JP2019532513A5 - - Google Patents
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- JP2019532513A5 JP2019532513A5 JP2019520551A JP2019520551A JP2019532513A5 JP 2019532513 A5 JP2019532513 A5 JP 2019532513A5 JP 2019520551 A JP2019520551 A JP 2019520551A JP 2019520551 A JP2019520551 A JP 2019520551A JP 2019532513 A5 JP2019532513 A5 JP 2019532513A5
- Authority
- JP
- Japan
- Prior art keywords
- imprint
- rlt
- fluid
- substrate
- dispensing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012530 fluid Substances 0.000 claims description 104
- 238000000034 method Methods 0.000 claims description 89
- 239000000758 substrate Substances 0.000 claims description 67
- 238000001459 lithography Methods 0.000 claims description 61
- 229920000642 polymer Polymers 0.000 claims description 15
- 238000005530 etching Methods 0.000 claims description 9
- 239000002086 nanomaterial Substances 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 4
- 238000000059 patterning Methods 0.000 claims description 4
- 238000001127 nanoimprint lithography Methods 0.000 claims description 3
- 230000001112 coagulating effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662409533P | 2016-10-18 | 2016-10-18 | |
| US62/409,533 | 2016-10-18 | ||
| PCT/US2017/051850 WO2018075174A1 (en) | 2016-10-18 | 2017-09-15 | Microlithographic fabrication of structures |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019532513A JP2019532513A (ja) | 2019-11-07 |
| JP2019532513A5 true JP2019532513A5 (enExample) | 2020-11-12 |
| JP6924828B2 JP6924828B2 (ja) | 2021-08-25 |
Family
ID=61903808
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019520551A Active JP6924828B2 (ja) | 2016-10-18 | 2017-09-15 | 構造のマイクロリソグラフィ加工 |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US10274823B2 (enExample) |
| JP (1) | JP6924828B2 (enExample) |
| KR (2) | KR102326522B1 (enExample) |
| CN (1) | CN109937127B (enExample) |
| TW (1) | TWI730185B (enExample) |
| WO (1) | WO2018075174A1 (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102502638B1 (ko) * | 2016-09-21 | 2023-02-21 | 몰레큘러 임프린츠 인코퍼레이티드 | 구조물들의 마이크로리소그래픽 제조 |
| KR102326522B1 (ko) | 2016-10-18 | 2021-11-12 | 몰레큘러 임프린츠 인코퍼레이티드 | 구조물들의 마이크로리소그래픽 제작 |
| US11184967B2 (en) | 2018-05-07 | 2021-11-23 | Zane Coleman | Angularly varying light emitting device with an imager |
| US10816939B1 (en) | 2018-05-07 | 2020-10-27 | Zane Coleman | Method of illuminating an environment using an angularly varying light emitting device and an imager |
| US10976483B2 (en) * | 2019-02-26 | 2021-04-13 | Facebook Technologies, Llc | Variable-etch-depth gratings |
| JP7500588B2 (ja) * | 2019-09-27 | 2024-06-17 | Hoya株式会社 | インプリントモールドの製造方法、インプリントモールド、モールドブランク、及び光学素子の製造方法 |
| JP7837323B2 (ja) * | 2020-08-28 | 2026-03-30 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化表面と囲まれた空隙とを含む物品、それを製造する方法、及び光学素子 |
| US20230266594A1 (en) * | 2020-09-08 | 2023-08-24 | Sony Group Corporation | Devices, systems, and methods for diffraction gratings |
| US11709422B2 (en) | 2020-09-17 | 2023-07-25 | Meta Platforms Technologies, Llc | Gray-tone lithography for precise control of grating etch depth |
| FI130103B (fi) | 2020-12-22 | 2023-03-01 | Dispelix Oy | Diffraktiivisen optisen elementin hilan leimasimen ja master-mallin valmistusmenetelmä, master-malli ja leimasin |
| CN114114727A (zh) * | 2021-10-12 | 2022-03-01 | 维达力实业（赤壁）有限公司 | 高透过、低反射的功能部件及其制备方法和应用 |
| CN114100998A (zh) * | 2021-10-12 | 2022-03-01 | 维达力实业（赤壁）有限公司 | 在基材表面制备微纳结构的方法和表面具有微纳结构的基材及其应用 |
| EP4202547B1 (en) * | 2021-12-22 | 2024-03-06 | Snap Inc. | Optical waveguide manufacturing method |
| JP2023129913A (ja) * | 2022-03-07 | 2023-09-20 | ソニーグループ株式会社 | 導光板及び画像表示装置 |
| WO2023229824A1 (en) | 2022-05-27 | 2023-11-30 | Applied Materials, Inc. | Method to improve display efficiency and uniformity of ar waveguide |
| CN120322406A (zh) | 2022-06-03 | 2025-07-15 | 奇跃公司 | 光学设备的纳米光刻中的压印技术 |
| EP4519089A4 (en) * | 2022-06-10 | 2025-07-23 | Magic Leap Inc | COMPENSATION FOR THICKNESS VARIATIONS IN SUBSTRATES FOR OPTICAL DEVICES |
| US20240085782A1 (en) * | 2022-09-14 | 2024-03-14 | Google Llc | Residual layer thickness modulation in nanoimprint lithography |
| KR102815881B1 (ko) * | 2022-11-29 | 2025-05-30 | 국립순천대학교산학협력단 | 패턴 마스터 몰드 제조 방법 및 패턴 형성용 롤러 |
| CN116679369A (zh) * | 2023-06-19 | 2023-09-01 | 慕德微纳(杭州)科技有限公司 | 一种衍射光学元件的同步分区加工方法 |
| CN116819664B (zh) * | 2023-06-19 | 2026-04-21 | 慕德微纳(杭州)科技有限公司 | 一种通过模板控制残胶层厚度的衍射光学元件加工方法 |
| US20240427236A1 (en) * | 2023-06-26 | 2024-12-26 | Google Llc | Process control pattern to improve nanoimprint detaching process |
| TWI875671B (zh) * | 2024-10-21 | 2025-03-01 | 聯華電子股份有限公司 | 圖案化方法 |
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|---|---|---|---|---|
| JPH0270412A (ja) * | 1988-09-07 | 1990-03-09 | Hitachi Ltd | 合成樹脂成形品の製造用スタンパ |
| US6713959B1 (en) * | 1998-08-28 | 2004-03-30 | Fujitsu Limited | Plasma display panel and method for producing the same |
| JP2001343512A (ja) * | 2000-05-31 | 2001-12-14 | Canon Inc | 回折光学素子及びそれを有する光学系 |
| SG142150A1 (en) * | 2000-07-16 | 2008-05-28 | Univ Texas | High-resolution overlay alignment systems for imprint lithography |
| CN1262883C (zh) | 2000-07-17 | 2006-07-05 | 得克萨斯州大学系统董事会 | 影印用于平版印刷工艺中的自动化液体分配的方法和系统 |
| MY144124A (en) * | 2002-07-11 | 2011-08-15 | Molecular Imprints Inc | Step and repeat imprint lithography systems |
| US7077992B2 (en) * | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
| US8349241B2 (en) | 2002-10-04 | 2013-01-08 | Molecular Imprints, Inc. | Method to arrange features on a substrate to replicate features having minimal dimensional variability |
| US7396475B2 (en) | 2003-04-25 | 2008-07-08 | Molecular Imprints, Inc. | Method of forming stepped structures employing imprint lithography |
| US20050160934A1 (en) | 2004-01-23 | 2005-07-28 | Molecular Imprints, Inc. | Materials and methods for imprint lithography |
| JP4322096B2 (ja) * | 2003-11-14 | 2009-08-26 | Ｔｄｋ株式会社 | レジストパターン形成方法並びに磁気記録媒体及び磁気ヘッドの製造方法 |
| KR101193918B1 (ko) * | 2004-06-03 | 2012-10-29 | 몰레큘러 임프린츠 인코퍼레이티드 | 나노-스케일 제조공정을 위한 유체 배분방법과 필요에 따른액적 배분방법 |
| US20060177535A1 (en) * | 2005-02-04 | 2006-08-10 | Molecular Imprints, Inc. | Imprint lithography template to facilitate control of liquid movement |
| EP1795497B1 (en) * | 2005-12-09 | 2012-03-14 | Obducat AB | Apparatus and method for transferring a pattern with intermediate stamp |
| US8215946B2 (en) | 2006-05-18 | 2012-07-10 | Molecular Imprints, Inc. | Imprint lithography system and method |
| JP2007328096A (ja) * | 2006-06-07 | 2007-12-20 | Ricoh Co Ltd | 回折光学素子とその作製方法および光学モジュール |
| US7776628B2 (en) | 2006-11-16 | 2010-08-17 | International Business Machines Corporation | Method and system for tone inverting of residual layer tolerant imprint lithography |
| JP5205866B2 (ja) * | 2007-08-23 | 2013-06-05 | 住友電気工業株式会社 | モールドの形成方法、回折格子の形成方法、および分布帰還型半導体レーザの製造方法 |
| US20090212012A1 (en) * | 2008-02-27 | 2009-08-27 | Molecular Imprints, Inc. | Critical dimension control during template formation |
| US8480933B2 (en) | 2008-10-22 | 2013-07-09 | Molecular Imprints, Inc. | Fluid dispense device calibration |
| JP5549245B2 (ja) * | 2010-02-01 | 2014-07-16 | 住友電気工業株式会社 | ナノインプリント法による回折格子の形成方法 |
| US20110277833A1 (en) | 2010-05-11 | 2011-11-17 | Molecular Imprints, Inc. | Backside contact solar cell |
| JP5395757B2 (ja) * | 2010-07-08 | 2014-01-22 | 株式会社東芝 | パターン形成方法 |
| JP2013224015A (ja) * | 2012-03-22 | 2013-10-31 | Mitsubishi Rayon Co Ltd | 光透過性フィルムおよびその製造方法 |
| CN110749378B (zh) | 2012-10-24 | 2022-12-27 | 视瑞尔技术公司 | 照明设备 |
| TWI637234B (zh) * | 2013-07-12 | 2018-10-01 | 美商佳能奈米科技股份有限公司 | 用於壓印微影術之利用方向性圖案化模板的液滴圖案生成技術 |
| JP6252769B2 (ja) * | 2014-03-24 | 2017-12-27 | パナソニックＩｐマネジメント株式会社 | インプリント転写物、インプリント転写型、およびインプリント転写方法 |
| JP2016058701A (ja) * | 2014-09-12 | 2016-04-21 | 株式会社東芝 | パターン形成方法および半導体装置の製造方法 |
| KR102326522B1 (ko) | 2016-10-18 | 2021-11-12 | 몰레큘러 임프린츠 인코퍼레이티드 | 구조물들의 마이크로리소그래픽 제작 |
-
2017
- 2017-09-15 KR KR1020197013579A patent/KR102326522B1/ko active Active
- 2017-09-15 WO PCT/US2017/051850 patent/WO2018075174A1/en not_active Ceased
- 2017-09-15 CN CN201780063791.4A patent/CN109937127B/zh active Active
- 2017-09-15 KR KR1020217036588A patent/KR102681074B1/ko active Active
- 2017-09-15 JP JP2019520551A patent/JP6924828B2/ja active Active
- 2017-09-15 US US15/705,948 patent/US10274823B2/en active Active
- 2017-10-16 TW TW106135258A patent/TWI730185B/zh active
-
2019
- 2019-03-18 US US16/356,836 patent/US10585350B2/en active Active
-
2020
- 2020-03-06 US US16/811,033 patent/US10802397B2/en active Active
- 2020-10-09 US US17/067,526 patent/US11307493B2/en active Active
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