JP2015185698A5 - - Google Patents

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Publication number
JP2015185698A5
JP2015185698A5 JP2014061124A JP2014061124A JP2015185698A5 JP 2015185698 A5 JP2015185698 A5 JP 2015185698A5 JP 2014061124 A JP2014061124 A JP 2014061124A JP 2014061124 A JP2014061124 A JP 2014061124A JP 2015185698 A5 JP2015185698 A5 JP 2015185698A5
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JP
Japan
Prior art keywords
frequency power
processing apparatus
plasma processing
waveform
current
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JP2014061124A
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English (en)
Japanese (ja)
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JP2015185698A (ja
JP6295119B2 (ja
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Priority to JP2014061124A priority Critical patent/JP6295119B2/ja
Priority claimed from JP2014061124A external-priority patent/JP6295119B2/ja
Priority to TW104105046A priority patent/TWI585815B/zh
Priority to KR1020150023508A priority patent/KR101769073B1/ko
Priority to US14/626,958 priority patent/US10037868B2/en
Publication of JP2015185698A publication Critical patent/JP2015185698A/ja
Publication of JP2015185698A5 publication Critical patent/JP2015185698A5/ja
Application granted granted Critical
Publication of JP6295119B2 publication Critical patent/JP6295119B2/ja
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JP2014061124A 2014-03-25 2014-03-25 プラズマ処理装置 Active JP6295119B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014061124A JP6295119B2 (ja) 2014-03-25 2014-03-25 プラズマ処理装置
TW104105046A TWI585815B (zh) 2014-03-25 2015-02-13 Plasma processing device
KR1020150023508A KR101769073B1 (ko) 2014-03-25 2015-02-16 플라즈마 처리 장치
US14/626,958 US10037868B2 (en) 2014-03-25 2015-02-20 Plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014061124A JP6295119B2 (ja) 2014-03-25 2014-03-25 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2015185698A JP2015185698A (ja) 2015-10-22
JP2015185698A5 true JP2015185698A5 (enExample) 2017-03-02
JP6295119B2 JP6295119B2 (ja) 2018-03-14

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ID=54191375

Family Applications (1)

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JP2014061124A Active JP6295119B2 (ja) 2014-03-25 2014-03-25 プラズマ処理装置

Country Status (4)

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US (1) US10037868B2 (enExample)
JP (1) JP6295119B2 (enExample)
KR (1) KR101769073B1 (enExample)
TW (1) TWI585815B (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6315809B2 (ja) * 2014-08-28 2018-04-25 東京エレクトロン株式会社 エッチング方法
JP6491888B2 (ja) * 2015-01-19 2019-03-27 株式会社日立ハイテクノロジーズ プラズマ処理方法およびプラズマ処理装置
US9754769B2 (en) * 2015-09-15 2017-09-05 Lam Research Corporation Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching
JP6523989B2 (ja) * 2016-02-19 2019-06-05 株式会社日立ハイテクノロジーズ プラズマ処理方法及びプラズマ処理装置
US20240079213A9 (en) * 2017-11-17 2024-03-07 Advanced Energy Industries, Inc. Synchronization of plasma processing components
JP7175239B2 (ja) * 2018-06-22 2022-11-18 東京エレクトロン株式会社 制御方法、プラズマ処理装置、プログラム及び記憶媒体
JP6846387B2 (ja) * 2018-06-22 2021-03-24 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
KR20250100790A (ko) * 2019-01-22 2025-07-03 어플라이드 머티어리얼스, 인코포레이티드 펄스 전압 파형을 제어하기 위한 피드백 루프
JP2020181650A (ja) * 2019-04-23 2020-11-05 東京エレクトロン株式会社 補正関数を決定する方法
CN113272939B (zh) * 2019-12-17 2023-11-14 株式会社日立高新技术 等离子体处理装置以及等离子体处理装置的工作方法
JP7437981B2 (ja) * 2020-03-06 2024-02-26 東京エレクトロン株式会社 プラズマ処理装置
JP7291091B2 (ja) * 2020-03-16 2023-06-14 株式会社京三製作所 高周波電源装置及びその出力制御方法
CN111370286B (zh) * 2020-03-24 2023-02-07 中国科学院近代物理研究所 一种用于治疗装备的等离子体源及其使用方法
KR102437091B1 (ko) * 2020-08-14 2022-08-26 한국기계연구원 플라즈마 화학기상증착 공정의 실시간 제어 방법 및 플라즈마 화학기상증착용 반응 챔버
US20230230805A1 (en) * 2020-10-26 2023-07-20 Lam Research Corporation Synchronization of rf pulsing schemes and of sensor data collection
TW202225438A (zh) * 2020-11-25 2022-07-01 美商應用材料股份有限公司 脈衝pvd功率之波形形狀因子
TW202336803A (zh) * 2021-11-19 2023-09-16 日商東京威力科創股份有限公司 電漿處理裝置、控制方法、電源系統、程式及記憶媒體
US12131884B2 (en) * 2022-01-12 2024-10-29 Mks Instruments, Inc. Pulse and bias synchronization methods and systems

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3565774B2 (ja) 2000-09-12 2004-09-15 株式会社日立製作所 プラズマ処理装置及び処理方法
US7878145B2 (en) * 2004-06-02 2011-02-01 Varian Semiconductor Equipment Associates, Inc. Monitoring plasma ion implantation systems for fault detection and process control
US7750645B2 (en) * 2007-08-15 2010-07-06 Applied Materials, Inc. Method of wafer level transient sensing, threshold comparison and arc flag generation/deactivation
JP2009064814A (ja) * 2007-09-04 2009-03-26 Hitachi High-Technologies Corp プラズマ処理装置
US8324525B2 (en) * 2008-05-29 2012-12-04 Applied Materials, Inc. Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator
US8337661B2 (en) * 2008-05-29 2012-12-25 Applied Materials, Inc. Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator
JP2010238881A (ja) * 2009-03-31 2010-10-21 Tokyo Electron Ltd プラズマ処理装置及びプラズマ処理方法
US8901935B2 (en) * 2009-11-19 2014-12-02 Lam Research Corporation Methods and apparatus for detecting the confinement state of plasma in a plasma processing system
JP2012060104A (ja) 2010-08-11 2012-03-22 Toshiba Corp 電源制御装置、プラズマ処理装置、及びプラズマ処理方法
JP5867701B2 (ja) * 2011-12-15 2016-02-24 東京エレクトロン株式会社 プラズマ処理装置
JP5808012B2 (ja) * 2011-12-27 2015-11-10 東京エレクトロン株式会社 プラズマ処理装置
JP5921964B2 (ja) * 2012-06-11 2016-05-24 東京エレクトロン株式会社 プラズマ処理装置及びプローブ装置
JP5822795B2 (ja) 2012-07-17 2015-11-24 株式会社日立ハイテクノロジーズ プラズマ処理装置

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