JP2019531120A5 - - Google Patents
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- JP2019531120A5 JP2019531120A5 JP2019512893A JP2019512893A JP2019531120A5 JP 2019531120 A5 JP2019531120 A5 JP 2019531120A5 JP 2019512893 A JP2019512893 A JP 2019512893A JP 2019512893 A JP2019512893 A JP 2019512893A JP 2019531120 A5 JP2019531120 A5 JP 2019531120A5
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- Japan
- Prior art keywords
- lattice structure
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- ray
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- imaging system
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP16187753.5 | 2016-09-08 | ||
| EP16187753 | 2016-09-08 | ||
| PCT/EP2017/071806 WO2018046377A1 (en) | 2016-09-08 | 2017-08-30 | Source grating for x-ray imaging |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2019531120A JP2019531120A (ja) | 2019-10-31 |
| JP2019531120A5 true JP2019531120A5 (enExample) | 2020-10-08 |
| JP7044764B2 JP7044764B2 (ja) | 2022-03-30 |
| JP7044764B6 JP7044764B6 (ja) | 2022-05-31 |
Family
ID=56888983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019512893A Expired - Fee Related JP7044764B6 (ja) | 2016-09-08 | 2017-08-30 | Ｘ線撮像のための線源格子 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10835193B2 (enExample) |
| EP (1) | EP3509492B1 (enExample) |
| JP (1) | JP7044764B6 (enExample) |
| CN (1) | CN109688930A (enExample) |
| WO (1) | WO2018046377A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150117599A1 (en) | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
| US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
| USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
| DE112019002822T5 (de) | 2018-06-04 | 2021-02-18 | Sigray, Inc. | Wellenlängendispersives röntgenspektrometer |
| CN112470245B (zh) | 2018-07-26 | 2025-03-18 | 斯格瑞公司 | 高亮度x射线反射源 |
| EP3603515A1 (en) * | 2018-08-01 | 2020-02-05 | Koninklijke Philips N.V. | Apparatus for generating x-ray imaging data |
| US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
| US10962491B2 (en) | 2018-09-04 | 2021-03-30 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
| WO2020051221A2 (en) | 2018-09-07 | 2020-03-12 | Sigray, Inc. | System and method for depth-selectable x-ray analysis |
| CN114729907B (zh) | 2019-09-03 | 2023-05-23 | 斯格瑞公司 | 用于计算机层析x射线荧光成像的系统和方法 |
| US11175243B1 (en) | 2020-02-06 | 2021-11-16 | Sigray, Inc. | X-ray dark-field in-line inspection for semiconductor samples |
| US11217357B2 (en) | 2020-02-10 | 2022-01-04 | Sigray, Inc. | X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles |
| CN115667896B (zh) | 2020-05-18 | 2024-06-21 | 斯格瑞公司 | 使用晶体分析器和多个检测元件的x射线吸收光谱的系统和方法 |
| CN111839579B (zh) * | 2020-09-02 | 2025-06-27 | 上海联影医疗科技股份有限公司 | 一种x射线成像设备的限束器及x射线成像设备 |
| DE112021004828T5 (de) | 2020-09-17 | 2023-08-03 | Sigray, Inc. | System und verfahren unter verwendung von röntgenstrahlen für tiefenauflösende messtechnik und analyse |
| JP7626856B2 (ja) | 2020-12-07 | 2025-02-04 | シグレイ、インコーポレイテッド | 透過ｘ線源を用いた高スループット３ｄ ｘ線撮像システム |
| US12480892B2 (en) | 2020-12-07 | 2025-11-25 | Sigray, Inc. | High throughput 3D x-ray imaging system using a transmission x-ray source |
| US12360067B2 (en) | 2022-03-02 | 2025-07-15 | Sigray, Inc. | X-ray fluorescence system and x-ray source with electrically insulative target material |
| US11992350B2 (en) | 2022-03-15 | 2024-05-28 | Sigray, Inc. | System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector |
| DE112023002079T5 (de) | 2022-05-02 | 2025-02-27 | Sigray, Inc. | Sequenzielles wellenlängendispersives röntgenspektrometer |
| US12209977B2 (en) | 2023-02-16 | 2025-01-28 | Sigray, Inc. | X-ray detector system with at least two stacked flat Bragg diffractors |
| US12181423B1 (en) | 2023-09-07 | 2024-12-31 | Sigray, Inc. | Secondary image removal using high resolution x-ray transmission sources |
| US12429437B2 (en) | 2023-11-07 | 2025-09-30 | Sigray, Inc. | System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes |
| WO2025151383A1 (en) | 2024-01-08 | 2025-07-17 | Sigray, Inc. | X-ray analysis system with focused x-ray beam and non-x-ray microscope |
| US12431256B2 (en) | 2024-02-15 | 2025-09-30 | Sigray, Inc. | System and method for generating a focused x-ray beam |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE347859B (enExample) * | 1970-11-30 | 1972-08-14 | Medinova Ab | |
| US4672648A (en) * | 1985-10-25 | 1987-06-09 | Picker International, Inc. | Apparatus and method for radiation attenuation |
| US5812629A (en) * | 1997-04-30 | 1998-09-22 | Clauser; John F. | Ultrahigh resolution interferometric x-ray imaging |
| US7965444B2 (en) | 2006-08-31 | 2011-06-21 | Micron Technology, Inc. | Method and apparatus to improve filter characteristics of optical filters |
| EP2102871B1 (en) * | 2006-12-04 | 2011-01-12 | Koninklijke Philips Electronics N.V. | Beam filter, particularly for x-rays, that does not change the beam's spectral composition |
| JP4911373B2 (ja) * | 2009-11-26 | 2012-04-04 | 横河電機株式会社 | Ｘ線測定装置 |
| JP5536426B2 (ja) | 2009-11-27 | 2014-07-02 | ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー | ビーム形成ｘ線フィルタおよびこれを使ったｘ線ｃｔ装置 |
| WO2011136759A1 (en) | 2010-04-26 | 2011-11-03 | Hewlett-Packard Development Company, L.P. | Non-uniform grating |
| JP2012024339A (ja) | 2010-07-23 | 2012-02-09 | Fujifilm Corp | 放射線画像撮影システム及びコリメータユニット |
| RU2584247C2 (ru) | 2011-02-01 | 2016-05-20 | Конинклейке Филипс Электроникс Н.В. | Формирование дифференциальных фазово-контрастных изображений с пластинами фокусирующих структур преломления |
| JP5944413B2 (ja) | 2011-02-07 | 2016-07-05 | コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． | ダイナミックレンジを増大する微分位相コントラスト撮像装置及び方法 |
| US9066704B2 (en) | 2011-03-14 | 2015-06-30 | Canon Kabushiki Kaisha | X-ray imaging apparatus |
| JP6088503B2 (ja) * | 2011-06-30 | 2017-03-01 | コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． | Ｘ線ビーム透過プロファイル整形器 |
| KR20140063841A (ko) | 2011-10-21 | 2014-05-27 | 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. | 깊은 홈을 갖는 불균일 격자를 구비한 격자 커플러 |
| US20130164457A1 (en) | 2011-12-27 | 2013-06-27 | Rigaku Innovative Technologies, Inc. | Method of manufacturing patterned x-ray optical elements |
| WO2013171657A1 (en) | 2012-05-14 | 2013-11-21 | Koninklijke Philips N.V. | Dark field computed tomography imaging |
| RU2014154006A (ru) | 2012-06-05 | 2016-08-10 | Конинклейке Филипс Н.В. | Калибровка с декомпозицией на слои движения рентгеновских ст-томографов |
| RU2015126546A (ru) * | 2012-12-03 | 2017-01-13 | Конинклейке Филипс Н.В. | Перемещение формирователя профиля пропускания рентгеновского пучка |
| CN105393331B (zh) * | 2013-07-23 | 2017-03-22 | 皇家飞利浦有限公司 | 用于差分相衬成像装置的x射线管的阳极 |
| JP2015078976A (ja) | 2013-09-11 | 2015-04-23 | キヤノン株式会社 | Ｘ線撮像システム |
| EP3094254B1 (en) * | 2014-01-14 | 2017-11-15 | Koninklijke Philips N.V. | X-ray emitting device with an attenuating element for an x-ray imaging apparatus |
| US9726794B2 (en) | 2014-06-13 | 2017-08-08 | The Regents Of The University Of California | High index contrast grating structure for light manipulation and related method |
| US10485492B2 (en) | 2014-11-11 | 2019-11-26 | Koninklijke Philips N.V. | Source-detector arrangement |
| KR20160089647A (ko) | 2015-01-20 | 2016-07-28 | 삼성전자주식회사 | 엑스선 영상장치 및 그 제어방법 |
| US11051772B2 (en) * | 2016-04-08 | 2021-07-06 | Rensselaer Polytechnic Institute | Filtration methods for dual-energy X-ray CT |
-
2017
- 2017-08-30 WO PCT/EP2017/071806 patent/WO2018046377A1/en not_active Ceased
- 2017-08-30 EP EP17758190.7A patent/EP3509492B1/en not_active Not-in-force
- 2017-08-30 US US16/329,807 patent/US10835193B2/en not_active Expired - Fee Related
- 2017-08-30 CN CN201780055442.8A patent/CN109688930A/zh active Pending
- 2017-08-30 JP JP2019512893A patent/JP7044764B6/ja not_active Expired - Fee Related
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