JP2020027807A5 - - Google Patents

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Publication number
JP2020027807A5
JP2020027807A5 JP2018150053A JP2018150053A JP2020027807A5 JP 2020027807 A5 JP2020027807 A5 JP 2020027807A5 JP 2018150053 A JP2018150053 A JP 2018150053A JP 2018150053 A JP2018150053 A JP 2018150053A JP 2020027807 A5 JP2020027807 A5 JP 2020027807A5
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JP
Japan
Prior art keywords
cleaning
substrate
cleaning tool
processed
tool
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2018150053A
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English (en)
Japanese (ja)
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JP7224128B2 (ja
JP2020027807A (ja
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Priority claimed from JP2018150053A external-priority patent/JP7224128B2/ja
Priority to JP2018150053A priority Critical patent/JP7224128B2/ja
Priority to TW108126694A priority patent/TWI808227B/zh
Priority to KR1020190094133A priority patent/KR102661661B1/ko
Priority to SG10201907194RA priority patent/SG10201907194RA/en
Priority to EP19190837.5A priority patent/EP3608948A1/en
Priority to US16/536,939 priority patent/US11424138B2/en
Priority to CN201910732982.6A priority patent/CN110828334A/zh
Publication of JP2020027807A publication Critical patent/JP2020027807A/ja
Publication of JP2020027807A5 publication Critical patent/JP2020027807A5/ja
Publication of JP7224128B2 publication Critical patent/JP7224128B2/ja
Application granted granted Critical
Active legal-status Critical Current
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JP2018150053A 2018-08-09 2018-08-09 基板用洗浄具、基板洗浄装置、基板処理装置、基板処理方法および基板用洗浄具の製造方法 Active JP7224128B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2018150053A JP7224128B2 (ja) 2018-08-09 2018-08-09 基板用洗浄具、基板洗浄装置、基板処理装置、基板処理方法および基板用洗浄具の製造方法
TW108126694A TWI808227B (zh) 2018-08-09 2019-07-29 基板清洗裝置及基板清洗方法
KR1020190094133A KR102661661B1 (ko) 2018-08-09 2019-08-02 기판 세정 장치
SG10201907194RA SG10201907194RA (en) 2018-08-09 2019-08-05 Substrate cleaning tool, substrate cleaning apparatus, substrate processing apparatus, substrate processing method, and method of manufacturing substrate cleaning tool
EP19190837.5A EP3608948A1 (en) 2018-08-09 2019-08-08 Substrate cleaning tool, substrate cleaning apparatus, substrate processing apparatus, substrate processing method, and method of manufacturing substrate cleaning tool
US16/536,939 US11424138B2 (en) 2018-08-09 2019-08-09 Substrate cleaning tool, substrate cleaning apparatus, substrate processing apparatus, substrate processing method, and method of manufacturing substrate cleaning tool
CN201910732982.6A CN110828334A (zh) 2018-08-09 2019-08-09 基板用清洗件、基板清洗装置、基板处理装置、基板处理方法以及基板用清洗件的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018150053A JP7224128B2 (ja) 2018-08-09 2018-08-09 基板用洗浄具、基板洗浄装置、基板処理装置、基板処理方法および基板用洗浄具の製造方法

Publications (3)

Publication Number Publication Date
JP2020027807A JP2020027807A (ja) 2020-02-20
JP2020027807A5 true JP2020027807A5 (zh) 2021-07-29
JP7224128B2 JP7224128B2 (ja) 2023-02-17

Family

ID=67658597

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018150053A Active JP7224128B2 (ja) 2018-08-09 2018-08-09 基板用洗浄具、基板洗浄装置、基板処理装置、基板処理方法および基板用洗浄具の製造方法

Country Status (7)

Country Link
US (1) US11424138B2 (zh)
EP (1) EP3608948A1 (zh)
JP (1) JP7224128B2 (zh)
KR (1) KR102661661B1 (zh)
CN (1) CN110828334A (zh)
SG (1) SG10201907194RA (zh)
TW (1) TWI808227B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7166132B2 (ja) 2018-10-12 2022-11-07 株式会社荏原製作所 基板洗浄部材および基板洗浄装置
US11335588B2 (en) * 2019-06-18 2022-05-17 Ebara Corporation Substrate holding apparatus and substrate processing apparatus
JP2022034694A (ja) * 2020-08-19 2022-03-04 株式会社荏原製作所 洗浄具のクリーニング方法、装置、基板洗浄装置及び洗浄具の製造方法
US11823916B2 (en) * 2020-11-06 2023-11-21 Applied Materials, Inc. Apparatus and method of substrate edge cleaning and substrate carrier head gap cleaning
CN113078078A (zh) * 2021-03-19 2021-07-06 长鑫存储技术有限公司 晶圆清洗方法及晶圆清洗装置
KR102634959B1 (ko) * 2023-09-05 2024-02-08 주식회사 유일로보틱스 복합 비젼 검사기능을 가진 협동 로봇

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US6557202B1 (en) * 1999-12-03 2003-05-06 Lam Research Corporation Wafer scrubbing brush core having an internal motor and method of making the same
JP2002050607A (ja) * 2000-08-03 2002-02-15 Kaijo Corp 基板処理方法
US6802877B2 (en) * 2001-04-20 2004-10-12 Thomas J. Drury Polyvinyl acetal composition roller brush with abrasive outer surface
EP1466699A1 (en) * 2003-04-09 2004-10-13 JSR Corporation Abrasive pad, method and metal mold for manufacturing the same, and semiconductor wafer polishing method
KR100562502B1 (ko) * 2003-07-02 2006-03-21 삼성전자주식회사 반도체 기판의 가장자리부 처리 장치 및 방법
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US20070224811A1 (en) * 2006-03-16 2007-09-27 Xinming Wang Substrate processing method and substrate processing apparatus
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JP4509981B2 (ja) * 2006-08-11 2010-07-21 日東電工株式会社 クリーニング部材、クリーニング機能付搬送部材、および基板処理装置のクリーニング方法
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JP6316730B2 (ja) * 2014-10-31 2018-04-25 株式会社荏原製作所 ロール部材、ペンシル部材、及びそれらの少なくともいずれか一方を含む基板処理装置
JP6726575B2 (ja) * 2016-02-01 2020-07-22 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置、基板処理装置、基板洗浄方法および基板処理方法
JP6643942B2 (ja) 2016-04-12 2020-02-12 株式会社荏原製作所 洗浄部材、基板洗浄装置及び基板処理装置

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