JP2020017565A5 - - Google Patents
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- JP2020017565A5 JP2020017565A5 JP2018137722A JP2018137722A JP2020017565A5 JP 2020017565 A5 JP2020017565 A5 JP 2020017565A5 JP 2018137722 A JP2018137722 A JP 2018137722A JP 2018137722 A JP2018137722 A JP 2018137722A JP 2020017565 A5 JP2020017565 A5 JP 2020017565A5
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- JP
- Japan
- Prior art keywords
- period
- amplitude
- pulse
- processing apparatus
- plasma processing
- Prior art date
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- 238000012544 monitoring process Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018137722A JP6976228B2 (ja) | 2018-07-23 | 2018-07-23 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018137722A JP6976228B2 (ja) | 2018-07-23 | 2018-07-23 | プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020017565A JP2020017565A (ja) | 2020-01-30 |
| JP2020017565A5 true JP2020017565A5 (enExample) | 2020-08-06 |
| JP6976228B2 JP6976228B2 (ja) | 2021-12-08 |
Family
ID=69580797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018137722A Active JP6976228B2 (ja) | 2018-07-23 | 2018-07-23 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6976228B2 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7508790B2 (ja) * | 2020-02-05 | 2024-07-02 | 株式会社三洋物産 | 遊技機 |
| JP7508791B2 (ja) * | 2020-02-05 | 2024-07-02 | 株式会社三洋物産 | 遊技機 |
| JP7508788B2 (ja) * | 2020-02-05 | 2024-07-02 | 株式会社三洋物産 | 遊技機 |
| JP7508794B2 (ja) * | 2020-02-05 | 2024-07-02 | 株式会社三洋物産 | 遊技機 |
| JP7508789B2 (ja) * | 2020-02-05 | 2024-07-02 | 株式会社三洋物産 | 遊技機 |
| JP7508793B2 (ja) * | 2020-02-05 | 2024-07-02 | 株式会社三洋物産 | 遊技機 |
| JP7508795B2 (ja) * | 2020-02-06 | 2024-07-02 | 株式会社三洋物産 | 遊技機 |
| KR20220027803A (ko) | 2020-08-27 | 2022-03-08 | 주식회사 히타치하이테크 | 플라스마 처리 장치 |
| KR20230133757A (ko) * | 2021-02-05 | 2023-09-19 | 램 리써치 코포레이션 | 균일성을 달성하기 위한 듀티 사이클 제어 |
| TW202308469A (zh) * | 2021-06-08 | 2023-02-16 | 日商東京威力科創股份有限公司 | 電漿處理裝置及電漿處理方法 |
| KR102812573B1 (ko) | 2022-06-07 | 2025-05-26 | 주식회사 히타치하이테크 | 플라스마 처리 장치 |
| KR20240168908A (ko) | 2023-05-19 | 2024-12-02 | 주식회사 히타치하이테크 | 플라스마 처리 장치 및 플라스마 처리 방법 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100549901B1 (ko) * | 1997-08-22 | 2006-02-06 | 동경 엘렉트론 주식회사 | 플라즈마 처리 장치의 제어 방법 |
| US9123509B2 (en) * | 2007-06-29 | 2015-09-01 | Varian Semiconductor Equipment Associates, Inc. | Techniques for plasma processing a substrate |
| JP6086631B2 (ja) * | 2013-10-17 | 2017-03-01 | 株式会社日立国際電気 | プラズマ生成用電源装置およびその制御方法 |
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2018
- 2018-07-23 JP JP2018137722A patent/JP6976228B2/ja active Active