JP2020510864A5 - - Google Patents

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JP2020510864A5
JP2020510864A5 JP2019545264A JP2019545264A JP2020510864A5 JP 2020510864 A5 JP2020510864 A5 JP 2020510864A5 JP 2019545264 A JP2019545264 A JP 2019545264A JP 2019545264 A JP2019545264 A JP 2019545264A JP 2020510864 A5 JP2020510864 A5 JP 2020510864A5
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Japan
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reticle
inspection
images
image
reticles
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JP2019545264A
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Japanese (ja)
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JP7035069B2 (ja
JP2020510864A (ja
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Priority claimed from US15/438,588 external-priority patent/US10451563B2/en
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JP2019545264A 2017-02-21 2018-02-19 ２つのフォトマスクを比較することによるフォトマスクの検査 Active JP7035069B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/438,588 2017-02-21
US15/438,588 US10451563B2 (en) 2017-02-21 2017-02-21 Inspection of photomasks by comparing two photomasks
PCT/US2018/018578 WO2018156442A1 (en) 2017-02-21 2018-02-19 Inspection of photomasks by comparing two photomasks

Publications (3)

Publication Number Publication Date
JP2020510864A JP2020510864A (ja) 2020-04-09
JP2020510864A5 true JP2020510864A5 (enExample) 2021-04-01
JP7035069B2 JP7035069B2 (ja) 2022-03-14

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JP2019545264A Active JP7035069B2 (ja) 2017-02-21 2018-02-19 ２つのフォトマスクを比較することによるフォトマスクの検査

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US (1) US10451563B2 (enExample)
JP (1) JP7035069B2 (enExample)
KR (1) KR102329153B1 (enExample)
IL (1) IL268480B (enExample)
TW (1) TWI760437B (enExample)
WO (1) WO2018156442A1 (enExample)

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