JP6086631B2 - プラズマ生成用電源装置およびその制御方法 - Google Patents
プラズマ生成用電源装置およびその制御方法 Download PDFInfo
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- JP6086631B2 JP6086631B2 JP2015542546A JP2015542546A JP6086631B2 JP 6086631 B2 JP6086631 B2 JP 6086631B2 JP 2015542546 A JP2015542546 A JP 2015542546A JP 2015542546 A JP2015542546 A JP 2015542546A JP 6086631 B2 JP6086631 B2 JP 6086631B2
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- 238000000034 method Methods 0.000 title claims description 6
- 230000003321 amplification Effects 0.000 claims description 4
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 description 20
- 238000010586 diagram Methods 0.000 description 19
- 230000020169 heat generation Effects 0.000 description 10
- 230000007423 decrease Effects 0.000 description 8
- 230000007704 transition Effects 0.000 description 5
- 230000010355 oscillation Effects 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 230000032683 aging Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32146—Amplitude modulation, includes pulsing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
Description
Claims (2)
- 外部に設けられプラズマを生成するプラズマ生成部へ、一定およびパルス変調の高周波電力を供給するプラズマ生成用電源装置において、
前記パルス変調の高周波電力のパルスデューティ比および前記パルス変調の高周波電力のレベルおよび前記パルス変調の高周波電力の増幅素子の消費電流により、
前記パルス変調の高周波電力の増幅素子のドレイン電源電圧を切り替える手段を備えたことを特徴とするプラズマ生成用電源装置。 - 外部に設けられプラズマを生成するプラズマ生成部へ、一定およびパルス変調の高周波電力を供給するプラズマ生成用電源装置の制御方法において、
前記パルス変調の高周波電力のパルスデューティ比および前記パルス変調の高周波電力のレベルおよび前記パルス変調の高周波電力の増幅素子の消費電流により、
前記パルス変調の高周波電力の増幅素子のドレイン電源電圧を切り替えることを特徴とするプラズマ生成用電源装置の制御方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013216293 | 2013-10-17 | ||
JP2013216293 | 2013-10-17 | ||
PCT/JP2014/074077 WO2015056509A1 (ja) | 2013-10-17 | 2014-09-11 | プラズマ生成用電源装置の制御方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP6086631B2 true JP6086631B2 (ja) | 2017-03-01 |
JPWO2015056509A1 JPWO2015056509A1 (ja) | 2017-03-09 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015542546A Active JP6086631B2 (ja) | 2013-10-17 | 2014-09-11 | プラズマ生成用電源装置およびその制御方法 |
Country Status (2)
Country | Link |
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JP (1) | JP6086631B2 (ja) |
WO (1) | WO2015056509A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10491202B2 (en) | 2016-09-28 | 2019-11-26 | Hitachi Kokusai Electric Inc. | RF generator |
JP6976228B2 (ja) * | 2018-07-23 | 2021-12-08 | 株式会社日立ハイテク | プラズマ処理装置 |
JP7418389B2 (ja) * | 2021-12-28 | 2024-01-19 | 株式会社京三製作所 | 高周波電源 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002270574A (ja) * | 2001-03-07 | 2002-09-20 | Hitachi Kokusai Electric Inc | プラズマエッチング装置 |
JP2007066778A (ja) * | 2005-08-31 | 2007-03-15 | Daihen Corp | 高周波電源装置 |
-
2014
- 2014-09-11 JP JP2015542546A patent/JP6086631B2/ja active Active
- 2014-09-11 WO PCT/JP2014/074077 patent/WO2015056509A1/ja active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002270574A (ja) * | 2001-03-07 | 2002-09-20 | Hitachi Kokusai Electric Inc | プラズマエッチング装置 |
JP2007066778A (ja) * | 2005-08-31 | 2007-03-15 | Daihen Corp | 高周波電源装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2015056509A1 (ja) | 2015-04-23 |
JPWO2015056509A1 (ja) | 2017-03-09 |
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