JP2019515429A5 - - Google Patents

Download PDF

Info

Publication number
JP2019515429A5
JP2019515429A5 JP2018555490A JP2018555490A JP2019515429A5 JP 2019515429 A5 JP2019515429 A5 JP 2019515429A5 JP 2018555490 A JP2018555490 A JP 2018555490A JP 2018555490 A JP2018555490 A JP 2018555490A JP 2019515429 A5 JP2019515429 A5 JP 2019515429A5
Authority
JP
Japan
Prior art keywords
frequency
reflection coefficient
generator
complex reflection
impedance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018555490A
Other languages
English (en)
Japanese (ja)
Other versions
JP6666470B2 (ja
JP2019515429A (ja
Filing date
Publication date
Priority claimed from US15/133,461 external-priority patent/US9748076B1/en
Application filed filed Critical
Publication of JP2019515429A publication Critical patent/JP2019515429A/ja
Publication of JP2019515429A5 publication Critical patent/JP2019515429A5/ja
Application granted granted Critical
Publication of JP6666470B2 publication Critical patent/JP6666470B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2018555490A 2016-04-20 2017-04-13 Ｒｆ発生器における周波数同調のための装置 Active JP6666470B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/133,461 2016-04-20
US15/133,461 US9748076B1 (en) 2016-04-20 2016-04-20 Apparatus for frequency tuning in a RF generator
PCT/US2017/027385 WO2017184425A1 (en) 2016-04-20 2017-04-13 Apparatus for frequency tuning in a rf generator

Publications (3)

Publication Number Publication Date
JP2019515429A JP2019515429A (ja) 2019-06-06
JP2019515429A5 true JP2019515429A5 (enExample) 2020-02-27
JP6666470B2 JP6666470B2 (ja) 2020-03-13

Family

ID=59654812

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018555490A Active JP6666470B2 (ja) 2016-04-20 2017-04-13 Ｒｆ発生器における周波数同調のための装置

Country Status (6)

Country Link
US (2) US9748076B1 (enExample)
JP (1) JP6666470B2 (enExample)
KR (1) KR102099033B1 (enExample)
CN (1) CN109156075B (enExample)
TW (1) TWI677265B (enExample)
WO (1) WO2017184425A1 (enExample)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111699542B (zh) 2017-11-29 2023-05-16 康姆艾德技术美国分公司 用于阻抗匹配网络控制的重新调谐
US12288673B2 (en) 2017-11-29 2025-04-29 COMET Technologies USA, Inc. Retuning for impedance matching network control
CN108761246A (zh) * 2018-06-28 2018-11-06 中国人民解放军空军工程大学 一种聚合物基介质阻挡放电等离子体激励器老化状态监测电路及监测方法
CN112585715B (zh) 2018-08-17 2024-04-26 朗姆研究公司 在衬底处理系统中用于无匹配式等离子体源的直接频率调谐
CN111293022B (zh) * 2018-12-07 2023-01-24 中微半导体设备(上海)股份有限公司 脉冲射频等离子体的阻抗匹配方法和装置
CN109819577B (zh) * 2019-04-01 2021-03-19 北京航天广通科技有限公司 基于二次谐波的同步加速器控制方法和系统
US10886104B2 (en) * 2019-06-10 2021-01-05 Advanced Energy Industries, Inc. Adaptive plasma ignition
US11114279B2 (en) 2019-06-28 2021-09-07 COMET Technologies USA, Inc. Arc suppression device for plasma processing equipment
US11527385B2 (en) 2021-04-29 2022-12-13 COMET Technologies USA, Inc. Systems and methods for calibrating capacitors of matching networks
US11107661B2 (en) 2019-07-09 2021-08-31 COMET Technologies USA, Inc. Hybrid matching network topology
US11596309B2 (en) 2019-07-09 2023-03-07 COMET Technologies USA, Inc. Hybrid matching network topology
EP4022656A4 (en) 2019-08-28 2023-10-04 Comet Technologies USA, Inc HIGH POWER LOW FREQUENCY COILS
US11170981B2 (en) * 2019-09-17 2021-11-09 Tokyo Electron Limited Broadband plasma processing systems and methods
US11295937B2 (en) * 2019-09-17 2022-04-05 Tokyo Electron Limited Broadband plasma processing systems and methods
US10741363B1 (en) * 2019-10-08 2020-08-11 Mks Instruments, Inc. Extremum seeking control apparatus and method for automatic frequency tuning for RF impedance matching
US12027351B2 (en) 2020-01-10 2024-07-02 COMET Technologies USA, Inc. Plasma non-uniformity detection
US11521832B2 (en) 2020-01-10 2022-12-06 COMET Technologies USA, Inc. Uniformity control for radio frequency plasma processing systems
US11887820B2 (en) 2020-01-10 2024-01-30 COMET Technologies USA, Inc. Sector shunts for plasma-based wafer processing systems
US11670488B2 (en) 2020-01-10 2023-06-06 COMET Technologies USA, Inc. Fast arc detecting match network
US11830708B2 (en) 2020-01-10 2023-11-28 COMET Technologies USA, Inc. Inductive broad-band sensors for electromagnetic waves
US11605527B2 (en) 2020-01-20 2023-03-14 COMET Technologies USA, Inc. Pulsing control match network
US11961711B2 (en) 2020-01-20 2024-04-16 COMET Technologies USA, Inc. Radio frequency match network and generator
US11688584B2 (en) 2020-04-29 2023-06-27 Advanced Energy Industries, Inc. Programmable ignition profiles for enhanced plasma ignition
CN114188204B (zh) * 2020-09-14 2023-10-31 中微半导体设备(上海)股份有限公司 一种等离子体处理方法、射频发生器以及装置
US11373844B2 (en) 2020-09-28 2022-06-28 COMET Technologies USA, Inc. Systems and methods for repetitive tuning of matching networks
JP7803944B2 (ja) * 2020-10-26 2026-01-21 ラム リサーチ コーポレーション Ｒｆパルス化スキームの同期及びセンサデータ収集の同期
US12057296B2 (en) 2021-02-22 2024-08-06 COMET Technologies USA, Inc. Electromagnetic field sensing device
US11923175B2 (en) 2021-07-28 2024-03-05 COMET Technologies USA, Inc. Systems and methods for variable gain tuning of matching networks
CN113472319B (zh) * 2021-09-01 2021-11-23 四川英杰电气股份有限公司 一种射频电源的调谐方法
US12368022B2 (en) * 2021-10-20 2025-07-22 Samsung Electronics Co., Ltd. RF generating device and semiconductor manufacturing apparatus including the same
US12243717B2 (en) 2022-04-04 2025-03-04 COMET Technologies USA, Inc. Variable reactance device having isolated gate drive power supplies
CN115015657A (zh) * 2022-04-26 2022-09-06 深圳市拓大医疗科技有限公司 一种射频美容仪可靠性测试方法和存储介质
US12040139B2 (en) 2022-05-09 2024-07-16 COMET Technologies USA, Inc. Variable capacitor with linear impedance and high voltage breakdown
US11657980B1 (en) 2022-05-09 2023-05-23 COMET Technologies USA, Inc. Dielectric fluid variable capacitor
US12020902B2 (en) 2022-07-14 2024-06-25 Tokyo Electron Limited Plasma processing with broadband RF waveforms
US12646686B2 (en) 2022-07-29 2026-06-02 COMET Technologies USA, Inc. Compound helical inductor coil
US12051549B2 (en) 2022-08-02 2024-07-30 COMET Technologies USA, Inc. Coaxial variable capacitor
US12132435B2 (en) 2022-10-27 2024-10-29 COMET Technologies USA, Inc. Method for repeatable stepper motor homing
US12567562B2 (en) 2022-12-21 2026-03-03 Advanced Energy Industries, Inc. Compensation of impedance modulation in a plasma generator by frequency sweep
KR20250156594A (ko) * 2024-04-25 2025-11-03 주식회사 알에프피티 고속 자동 무선 주파수 제어 방법 및 장치

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2884605B2 (ja) 1989-07-19 1999-04-19 井関農機株式会社 脱穀機のフレーム構造
US5187454A (en) * 1992-01-23 1993-02-16 Applied Materials, Inc. Electronically tuned matching network using predictor-corrector control system
JPH07191764A (ja) 1993-12-27 1995-07-28 Fujitsu Ltd 高周波電源装置及びプラズマ発生装置
JP2884056B2 (ja) 1995-12-07 1999-04-19 パール工業株式会社 放電プラズマ発生用高周波電源装置及び半導体製造装置
US6027601A (en) 1997-07-01 2000-02-22 Applied Materials, Inc Automatic frequency tuning of an RF plasma source of an inductively coupled plasma reactor
US6020794A (en) 1998-02-09 2000-02-01 Eni Technologies, Inc. Ratiometric autotuning algorithm for RF plasma generator
US6472822B1 (en) 2000-04-28 2002-10-29 Applied Materials, Inc. Pulsed RF power delivery for plasma processing
US6383554B1 (en) 2000-09-05 2002-05-07 National Science Council Process for fabricating plasma with feedback control on plasma density
US7476233B1 (en) 2000-10-20 2009-01-13 Ethicon Endo-Surgery, Inc. Ultrasonic surgical system within digital control
JP3778842B2 (ja) 2001-10-30 2006-05-24 パール工業株式会社 高周波検出方法および高周波検出回路
US6707255B2 (en) 2002-07-10 2004-03-16 Eni Technology, Inc. Multirate processing for metrology of plasma RF source
US6791274B1 (en) 2003-07-15 2004-09-14 Advanced Energy Industries, Inc. RF power control device for RF plasma applications
US7145398B2 (en) 2003-07-28 2006-12-05 Analog Devices, Inc. Coarse frequency detector system and method thereof
US6902646B2 (en) 2003-08-14 2005-06-07 Advanced Energy Industries, Inc. Sensor array for measuring plasma characteristics in plasma processing environments
US7988816B2 (en) 2004-06-21 2011-08-02 Tokyo Electron Limited Plasma processing apparatus and method
JP4695362B2 (ja) 2004-08-16 2011-06-08 株式会社日立ハイテクノロジーズ プラズマ処理装置およびプラズマ処理方法
JP4739793B2 (ja) * 2005-03-31 2011-08-03 株式会社ダイヘン 高周波電源装置
US7477711B2 (en) 2005-05-19 2009-01-13 Mks Instruments, Inc. Synchronous undersampling for high-frequency voltage and current measurements
FR2895169B1 (fr) 2005-12-15 2008-08-01 Renault Sas Optimisation de la frequence d'excitation d'un resonateur
JP5426811B2 (ja) * 2006-11-22 2014-02-26 パール工業株式会社 高周波電源装置
CN101287327B (zh) * 2007-04-13 2011-07-20 中微半导体设备(上海)有限公司 射频功率源系统及使用该射频功率源系统的等离子体反应腔室
US7839223B2 (en) 2008-03-23 2010-11-23 Advanced Energy Industries, Inc. Method and apparatus for advanced frequency tuning
JP2011525682A (ja) * 2008-05-14 2011-09-22 アプライド マテリアルズ インコーポレイテッド Ｒｆ電力供給のための時間分解チューニングスキームを利用したパルス化プラズマ処理の方法及び装置
US8040068B2 (en) 2009-02-05 2011-10-18 Mks Instruments, Inc. Radio frequency power control system
US8674606B2 (en) 2009-04-27 2014-03-18 Advanced Energy Industries, Inc. Detecting and preventing instabilities in plasma processes
US8330432B2 (en) 2009-12-22 2012-12-11 Advanced Energy Industries, Inc Efficient active source impedance modification of a power amplifier
JP5709505B2 (ja) 2010-12-15 2015-04-30 東京エレクトロン株式会社 プラズマ処理装置、プラズマ処理方法、および記憶媒体
US8723423B2 (en) * 2011-01-25 2014-05-13 Advanced Energy Industries, Inc. Electrostatic remote plasma source
US8897607B2 (en) * 2011-07-25 2014-11-25 Harris Corporation Tunable RF filter device using optical waveguides with dispersion slopes of opposite signs and related methods
JP5808012B2 (ja) 2011-12-27 2015-11-10 東京エレクトロン株式会社 プラズマ処理装置
US8576013B2 (en) * 2011-12-29 2013-11-05 Mks Instruments, Inc. Power distortion-based servo control systems for frequency tuning RF power sources
US9171699B2 (en) 2012-02-22 2015-10-27 Lam Research Corporation Impedance-based adjustment of power and frequency
US8773019B2 (en) 2012-02-23 2014-07-08 Mks Instruments, Inc. Feedback control and coherency of multiple power supplies in radio frequency power delivery systems for pulsed mode schemes in thin film processing
JP6045118B2 (ja) * 2012-03-06 2016-12-14 株式会社日立国際電気 高周波電源装置およびその整合方法
US8952765B2 (en) 2012-03-23 2015-02-10 Mks Instruments, Inc. System and methods of bimodal automatic power and frequency tuning of RF generators
US9214901B2 (en) * 2012-07-27 2015-12-15 Mks Instruments, Inc. Wideband AFT power amplifier systems with frequency-based output transformer impedance balancing
US9316675B2 (en) 2012-09-06 2016-04-19 Mks Instruments, Inc. Secondary plasma detection systems and methods
US9294100B2 (en) * 2012-12-04 2016-03-22 Advanced Energy Industries, Inc. Frequency tuning system and method for finding a global optimum
US8781415B1 (en) * 2013-02-07 2014-07-15 Mks Instruments, Inc. Distortion correction based feedforward control systems and methods for radio frequency power sources
US9536713B2 (en) * 2013-02-27 2017-01-03 Advanced Energy Industries, Inc. Reliable plasma ignition and reignition
WO2015148490A1 (en) 2014-03-24 2015-10-01 Advanced Energy Industries, Inc. System and method for control of high efficiency generator source impedance

Similar Documents

Publication Publication Date Title
JP6666470B2 (ja) Ｒｆ発生器における周波数同調のための装置
CN105229919B (zh) 传递函数调节
US9577771B1 (en) Radio frequency time skew calibration systems and methods
US20170168151A1 (en) Apparatus and method for optimizing ultrasonic signal
KR101927439B1 (ko) 플라즈마 생성을 위한 전력 공급 장치
JP2016514918A5 (enExample)
CN101548467A (zh) 延迟线校准
US20190182589A1 (en) Excursion control based on an audio signal bandwidth estimate obtained from back-emf analysis
CN104181388A (zh) 用于测量电信号的频率的方法以及电测量系统
CN109709559B (zh) 超声传感器及其控制方法
US10578711B2 (en) Radar apparatus, radar output control system, and radar output control method
JP6125337B2 (ja) 音響校正器
US9306507B2 (en) Controller and method for controlling a signal processor
JP6368591B2 (ja) チャージアンプ回路
CN103701738A (zh) 一种预失真参数确定方法、设备及数字预失真处理系统
JP5889037B2 (ja) パルスレーダ装置
JP5694981B2 (ja) 自動利得調整回路
CN111227023A (zh) 射频解冻装置及其控制方法及装置、解冻机、存储介质
KR20250151369A (ko) 주파수 스윕에 의한 플라즈마 생성기에서의 임피던스 변조의 보상
KR102849240B1 (ko) 사운드 필드 감지를 기반으로 한 저전력 음향학의 근접 경보장치 및 경보방법
JP2016090298A (ja) チャープ信号生成装置及び地中レーダ装置
Parshin et al. Adaptive filtering of non-Gaussian flicker noise in discrete time systems
Sedrakian et al. Magnetosonic waves in the crust of a neutron star
US9112596B2 (en) Transmitter
JP4986737B2 (ja) プリディストーション型歪補償増幅装置