IL266851B2 - Configuring optical layers in imprint lithography processes - Google Patents

Configuring optical layers in imprint lithography processes

Info

Publication number
IL266851B2
IL266851B2 IL266851A IL26685119A IL266851B2 IL 266851 B2 IL266851 B2 IL 266851B2 IL 266851 A IL266851 A IL 266851A IL 26685119 A IL26685119 A IL 26685119A IL 266851 B2 IL266851 B2 IL 266851B2
Authority
IL
Israel
Prior art keywords
features
substrate
imprint lithography
lithography method
imprinting
Prior art date
Application number
IL266851A
Other languages
English (en)
Hebrew (he)
Other versions
IL266851A (en
IL266851B1 (en
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of IL266851A publication Critical patent/IL266851A/en
Publication of IL266851B1 publication Critical patent/IL266851B1/en
Publication of IL266851B2 publication Critical patent/IL266851B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/0123—Head-up displays characterised by optical features comprising devices increasing the field of view
    • G02B2027/0125—Field-of-view increase by wavefront division
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G02B2027/0174—Head mounted characterised by optical features holographic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B2027/0178—Eyeglass type

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Integrated Circuits (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)
IL266851A 2016-12-02 2017-09-14 Configuring optical layers in imprint lithography processes IL266851B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201662429214P 2016-12-02 2016-12-02
PCT/US2017/051444 WO2018102002A1 (en) 2016-12-02 2017-09-14 Configuring optical layers in imprint lithography processes

Publications (3)

Publication Number Publication Date
IL266851A IL266851A (en) 2019-07-31
IL266851B1 IL266851B1 (en) 2023-08-01
IL266851B2 true IL266851B2 (en) 2023-12-01

Family

ID=62240094

Family Applications (1)

Application Number Title Priority Date Filing Date
IL266851A IL266851B2 (en) 2016-12-02 2017-09-14 Configuring optical layers in imprint lithography processes

Country Status (8)

Country Link
US (2) US10747107B2 (enExample)
EP (2) EP3548424B1 (enExample)
JP (2) JP6925423B2 (enExample)
KR (1) KR102231664B1 (enExample)
CN (2) CN117806119B (enExample)
CA (1) CA3045096C (enExample)
IL (1) IL266851B2 (enExample)
WO (1) WO2018102002A1 (enExample)

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WO2018102002A1 (en) 2016-12-02 2018-06-07 Molecular Imprints, Inc. Configuring optical layers in imprint lithography processes
KR102565288B1 (ko) 2017-02-01 2023-08-08 몰레큘러 임프린츠 인코퍼레이티드 임프린트 리소그래피 프로세스로 광학 층들의 구성
IL273853B2 (en) 2017-10-20 2025-04-01 Magic Leap Inc Configuring optical layers in lithographic imprinting processes
US11249405B2 (en) * 2018-04-30 2022-02-15 Canon Kabushiki Kaisha System and method for improving the performance of a nanoimprint system
KR101990122B1 (ko) * 2018-11-21 2019-06-19 주식회사 기가레인 임프린트 리소그래피용 리플리카 몰드 제작 장치 및 그 제작 방법
CN115190837A (zh) * 2020-02-28 2022-10-14 奇跃公司 制造用于形成具有一体间隔件的目镜的模具的方法
CN117761966A (zh) * 2020-07-01 2024-03-26 吉佳蓝科技股份有限公司 纳米压印用复制模制作装置
WO2022039208A1 (ja) * 2020-08-20 2022-02-24 凸版印刷株式会社 回折シートおよび製造方法、並びに３次元表示装置、光線再生装置、三次元空間表示システム、光線再生方法、及びプログラム
CN114002915B (zh) * 2021-11-18 2024-08-16 北京驭光科技发展有限公司 压印衬底及压印方法
CN114995055A (zh) * 2022-08-08 2022-09-02 歌尔光学科技有限公司 一种双面压印方法以及双面压印产品
CN118782509B (zh) * 2024-09-13 2025-02-07 度亘核芯光电技术(苏州)有限公司 一种芯片制备方法

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US20130052414A1 (en) * 2011-08-26 2013-02-28 Michael Sean Dobbins Glass substrates with strategically imprinted b-side features and methods for manufacturing the same
US8427747B2 (en) * 2010-04-22 2013-04-23 3M Innovative Properties Company OLED light extraction films laminated onto glass substrates
US20130203193A1 (en) * 2010-05-28 2013-08-08 Samsung Display Co., Ltd. Organic light emitting diode display and method for manufacturing the same
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Publication number Priority date Publication date Assignee Title
US20070178666A1 (en) * 2006-01-31 2007-08-02 Stats Chippac Ltd. Integrated circuit system with waferscale spacer system
US20100052216A1 (en) * 2008-08-29 2010-03-04 Yong Hyup Kim Nano imprint lithography using an elastic roller
US8427747B2 (en) * 2010-04-22 2013-04-23 3M Innovative Properties Company OLED light extraction films laminated onto glass substrates
US20130203193A1 (en) * 2010-05-28 2013-08-08 Samsung Display Co., Ltd. Organic light emitting diode display and method for manufacturing the same
US20130052414A1 (en) * 2011-08-26 2013-02-28 Michael Sean Dobbins Glass substrates with strategically imprinted b-side features and methods for manufacturing the same
US20130214452A1 (en) * 2012-02-22 2013-08-22 Molecular Imprints, Inc. Large area imprint lithography

Also Published As

Publication number Publication date
CN117806119A (zh) 2024-04-02
JP2019537271A (ja) 2019-12-19
CN110023234A (zh) 2019-07-16
CA3045096A1 (en) 2018-06-07
CA3045096C (en) 2023-04-25
WO2018102002A1 (en) 2018-06-07
US20180157170A1 (en) 2018-06-07
KR102231664B1 (ko) 2021-03-23
CN110023234B (zh) 2024-01-09
US11048164B2 (en) 2021-06-29
EP3548424A4 (en) 2019-12-04
EP3548424A1 (en) 2019-10-09
EP4357298A3 (en) 2024-08-07
JP6925423B2 (ja) 2021-08-25
CN117806119B (zh) 2025-05-27
EP4357298A2 (en) 2024-04-24
IL266851A (en) 2019-07-31
US20200348589A1 (en) 2020-11-05
JP2021192100A (ja) 2021-12-16
EP3548424B1 (en) 2024-03-06
JP7008157B2 (ja) 2022-01-25
KR20190091493A (ko) 2019-08-06
US10747107B2 (en) 2020-08-18
IL266851B1 (en) 2023-08-01

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