JP2019526751A5 - - Google Patents

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Publication number
JP2019526751A5
JP2019526751A5 JP2018563048A JP2018563048A JP2019526751A5 JP 2019526751 A5 JP2019526751 A5 JP 2019526751A5 JP 2018563048 A JP2018563048 A JP 2018563048A JP 2018563048 A JP2018563048 A JP 2018563048A JP 2019526751 A5 JP2019526751 A5 JP 2019526751A5
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JP
Japan
Prior art keywords
gate valve
chamber
processing
processing chamber
continuous substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018563048A
Other languages
English (en)
Japanese (ja)
Other versions
JP7068197B2 (ja
JP2019526751A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2017/035735 external-priority patent/WO2017210590A1/en
Publication of JP2019526751A publication Critical patent/JP2019526751A/ja
Publication of JP2019526751A5 publication Critical patent/JP2019526751A5/ja
Application granted granted Critical
Publication of JP7068197B2 publication Critical patent/JP7068197B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2018563048A 2016-06-02 2017-06-02 連続トウ処理用のゲートバルブ Active JP7068197B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662344970P 2016-06-02 2016-06-02
US62/344,970 2016-06-02
PCT/US2017/035735 WO2017210590A1 (en) 2016-06-02 2017-06-02 Gate valve for continuous tow processing

Publications (3)

Publication Number Publication Date
JP2019526751A JP2019526751A (ja) 2019-09-19
JP2019526751A5 true JP2019526751A5 (enExample) 2020-08-27
JP7068197B2 JP7068197B2 (ja) 2022-05-16

Family

ID=60478984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018563048A Active JP7068197B2 (ja) 2016-06-02 2017-06-02 連続トウ処理用のゲートバルブ

Country Status (7)

Country Link
US (1) US20200292084A1 (enExample)
EP (1) EP3465746A4 (enExample)
JP (1) JP7068197B2 (enExample)
CN (1) CN109219872A (enExample)
SG (2) SG11201810635YA (enExample)
TW (1) TWI739846B (enExample)
WO (1) WO2017210590A1 (enExample)

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3833018A (en) * 1973-02-21 1974-09-03 Pass Port Syst Corp Low leakage vacuum valve and chamber using same
US4480585A (en) * 1983-06-23 1984-11-06 Energy Conversion Devices, Inc. External isolation module
US4663009A (en) * 1985-02-08 1987-05-05 Hewlett-Packard Company System and method for depositing plural thin film layers on a substrate
US5016562A (en) * 1988-04-27 1991-05-21 Glasstech Solar, Inc. Modular continuous vapor deposition system
US5157851A (en) * 1991-10-02 1992-10-27 United Solar Systems Corporation Pinching gate valve
JP2905038B2 (ja) * 1993-06-15 1999-06-14 松下電器産業株式会社 化学反応装置およびその使用方法
JP3673584B2 (ja) * 1996-01-16 2005-07-20 キヤノン株式会社 ロール・ツー・ロール処理方法および装置
JPH09307128A (ja) * 1996-05-20 1997-11-28 Fuji Electric Co Ltd 薄膜光電変換素子の製造装置および製造方法
JP2000065249A (ja) 1998-08-20 2000-03-03 Irie Koken Kk 真空ゲートバルブ
JP2001077169A (ja) * 1999-06-29 2001-03-23 Mitsubishi Heavy Ind Ltd 真空処理装置
US6298685B1 (en) * 1999-11-03 2001-10-09 Applied Materials, Inc. Consecutive deposition system
US6777352B2 (en) * 2002-02-11 2004-08-17 Applied Materials, Inc. Variable flow deposition apparatus and method in semiconductor substrate processing
WO2003096410A1 (en) * 2002-05-10 2003-11-20 Tokyo Electron Limited Substrate processing device
US7207766B2 (en) * 2003-10-20 2007-04-24 Applied Materials, Inc. Load lock chamber for large area substrate processing system
JP4398262B2 (ja) 2004-01-08 2010-01-13 大日本スクリーン製造株式会社 基板処理装置
US8794896B2 (en) * 2005-12-14 2014-08-05 Tokyo Electron Limited Vacuum processing apparatus and zonal airflow generating unit
US20090304924A1 (en) * 2006-03-03 2009-12-10 Prasad Gadgil Apparatus and method for large area multi-layer atomic layer chemical vapor processing of thin films
EP2013396A1 (en) 2006-05-02 2009-01-14 Dow Corning Ireland Limited Fluid replacement system
JP4714714B2 (ja) 2007-07-30 2011-06-29 株式会社ブイテックス 気密を保持するゲートバルブ、このゲートバルブを使用したフィルム製造装置およびフィルム製造方法
US20100252602A1 (en) * 2009-04-03 2010-10-07 United Solar Ovonic Llc Continuous processing system with pinch valve
JP2012099723A (ja) * 2010-11-04 2012-05-24 Hitachi Kokusai Electric Inc 基板処理装置
KR101293590B1 (ko) * 2011-12-16 2013-08-13 주식회사 뉴파워 프라즈마 양방향 게이트 밸브 및 이를 구비한 기판 처리 시스템
TWM476362U (en) * 2012-09-07 2014-04-11 Applied Materials Inc Load lock chamber with slit valve doors

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