JP2019537271A5 - - Google Patents

Download PDF

Info

Publication number
JP2019537271A5
JP2019537271A5 JP2019529208A JP2019529208A JP2019537271A5 JP 2019537271 A5 JP2019537271 A5 JP 2019537271A5 JP 2019529208 A JP2019529208 A JP 2019529208A JP 2019529208 A JP2019529208 A JP 2019529208A JP 2019537271 A5 JP2019537271 A5 JP 2019537271A5
Authority
JP
Japan
Prior art keywords
feature
lithography method
imprint lithography
substrate
size range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2019529208A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019537271A (ja
JP6925423B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2017/051444 external-priority patent/WO2018102002A1/en
Publication of JP2019537271A publication Critical patent/JP2019537271A/ja
Publication of JP2019537271A5 publication Critical patent/JP2019537271A5/ja
Application granted granted Critical
Publication of JP6925423B2 publication Critical patent/JP6925423B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2019529208A 2016-12-02 2017-09-14 インプリントリソグラフィプロセスにおける光学層の構成 Active JP6925423B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662429214P 2016-12-02 2016-12-02
US62/429,214 2016-12-02
PCT/US2017/051444 WO2018102002A1 (en) 2016-12-02 2017-09-14 Configuring optical layers in imprint lithography processes

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2021127297A Division JP7008157B2 (ja) 2016-12-02 2021-08-03 インプリントリソグラフィプロセスにおける光学層の構成

Publications (3)

Publication Number Publication Date
JP2019537271A JP2019537271A (ja) 2019-12-19
JP2019537271A5 true JP2019537271A5 (enExample) 2020-11-12
JP6925423B2 JP6925423B2 (ja) 2021-08-25

Family

ID=62240094

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2019529208A Active JP6925423B2 (ja) 2016-12-02 2017-09-14 インプリントリソグラフィプロセスにおける光学層の構成
JP2021127297A Active JP7008157B2 (ja) 2016-12-02 2021-08-03 インプリントリソグラフィプロセスにおける光学層の構成

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2021127297A Active JP7008157B2 (ja) 2016-12-02 2021-08-03 インプリントリソグラフィプロセスにおける光学層の構成

Country Status (8)

Country Link
US (2) US10747107B2 (enExample)
EP (2) EP3548424B1 (enExample)
JP (2) JP6925423B2 (enExample)
KR (1) KR102231664B1 (enExample)
CN (2) CN117806119B (enExample)
CA (1) CA3045096C (enExample)
IL (1) IL266851B2 (enExample)
WO (1) WO2018102002A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018102002A1 (en) 2016-12-02 2018-06-07 Molecular Imprints, Inc. Configuring optical layers in imprint lithography processes
KR102565288B1 (ko) 2017-02-01 2023-08-08 몰레큘러 임프린츠 인코퍼레이티드 임프린트 리소그래피 프로세스로 광학 층들의 구성
IL273853B2 (en) 2017-10-20 2025-04-01 Magic Leap Inc Configuring optical layers in lithographic imprinting processes
US11249405B2 (en) * 2018-04-30 2022-02-15 Canon Kabushiki Kaisha System and method for improving the performance of a nanoimprint system
KR101990122B1 (ko) * 2018-11-21 2019-06-19 주식회사 기가레인 임프린트 리소그래피용 리플리카 몰드 제작 장치 및 그 제작 방법
CN115190837A (zh) * 2020-02-28 2022-10-14 奇跃公司 制造用于形成具有一体间隔件的目镜的模具的方法
CN117761966A (zh) * 2020-07-01 2024-03-26 吉佳蓝科技股份有限公司 纳米压印用复制模制作装置
WO2022039208A1 (ja) * 2020-08-20 2022-02-24 凸版印刷株式会社 回折シートおよび製造方法、並びに３次元表示装置、光線再生装置、三次元空間表示システム、光線再生方法、及びプログラム
CN114002915B (zh) * 2021-11-18 2024-08-16 北京驭光科技发展有限公司 压印衬底及压印方法
CN114995055A (zh) * 2022-08-08 2022-09-02 歌尔光学科技有限公司 一种双面压印方法以及双面压印产品
CN118782509B (zh) * 2024-09-13 2025-02-07 度亘核芯光电技术(苏州)有限公司 一种芯片制备方法

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69018336T2 (de) * 1989-08-18 1995-12-14 Mitsubishi Electric Corp Verfahren zur Herstellung eines Beugungsgitters.
EP0698804A3 (en) * 1994-08-26 1998-09-02 Omron Corporation Optical low pass filter, polariser and liquid crystal display devices using such
US5544268A (en) * 1994-09-09 1996-08-06 Deacon Research Display panel with electrically-controlled waveguide-routing
US5907436A (en) * 1995-09-29 1999-05-25 The Regents Of The University Of California Multilayer dielectric diffraction gratings
US6396559B1 (en) 1998-11-17 2002-05-28 Sharp Kabushiki Kaisha LCD including spacers used in combination with polymer walls
US6696220B2 (en) * 2000-10-12 2004-02-24 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro-and nano-imprint lithography
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
EP1443344A1 (en) * 2003-01-29 2004-08-04 Heptagon Oy Manufacturing micro-structured elements
KR100898470B1 (ko) * 2004-12-03 2009-05-21 샤프 가부시키가이샤 반사 방지재, 광학 소자, 및 표시 장치 및 스탬퍼의 제조 방법 및 스탬퍼를 이용한 반사 방지재의 제조 방법
US7573640B2 (en) 2005-04-04 2009-08-11 Mirage Innovations Ltd. Multi-plane optical apparatus
US20070013293A1 (en) * 2005-07-12 2007-01-18 Eastman Kodak Company OLED device having spacers
US20070178666A1 (en) * 2006-01-31 2007-08-02 Stats Chippac Ltd. Integrated circuit system with waferscale spacer system
US8599301B2 (en) * 2006-04-17 2013-12-03 Omnivision Technologies, Inc. Arrayed imaging systems having improved alignment and associated methods
EP2097491A4 (en) 2006-12-28 2011-04-27 Ricoh Co Ltd INK RECHARGE AND INK CARTRIDGE
US7564067B2 (en) * 2007-03-29 2009-07-21 Eastman Kodak Company Device having spacers
US8293354B2 (en) * 2008-04-09 2012-10-23 The Regents Of The University Of Michigan UV curable silsesquioxane resins for nanoprint lithography
NL2003179A1 (nl) * 2008-07-18 2010-01-19 Asml Netherlands Bv Lithographic apparatus and device manufacturing method and scatterometry method and measurement system used therein.
US20100052216A1 (en) * 2008-08-29 2010-03-04 Yong Hyup Kim Nano imprint lithography using an elastic roller
US8039399B2 (en) * 2008-10-09 2011-10-18 Micron Technology, Inc. Methods of forming patterns utilizing lithography and spacers
JP2011071500A (ja) * 2009-08-31 2011-04-07 Fujifilm Corp パターン転写装置及びパターン形成方法
BR112012008635A2 (pt) * 2009-10-14 2016-04-19 Sharp Kk matriz e método para fabricar matriz, e revestimento anti-reflexão
US8427747B2 (en) 2010-04-22 2013-04-23 3M Innovative Properties Company OLED light extraction films laminated onto glass substrates
KR101182234B1 (ko) 2010-05-28 2012-09-12 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
CN102193310B (zh) * 2011-05-17 2012-09-05 西安交通大学 一种机床测量用光栅两步固化辊压印成型方法
US9676649B2 (en) 2011-08-26 2017-06-13 Corning Incorporated Glass substrates with strategically imprinted B-side features and methods for manufacturing the same
US9616614B2 (en) * 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
CA2905564A1 (en) * 2013-03-15 2014-09-18 Richard Harry Turner A system and methods for the in vitro detection of particles and soluble chemical entities in body fluids
WO2014202726A1 (en) * 2013-06-20 2014-12-24 Koninklijke Philips N.V. Light emitting device
JP6171740B2 (ja) * 2013-09-02 2017-08-02 セイコーエプソン株式会社 光学デバイス及び画像表示装置
JP2015093399A (ja) * 2013-11-11 2015-05-18 セイコーエプソン株式会社 転写用の型、転写用の型を用いた回折格子及び光学装置、転写用の型を用いた凹凸形成方法、並びに凹凸形成方法を用いた回折格子の製造方法
US10677969B2 (en) * 2013-11-27 2020-06-09 Magic Leap, Inc. Manufacturing for virtual and augmented reality systems and components
EP3521253A1 (en) * 2013-12-19 2019-08-07 Corning Incorporated Textured surfaces for display applications
CN103996778B (zh) * 2014-03-14 2017-06-13 苏州大学 一种偏振出光发光二极管
CA3168318A1 (en) * 2014-09-29 2016-04-07 Magic Leap, Inc. Architectures and methods for outputting different wavelength light out of waveguides
JP6672585B2 (ja) * 2014-12-15 2020-03-25 凸版印刷株式会社 表示体
US9891436B2 (en) * 2016-02-11 2018-02-13 Microsoft Technology Licensing, Llc Waveguide-based displays with anti-reflective and highly-reflective coating
WO2018102002A1 (en) 2016-12-02 2018-06-07 Molecular Imprints, Inc. Configuring optical layers in imprint lithography processes

Similar Documents

Publication Publication Date Title
JP2019537271A5 (enExample)
JP6925423B2 (ja) インプリントリソグラフィプロセスにおける光学層の構成
IL299643A (en) Liquid crystal light-refracting devices with a nanoscale pattern and methods for their production
CN103260897B (zh) 图像和其制造方法
IL273853B1 (en) Configuring optical layers in imprint lithography processes
EP2881790A3 (en) Photomask blank
JP2017532231A5 (enExample)
ATE533084T1 (de) Stubstrat mit reflektierenden schichten geeignet zur herstellung von reflexionsmaskenrohlingen für die euv-lithographie
JP2014517937A5 (enExample)
WO2009035007A1 (ja) バナジウム酸化物薄膜パターン及びその作製方法
CN103631086A (zh) 一种用于集成光电子器件的微纳图形的制作方法及应用
JP2014232745A (ja) テンプレート基板、テンプレートブランク、ナノインプリント用テンプレート、および、テンプレート基板の製造方法、並びに、テンプレート基板の再生方法
CN103730339A (zh) 微纳尺度图纹压印模具的制作方法
JP2019527938A (ja) 導電性材料のインプリントリソグラフィの方法、インプリントリソグラフィのためのスタンプ、及びインプリントリソグラフィのための装置
JP6394114B2 (ja) テンプレートの製造方法およびテンプレート
CN116500854A (zh) 显示装置制造用光掩模、以及显示装置的制造方法
JP7139751B2 (ja) インプリントモールドの製造方法
CN112578491A (zh) 衍射光学元件与衍射光学元件的制造方法
US12197126B2 (en) Nanostamping method and nano-optical component
JP2005272623A (ja) 用紙
CN116449646A (zh) 在压印光刻工艺中配置光学层
JP2018098470A (ja) パターン形成方法及びレプリカモールドの製造方法
JP2018022722A (ja) パターン構造体の製造方法およびインプリント用モールドの製造方法