SG11201810635YA - Gate valve for continuous tow processing - Google Patents

Gate valve for continuous tow processing

Info

Publication number
SG11201810635YA
SG11201810635YA SG11201810635YA SG11201810635YA SG11201810635YA SG 11201810635Y A SG11201810635Y A SG 11201810635YA SG 11201810635Y A SG11201810635Y A SG 11201810635YA SG 11201810635Y A SG11201810635Y A SG 11201810635YA SG 11201810635Y A SG11201810635Y A SG 11201810635YA
Authority
SG
Singapore
Prior art keywords
international
california
volumes
disposed
pct
Prior art date
Application number
SG11201810635YA
Inventor
Joseph Yudovsky
David Ishikawa
Travis Tesch
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG11201810635YA publication Critical patent/SG11201810635YA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/029—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with two or more gates
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00—Control of fluid pressure
    • G05D16/20—Control of fluid pressure characterised by the use of electric means
    • G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/2066—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using controlling means acting on the pressure source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Fluid Mechanics (AREA)
  • Automation & Control Theory (AREA)
  • Details Of Valves (AREA)
  • Physical Vapour Deposition (AREA)
  • Sliding Valves (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Detergent Compositions (AREA)

Abstract

r// /; li 114 1 il 110 104 104 104 104 102 W O 20 17 / 2105 90 Al 112 108 114 .\\ ! I 106 134 ! II ii --154 110 116 130 FIG. 1 (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 07 December 2017 (07.12.2017) WIP0 I PCT Iiiimmomiolollmolomm tialimoilowom (10) International Publication Number WO 2017/210590 Al (51) International Patent Classification: HO1L 21/67 (2006.01) (21) International Application Number: PCT/US2017/035735 (22) International Filing Date: 02 June 2017 (02.06.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/344,970 02 June 2016 (02.06.2016) US (71) Applicant: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue, Santa Clara, California 95054 (US). (72) Inventors: YUDOVSKY, Joseph; 594 Smokey Court, Campbell, California 95008 (US). ISHIKAWA, David; 1009 Clark Avenue, Mountain View, California 94040 (US). TESCH, Travis; 3471 Brookdale Drive, Santa Clara, California 95051 (US). (74) Agent: TABOADA, Alan et al.; MOSER TABOADA, 1030 Broad Street, Suite 203, Shrewsbury, New Jersey 07702 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) (54) Title: GATE VALVE FOR CONTINUOUS TOW PROCESSING (57) : Embodiments of gate valves and methods for using same are provided herein. In some embodiments, a gate valve for processing a continuous substrate includes: a body; a plurality of seals disposed within the body and configured to move between a closed position and an open position; a plurality of volumes dis- posed between adjacent ones of the plurality of seals and defined by the plurality of seals and the body; a gas inlet disposed through a first side of the body and fluidly coupled to an innermost one of the plurality of volumes; and a gas outlet disposed through a second side of the body opposite the first side and fluidly coupled to other ones of the plurality of volumes disposed on either side of the innermost one of the plurality of volumes.
SG11201810635YA 2016-06-02 2017-06-02 Gate valve for continuous tow processing SG11201810635YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201662344970P 2016-06-02 2016-06-02
PCT/US2017/035735 WO2017210590A1 (en) 2016-06-02 2017-06-02 Gate valve for continuous tow processing

Publications (1)

Publication Number Publication Date
SG11201810635YA true SG11201810635YA (en) 2018-12-28

Family

ID=60478984

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10202011719QA SG10202011719QA (en) 2016-06-02 2017-06-02 Gate valve for continuous tow processing
SG11201810635YA SG11201810635YA (en) 2016-06-02 2017-06-02 Gate valve for continuous tow processing

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG10202011719QA SG10202011719QA (en) 2016-06-02 2017-06-02 Gate valve for continuous tow processing

Country Status (7)

Country Link
US (1) US20200292084A1 (en)
EP (1) EP3465746A4 (en)
JP (1) JP7068197B2 (en)
CN (1) CN109219872A (en)
SG (2) SG10202011719QA (en)
TW (1) TWI739846B (en)
WO (1) WO2017210590A1 (en)

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3833018A (en) * 1973-02-21 1974-09-03 Pass Port Syst Corp Low leakage vacuum valve and chamber using same
US4480585A (en) * 1983-06-23 1984-11-06 Energy Conversion Devices, Inc. External isolation module
US4663009A (en) * 1985-02-08 1987-05-05 Hewlett-Packard Company System and method for depositing plural thin film layers on a substrate
US5016562A (en) * 1988-04-27 1991-05-21 Glasstech Solar, Inc. Modular continuous vapor deposition system
US5157851A (en) * 1991-10-02 1992-10-27 United Solar Systems Corporation Pinching gate valve
JP2905038B2 (en) * 1993-06-15 1999-06-14 松下電器産業株式会社 Chemical reaction apparatus and method of using the same
JP3673584B2 (en) * 1996-01-16 2005-07-20 キヤノン株式会社 Roll-to-roll processing method and apparatus
JPH09307128A (en) * 1996-05-20 1997-11-28 Fuji Electric Co Ltd Manufacturing equipment and method of thin film photoelectric transducer
JP2000065249A (en) 1998-08-20 2000-03-03 Irie Koken Kk Vacuum gate valve
JP2001077169A (en) * 1999-06-29 2001-03-23 Mitsubishi Heavy Ind Ltd Vacuum processor
US6298685B1 (en) * 1999-11-03 2001-10-09 Applied Materials, Inc. Consecutive deposition system
US6777352B2 (en) * 2002-02-11 2004-08-17 Applied Materials, Inc. Variable flow deposition apparatus and method in semiconductor substrate processing
WO2003096410A1 (en) * 2002-05-10 2003-11-20 Tokyo Electron Limited Substrate processing device
US7207766B2 (en) * 2003-10-20 2007-04-24 Applied Materials, Inc. Load lock chamber for large area substrate processing system
JP4398262B2 (en) 2004-01-08 2010-01-13 大日本スクリーン製造株式会社 Substrate processing equipment
US8794896B2 (en) * 2005-12-14 2014-08-05 Tokyo Electron Limited Vacuum processing apparatus and zonal airflow generating unit
WO2007106076A2 (en) * 2006-03-03 2007-09-20 Prasad Gadgil Apparatus and method for large area multi-layer atomic layer chemical vapor processing of thin films
JP2009535514A (en) 2006-05-02 2009-10-01 ダウ・コーニング・アイルランド・リミテッド Fluid exchange system
JP4714714B2 (en) 2007-07-30 2011-06-29 株式会社ブイテックス Gate valve for maintaining airtightness, film manufacturing apparatus and film manufacturing method using the gate valve
US20100252602A1 (en) 2009-04-03 2010-10-07 United Solar Ovonic Llc Continuous processing system with pinch valve
JP2012099723A (en) * 2010-11-04 2012-05-24 Hitachi Kokusai Electric Inc Substrate processing apparatus
KR101293590B1 (en) * 2011-12-16 2013-08-13 주식회사 뉴파워 프라즈마 Two way gate valve and substrate processing system having the same
TWM476362U (en) * 2012-09-07 2014-04-11 Applied Materials Inc Load lock chamber with slit valve doors

Also Published As

Publication number Publication date
US20200292084A1 (en) 2020-09-17
EP3465746A4 (en) 2020-03-04
JP7068197B2 (en) 2022-05-16
TWI739846B (en) 2021-09-21
SG10202011719QA (en) 2020-12-30
JP2019526751A (en) 2019-09-19
TW201802382A (en) 2018-01-16
WO2017210590A1 (en) 2017-12-07
EP3465746A1 (en) 2019-04-10
CN109219872A (en) 2019-01-15

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