペンタ(メチレンホスホン酸)(DETAP)、アミノトリ(メチレンホスホン酸)、イス(is)(ヘキサメチレン)トリアミンホスホン酸、1,4,7−トリアザシクロノナン−N,N’,N’’−トリス(メチレンホスホン酸(NOTP)、ヒドロキシプロピルセルロース、ヒドロキシエチルセルロース、カルボキシメチルセルロース、カルボキシメチルセルロースナトリウム(Na CMC)、ポリビニルピロリドン(PVP)、ポリアクリル酸エステル、ポリアクリル酸エステルの類似体、ポリアラニン、ポリロイシン、ポリグリシン、ポリアミドヒドロキシウレタン、ポリラクトン、ポリアクリルアミド、キサンタンガム、キトサン、ポリエチレンオキシド、ポリビニルアルコール(PVA)、ポリ酢酸ビニル、ポリアクリル酸、ポリエチレンイミン(PEI)、ソルビトール、キシリトール、アンヒドロソルビトールのエステル、二級アルコールエトキシレート及びそれらの組合せからなる群から選択される化学種、好ましくはトリエチレングリコールモノブチルエーテル、プロピレングリコールn−ブチルエーテル、プロピレングリコールフェニルエーテル、HEDP、HEC又はそれらの任意の組合せを含む、請求項1から9のいずれか一項に記載の洗浄組成物。
- アスコルビン酸、L(+)−アスコルビン酸、イソアスコルビン酸、アスコルビン酸誘導体、没食子酸、ホルムアミジンスルフィン酸、尿酸、酒石酸、システイン、D−グルコン酸カリウム、ヒドロキシルアミン、亜硝酸カリウム、炭酸グアニジン、8−ヒドロキシ−5−キノリンスルホン酸水和物及びそれらの任意の組合せからなる群から選択される化学種を含む少なくとも一種の還元剤をさらに含む、請求項1から10のいずれか一項に記載の洗浄組成物。
- リン酸、リン酸二カリウム、炭酸カリウム、ホウ酸、リジン、プロリン、β−アラニン、エチレンジアミン四酢酸(EDTA)、ジエチレントリアミン五酢酸(DTPA)、ジメチルグリオキシム、(NH4)2HPO4、K2HPO4、(NH4)3PO4、K3PO4、K2HPO4/K3PO4、K2CO3/KHCO3、ヒドロキシエチリデンジホスホン酸(HEDP)及びそれらの組合せからなる群から選択される化学種を含む少なくとも一種の緩衝剤をさらに含む、請求項1から11のいずれか一項に記載の洗浄組成物。
- 少なくとも一種の有機アミン、水、少なくとも一種の有機添加剤、少なくとも一種の腐食抑制剤、並びに水酸化コリン及びアルカリ金属水酸化物のうちの少なくとも1つを含み、以下の重量パーセント比:約1〜約100、好ましくは約5〜約50、より好ましくは約10〜約25、最も好ましくは約12〜約20の範囲内の(一種又は複数種の)有機アミン/(一種又は複数種の)腐食抑制剤;約0.01〜約25、好ましくは約0.1〜約15、より好ましくは約1〜約10、最も好ましくは約1〜約6の範囲内の水酸化コリン/(一種又は複数種の)腐食抑制剤;約0.01〜約30、好ましくは約0.5〜約20、より好ましくは約2〜約10、最も好ましくは約2〜約6の範囲内の(一種又は複数種の)アルカリ金属水酸化物/(一種又は複数種の)腐食抑制剤;及び約0.01〜約50、好ましくは約0.1〜約25、より好ましくは約1〜約15、最も好ましくは約2〜約10の範囲内の(一種又は複数種の)有機添加剤/(一種又は複数種の)腐食抑制剤で配合された、請求項1から12のいずれか一項に記載の洗浄組成物。
- 少なくとも一種の有機アミン、水、少なくとも一種のpH調整剤、ホスホン酸又はその誘導体、少なくとも一種のグリコールエーテル及び少なくとも一種の腐食抑制剤を含み、以下の重量パーセント比:約1〜約100、好ましくは約5〜約50、より好ましくは約10〜約25、最も好ましくは約12〜約20の範囲内の(一種又は複数種の)有機アミン/(一種又は複数種の)腐食抑制剤;約0.1〜約50、好ましくは約1〜約30、より好ましくは約2〜約20、最も好ましくは約4〜約10の範囲内の(一種又は複数種の)pH調整剤/(一種又は複数種の)腐食抑制剤;約0.01〜約25、好ましくは約0.1〜約15、より好ましくは約0.5〜約10、最も好ましくは約0.5〜約4の範囲内のホスホン酸又はその誘導体/(一種又は複数種の)腐食抑制剤;及び約0.01〜約25、好ましくは約0.1〜約20、より好ましくは約0.5〜約10、最も好ましくは約1〜約6の範囲内の(一種又は複数種の)グリコールエーテル/(一種又は複数種の)腐食抑制剤で配合された、請求項1から13のいずれか一項に記載の洗浄組成物。
- 少なくとも一種の有機アミン、水、ホスホン酸又はその誘導体、少なくとも一種のグリコールエーテル、少なくとも一種の腐食抑制剤、並びに水酸化コリン及びアルカリ金属水酸化物のうちの少なくとも1つを含み、以下の重量パーセント比:約1〜約100、好ましくは約5〜約50、より好ましくは約10〜約25、最も好ましくは約12〜約20の範囲内の(一種又は複数種の)有機アミン/(一種又は複数種の)腐食抑制剤;約0.01〜約25、好ましくは約0.1〜約15、より好ましくは約1〜約10、最も好ましくは約1〜約6の範囲内の水酸化コリン/(一種又は複数種の)腐食抑制剤;約0.01〜約30、好ましくは約0.5〜約20、より好ましくは約2〜約10、最も好ましくは約2〜約6の範囲内の(一種又は複数種の)アルカリ金属水酸化物/(一種又は複数種の)腐食抑制剤;約0.01〜約25、好ましくは約0.1〜約15、より好ましくは約0.5〜約10、最も好ましくは約0.5〜約4の範囲内のホスホン酸又はその誘導体/(一種又は複数種の)腐食抑制剤;及び約0.01〜約25、好ましくは約0.1〜約20、より好ましくは約0.5〜約10、最も好ましくは約1〜約6の範囲内の(一種又は複数種の)グリコールエーテル/(一種又は複数種の)腐食抑制剤で配合された、請求項1から14のいずれか一項に記載の洗浄組成物。
- 少なくとも一種の溶媒が水を含む、請求項1から15のいずれか一項に記載の洗浄組成物。
- アルギン酸及びその塩;カルボキシメチルセルロース;デキストラン硫酸及びその塩;ポリ(ガラクツロン酸)及びその塩;(メタ)アクリル酸及びその塩、マレイン酸、マレイン酸無水物、スチレンスルホン酸及びその塩、ビニルスルホン酸及びその塩、アリルスルホン酸及びその塩、アクリルアミドプロピルスルホン酸及びその塩のホモポリマー;(メタ)アクリル酸及びその塩、マレイン酸、マレイン酸無水物、スチレンスルホン酸及びその塩、ビニルスルホン酸及びその塩、アリルスルホン酸及びその塩、アクリルアミドプロピルスルホン酸及びその塩のコポリマー;キトサン;カチオン澱粉;ポリリシン及びその塩;ジアリルジメチルアンモニウムクロリド(DADMAC)、ジアリルジメチルアンモニウムブロミド、ジアリルジメチルアンモニウムサルフェート、ジアリルジメチルアンモニウムホスフェート、ジメタアリルジメチルアンモニウムクロリド、ジエチルアリルアンモニウムクロリド、ジアリルジ(ベータ−ヒドロキシエチル)アンモニウムクロリド、ジアリルジ(ベータ−エトキシエチル)アンモニウムクロリド、ジメチルアミノエチル(メタ)アクリレート酸付加塩及び四級塩、ジエチルアミノエチル(メタ)アクリレート酸付加塩及び四級塩、7−アミノ−3,7−ジメチルオクチル(メタ)アクリレート酸付加塩及び四級塩、N,N’−ジメチルアミノプロピルアクリルアミド酸付加塩及び四級塩、アリルアミン、ジアリルアミン、ビニルアミン、ビニルピリジンのホモポリマー;並びにジアリルジメチルアンモニウムクロリド(DADMAC)、ジアリルジメチルアンモニウムブロミド、ジアリルジメチルアンモニウムサルフェート、ジアリルジメチルアンモニウムホスフェート、ジメタアリルジメチルアンモニウムクロリド、ジエチルアリルアンモニウムクロリド、ジアリルジ(ベータ−ヒドロキシエチル)アンモニウムクロリド、ジアリルジ(ベータ−エトキシエチル)アンモニウムクロリド、ジメチルアミノエチル(メタ)アクリレート酸付加塩及び四級塩、ジエチルアミノエチル(メタ)アクリレート酸付加塩及び四級塩、7−アミノ−3,7−ジメチルオクチル(メタ)アクリレート酸付加塩及び四級塩、N,N’−ジメチルアミノプロピルアクリルアミド酸付加塩及び四級塩、アリルアミン、ジアリルアミン、ビニルアミン、ビニルピリジンのコポリマー;ココジメチルカルボキシメチルベタイン;ラウリルジメチルカルボキシメチルベタイン;ラウリルジメチル−アルファ−カルボキシエチルベタイン;セチルジメチルカルボキシメチルベタイン;ラウリル−ビス−(2−ヒドロキシエチル)カルボキシメチルベタイン;ステアリル−ビス−(2−ヒドロキシプロピル)カルボキシメチルベタイン;オレイルジメチル−ガンマ−カルボキシプロピルベタイン;ラウリル−ビス−(2−ヒドロキシプロピル)アルファ−カルボキシエチルベタイン;ココジメチルスルホプロピルベタイン;ステアリルジメチルスルホプロピルベタイン;ラウリル−ビス−(2−ヒドロキシエチル)スルホプロピルベタイン;ドデシル硫酸ナトリウム;ジオクチルスルホコハク酸ナトリウム塩;ラウリルエーテル硫酸ナトリウム;ポリエチレングリコール分岐鎖ノニルフェニルエーテル硫酸アンモニウム塩;2−ドデシル−3−(2−スルホナトフェノキシ)二ナトリウム;PEG25−PABA;ポリエチレングリコールモノ−C10−16−アルキルエーテル硫酸ナトリウム塩;(2−N−ブトキシエトキシ)酢酸;ヘキサデシルベンゼンスルホン酸;セチルトリメチルアンモニウム水酸化物;ドデシルトリメチルアンモニウム水酸化物;ドデシルトリメチルアンモニウムクロリド;セチルトリメチルアンモニウムクロリド;N−アルキル−N−ベンジル−N,N−ジメチルアンモニウムクロリド;ドデシルアミン;ポリオキシエチレンラウリルエーテル;ドデセニルコハク酸モノジエタノールアミド;エチレンジアミンテトラキス(エトキシレート−ブロック−プロポキシレート);並びにそれらの組合せからなる群から選択される少なくとも一種の界面活性剤をさらに含む、請求項1から16のいずれか一項に記載の洗浄組成物。
- 少なくとも一種の酸化剤;フッ化物含有源;研削材料;テトラメチルアンモニウム水酸化物;アゾール含有腐食抑制剤;没食子酸;スルホニウム化合物;アミドキシム化合物;及びそれらの組合せが実質的にない、請求項1から17のいずれか一項に記載の洗浄組成物。
- 少なくとも一種の有機添加剤の量が、組成物の全重量に基づいて、20重量%未満、好ましくは10重量%未満、より好ましくは5重量%未満である、請求項1から18のいずれか一項に記載の洗浄組成物。
- 水の量が、組成物の全重量に基づいて、少なくとも80重量%、好ましくは少なくとも85重量%、より好ましくは少なくとも90重量%である、請求項17から19のいずれか一項に記載の洗浄組成物。
- 組成物が、約10〜14超の範囲内のpHを有する、請求項1から20のいずれか一項に記載の洗浄組成物。
- 残留物及び汚染物をさらに含み、残留物がCMP後残留物、エッチ後残留物、アッシュ後残留物又はそれらの組合せを含む、請求項1から21のいずれか一項に記載の洗浄組成物。
- 約10:1〜約200:1、好ましくは約30:1〜約150:1の範囲内に希釈された、請求項1から22のいずれか一項に記載の洗浄組成物。
- 希釈剤が水を含む、請求項23に記載の洗浄組成物。
- 残留物及び汚染物を、前記残留物及び汚染物をその上に有するマイクロ電子デバイスから除去する方法であって、マイクロ電子デバイスからの前記残留物及び汚染物を少なくとも部分的に洗浄するのに十分な時間、請求項1から24のいずれか一項に記載の洗浄組成物とマイクロ電子デバイスを接触させることを含み、洗浄組成物がバリア層材料と適合性である、方法。
- 汚染物、例えばベンゾトリアゾールを除去する一方、露出した銅の腐食速度及び露出した銅上に残る残留物の量を同時に減少させる、請求項25に記載の方法。
- バリア層材料が、タンタル含有材料、コバルト含有材料及びルテニウム含有材料のうちの少なくとも1つを含む、請求項25に記載の方法。
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CN111673930B (zh) * | 2020-05-15 | 2022-03-15 | 电子科技大学 | 一种电子材料切割冷加工固定冷凝液及装置 |
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CN116410722A (zh) * | 2021-12-30 | 2023-07-11 | 中国石油天然气集团有限公司 | 完井液用复配缓蚀剂、高密度无固相完井液及其制备方法 |
WO2023177541A1 (en) * | 2022-03-15 | 2023-09-21 | Entegris, Inc. | Microelectronic device cleaning composition |
WO2024020919A1 (en) | 2022-07-28 | 2024-02-01 | Dow Global Technologies Llc | Compositions for cleaning metals |
CN115261152B (zh) * | 2022-08-05 | 2024-03-29 | 长鑫存储技术有限公司 | 清洗剂及其应用 |
CN115505389B (zh) * | 2022-08-22 | 2023-04-28 | 福建天甫电子材料有限公司 | 一种ito蚀刻液及其使用方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015524165A (ja) * | 2012-05-18 | 2015-08-20 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | 有機残渣除去を改良するための銅エッチングレートの低い水性洗浄溶液 |
JP2016519423A (ja) * | 2013-03-15 | 2016-06-30 | キャボット マイクロエレクトロニクス コーポレイション | 銅の化学的機械的平坦化後のための水性清浄化組成物 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6825156B2 (en) * | 2002-06-06 | 2004-11-30 | Ekc Technology, Inc. | Semiconductor process residue removal composition and process |
US6723691B2 (en) * | 1999-11-16 | 2004-04-20 | Advanced Technology Materials, Inc. | Post chemical-mechanical planarization (CMP) cleaning composition |
US7923423B2 (en) * | 2005-01-27 | 2011-04-12 | Advanced Technology Materials, Inc. | Compositions for processing of semiconductor substrates |
JP5873718B2 (ja) * | 2008-10-21 | 2016-03-01 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | 銅の洗浄及び保護配合物 |
US8110535B2 (en) * | 2009-08-05 | 2012-02-07 | Air Products And Chemicals, Inc. | Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same |
KR101562053B1 (ko) * | 2012-06-13 | 2015-10-20 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 세정용 액체 조성물, 반도체소자의 세정방법, 및 반도체소자의 제조방법 |
US20160075971A1 (en) * | 2013-04-22 | 2016-03-17 | Advanced Technology Materials, Inc. | Copper cleaning and protection formulations |
SG10201708364XA (en) * | 2013-06-06 | 2017-11-29 | Entegris Inc | Compositions and methods for selectively etching titanium nitride |
US20160340620A1 (en) * | 2014-01-29 | 2016-11-24 | Advanced Technology Materials, Inc. | Post chemical mechanical polishing formulations and method of use |
WO2016111990A1 (en) * | 2015-01-05 | 2016-07-14 | Entegris, Inc. | Post chemical mechanical polishing formulations and method of use |
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