JP2019537271A5 - - Google Patents

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Publication number
JP2019537271A5
JP2019537271A5 JP2019529208A JP2019529208A JP2019537271A5 JP 2019537271 A5 JP2019537271 A5 JP 2019537271A5 JP 2019529208 A JP2019529208 A JP 2019529208A JP 2019529208 A JP2019529208 A JP 2019529208A JP 2019537271 A5 JP2019537271 A5 JP 2019537271A5
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JP
Japan
Prior art keywords
feature
lithography method
imprint lithography
substrate
size range
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JP2019529208A
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English (en)
Japanese (ja)
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JP6925423B2 (ja
JP2019537271A (ja
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Priority claimed from PCT/US2017/051444 external-priority patent/WO2018102002A1/en
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Publication of JP2019537271A5 publication Critical patent/JP2019537271A5/ja
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JP2019529208A 2016-12-02 2017-09-14 インプリントリソグラフィプロセスにおける光学層の構成 Active JP6925423B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662429214P 2016-12-02 2016-12-02
US62/429,214 2016-12-02
PCT/US2017/051444 WO2018102002A1 (en) 2016-12-02 2017-09-14 Configuring optical layers in imprint lithography processes

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2021127297A Division JP7008157B2 (ja) 2016-12-02 2021-08-03 インプリントリソグラフィプロセスにおける光学層の構成

Publications (3)

Publication Number Publication Date
JP2019537271A JP2019537271A (ja) 2019-12-19
JP2019537271A5 true JP2019537271A5 (enExample) 2020-11-12
JP6925423B2 JP6925423B2 (ja) 2021-08-25

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JP2019529208A Active JP6925423B2 (ja) 2016-12-02 2017-09-14 インプリントリソグラフィプロセスにおける光学層の構成
JP2021127297A Active JP7008157B2 (ja) 2016-12-02 2021-08-03 インプリントリソグラフィプロセスにおける光学層の構成

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JP2021127297A Active JP7008157B2 (ja) 2016-12-02 2021-08-03 インプリントリソグラフィプロセスにおける光学層の構成

Country Status (8)

Country Link
US (2) US10747107B2 (enExample)
EP (2) EP4357298A3 (enExample)
JP (2) JP6925423B2 (enExample)
KR (1) KR102231664B1 (enExample)
CN (2) CN110023234B (enExample)
CA (1) CA3045096C (enExample)
IL (1) IL266851B2 (enExample)
WO (1) WO2018102002A1 (enExample)

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US10747107B2 (en) 2016-12-02 2020-08-18 Molecular Imprints, Inc. Configuring optical layers in imprint lithography processes
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KR20250026388A (ko) 2017-10-20 2025-02-25 매직 립, 인코포레이티드 임프린트 리소그래피 프로세스들에서의 광학 층들의 구성
US11249405B2 (en) * 2018-04-30 2022-02-15 Canon Kabushiki Kaisha System and method for improving the performance of a nanoimprint system
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CN115190837A (zh) * 2020-02-28 2022-10-14 奇跃公司 制造用于形成具有一体间隔件的目镜的模具的方法
CN117761966A (zh) * 2020-07-01 2024-03-26 吉佳蓝科技股份有限公司 纳米压印用复制模制作装置
EP4202536B1 (en) * 2020-08-20 2025-07-16 Toppan Inc. Diffraction sheet, method for manufacturing same, three-dimensional display device, light-beam reproduction device, three-dimensional space display system, light-beam reproduction method, and program
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CN121325507B (zh) * 2025-12-15 2026-02-24 深圳大学 一种双面压印成形方法及双面微纳结构元件

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