JP2020193360A5 - - Google Patents

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JP2020193360A5
JP2020193360A5 JP2019099034A JP2019099034A JP2020193360A5 JP 2020193360 A5 JP2020193360 A5 JP 2020193360A5 JP 2019099034 A JP2019099034 A JP 2019099034A JP 2019099034 A JP2019099034 A JP 2019099034A JP 2020193360 A5 JP2020193360 A5 JP 2020193360A5
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heater
region
vapor
evaporation source
source device
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JP2019099034A
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JP2020193360A (ja
JP7202971B2 (ja
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Priority claimed from JP2019099034A external-priority patent/JP7202971B2/ja
Priority to KR1020190168646A priority patent/KR102842000B1/ko
Priority to CN201911305385.1A priority patent/CN112011761A/zh
Publication of JP2020193360A publication Critical patent/JP2020193360A/ja
Publication of JP2020193360A5 publication Critical patent/JP2020193360A5/ja
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JP2019099034A 2019-05-28 2019-05-28 蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法 Active JP7202971B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2019099034A JP7202971B2 (ja) 2019-05-28 2019-05-28 蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法
KR1020190168646A KR102842000B1 (ko) 2019-05-28 2019-12-17 증발원 장치, 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법
CN201911305385.1A CN112011761A (zh) 2019-05-28 2019-12-18 蒸发源装置、成膜装置、成膜方法及电子器件的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019099034A JP7202971B2 (ja) 2019-05-28 2019-05-28 蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法

Publications (3)

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JP2020193360A JP2020193360A (ja) 2020-12-03
JP2020193360A5 true JP2020193360A5 (enExample) 2022-03-10
JP7202971B2 JP7202971B2 (ja) 2023-01-12

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JP2019099034A Active JP7202971B2 (ja) 2019-05-28 2019-05-28 蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法

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JP (1) JP7202971B2 (enExample)
KR (1) KR102842000B1 (enExample)
CN (1) CN112011761A (enExample)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3853587B2 (ja) 2000-10-19 2006-12-06 株式会社日立国際電気 基板処理装置および半導体装置の製造方法
JP4916385B2 (ja) 2007-06-11 2012-04-11 キヤノン株式会社 有機発光素子の製造方法及び蒸着装置
JP2011162846A (ja) 2010-02-10 2011-08-25 Mitsubishi Heavy Ind Ltd 真空蒸発源
JP2014070227A (ja) * 2012-09-27 2014-04-21 Hitachi High-Technologies Corp 成膜装置とその蒸発源の温度制御方法及び温度制御装置
KR101499054B1 (ko) * 2013-07-23 2015-03-06 (주)알파플러스 내부 오염 방지형 진공 증발원
KR20150061297A (ko) * 2013-11-27 2015-06-04 주식회사 에스에프에이 증발 소스 및 그를 구비하는 평판표시소자의 증발 장치
CN206916210U (zh) * 2017-07-03 2018-01-23 京东方科技集团股份有限公司 坩埚、蒸发源及蒸镀设备
JP6436544B1 (ja) * 2017-08-07 2018-12-12 キヤノントッキ株式会社 蒸発源装置およびその制御方法
JP6686069B2 (ja) * 2018-05-29 2020-04-22 キヤノントッキ株式会社 蒸発源装置、蒸着装置、および蒸着システム

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