TWI677265B - 用於在rf產生器中進行頻率調諧的設備 - Google Patents
用於在rf產生器中進行頻率調諧的設備 Download PDFInfo
- Publication number
- TWI677265B TWI677265B TW106112173A TW106112173A TWI677265B TW I677265 B TWI677265 B TW I677265B TW 106112173 A TW106112173 A TW 106112173A TW 106112173 A TW106112173 A TW 106112173A TW I677265 B TWI677265 B TW I677265B
- Authority
- TW
- Taiwan
- Prior art keywords
- frequency
- generate
- reflection coefficient
- impedance
- complex reflection
- Prior art date
Links
- 238000005259 measurement Methods 0.000 claims abstract description 50
- 238000012545 processing Methods 0.000 claims description 27
- 238000001914 filtration Methods 0.000 claims 2
- 238000000034 method Methods 0.000 abstract description 64
- 238000012512 characterization method Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 9
- 230000006870 function Effects 0.000 description 7
- 238000002847 impedance measurement Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000013500 data storage Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/133,461 | 2016-04-20 | ||
| US15/133,461 US9748076B1 (en) | 2016-04-20 | 2016-04-20 | Apparatus for frequency tuning in a RF generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201801574A TW201801574A (zh) | 2018-01-01 |
| TWI677265B true TWI677265B (zh) | 2019-11-11 |
Family
ID=59654812
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106112173A TWI677265B (zh) | 2016-04-20 | 2017-04-12 | 用於在rf產生器中進行頻率調諧的設備 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9748076B1 (enExample) |
| JP (1) | JP6666470B2 (enExample) |
| KR (1) | KR102099033B1 (enExample) |
| CN (1) | CN109156075B (enExample) |
| TW (1) | TWI677265B (enExample) |
| WO (1) | WO2017184425A1 (enExample) |
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| CN111699542B (zh) | 2017-11-29 | 2023-05-16 | 康姆艾德技术美国分公司 | 用于阻抗匹配网络控制的重新调谐 |
| US12288673B2 (en) | 2017-11-29 | 2025-04-29 | COMET Technologies USA, Inc. | Retuning for impedance matching network control |
| CN108761246A (zh) * | 2018-06-28 | 2018-11-06 | 中国人民解放军空军工程大学 | 一种聚合物基介质阻挡放电等离子体激励器老化状态监测电路及监测方法 |
| CN112585715B (zh) | 2018-08-17 | 2024-04-26 | 朗姆研究公司 | 在衬底处理系统中用于无匹配式等离子体源的直接频率调谐 |
| CN111293022B (zh) * | 2018-12-07 | 2023-01-24 | 中微半导体设备(上海)股份有限公司 | 脉冲射频等离子体的阻抗匹配方法和装置 |
| CN109819577B (zh) * | 2019-04-01 | 2021-03-19 | 北京航天广通科技有限公司 | 基于二次谐波的同步加速器控制方法和系统 |
| US10886104B2 (en) * | 2019-06-10 | 2021-01-05 | Advanced Energy Industries, Inc. | Adaptive plasma ignition |
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| US11527385B2 (en) | 2021-04-29 | 2022-12-13 | COMET Technologies USA, Inc. | Systems and methods for calibrating capacitors of matching networks |
| US11107661B2 (en) | 2019-07-09 | 2021-08-31 | COMET Technologies USA, Inc. | Hybrid matching network topology |
| US11596309B2 (en) | 2019-07-09 | 2023-03-07 | COMET Technologies USA, Inc. | Hybrid matching network topology |
| EP4022656A4 (en) | 2019-08-28 | 2023-10-04 | Comet Technologies USA, Inc | HIGH POWER LOW FREQUENCY COILS |
| US11170981B2 (en) * | 2019-09-17 | 2021-11-09 | Tokyo Electron Limited | Broadband plasma processing systems and methods |
| US11295937B2 (en) * | 2019-09-17 | 2022-04-05 | Tokyo Electron Limited | Broadband plasma processing systems and methods |
| US10741363B1 (en) * | 2019-10-08 | 2020-08-11 | Mks Instruments, Inc. | Extremum seeking control apparatus and method for automatic frequency tuning for RF impedance matching |
| US12027351B2 (en) | 2020-01-10 | 2024-07-02 | COMET Technologies USA, Inc. | Plasma non-uniformity detection |
| US11521832B2 (en) | 2020-01-10 | 2022-12-06 | COMET Technologies USA, Inc. | Uniformity control for radio frequency plasma processing systems |
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| US11670488B2 (en) | 2020-01-10 | 2023-06-06 | COMET Technologies USA, Inc. | Fast arc detecting match network |
| US11830708B2 (en) | 2020-01-10 | 2023-11-28 | COMET Technologies USA, Inc. | Inductive broad-band sensors for electromagnetic waves |
| US11605527B2 (en) | 2020-01-20 | 2023-03-14 | COMET Technologies USA, Inc. | Pulsing control match network |
| US11961711B2 (en) | 2020-01-20 | 2024-04-16 | COMET Technologies USA, Inc. | Radio frequency match network and generator |
| US11688584B2 (en) | 2020-04-29 | 2023-06-27 | Advanced Energy Industries, Inc. | Programmable ignition profiles for enhanced plasma ignition |
| CN114188204B (zh) * | 2020-09-14 | 2023-10-31 | 中微半导体设备(上海)股份有限公司 | 一种等离子体处理方法、射频发生器以及装置 |
| US11373844B2 (en) | 2020-09-28 | 2022-06-28 | COMET Technologies USA, Inc. | Systems and methods for repetitive tuning of matching networks |
| JP7803944B2 (ja) * | 2020-10-26 | 2026-01-21 | ラム リサーチ コーポレーション | Rfパルス化スキームの同期及びセンサデータ収集の同期 |
| US12057296B2 (en) | 2021-02-22 | 2024-08-06 | COMET Technologies USA, Inc. | Electromagnetic field sensing device |
| US11923175B2 (en) | 2021-07-28 | 2024-03-05 | COMET Technologies USA, Inc. | Systems and methods for variable gain tuning of matching networks |
| CN113472319B (zh) * | 2021-09-01 | 2021-11-23 | 四川英杰电气股份有限公司 | 一种射频电源的调谐方法 |
| US12368022B2 (en) * | 2021-10-20 | 2025-07-22 | Samsung Electronics Co., Ltd. | RF generating device and semiconductor manufacturing apparatus including the same |
| US12243717B2 (en) | 2022-04-04 | 2025-03-04 | COMET Technologies USA, Inc. | Variable reactance device having isolated gate drive power supplies |
| CN115015657A (zh) * | 2022-04-26 | 2022-09-06 | 深圳市拓大医疗科技有限公司 | 一种射频美容仪可靠性测试方法和存储介质 |
| US12040139B2 (en) | 2022-05-09 | 2024-07-16 | COMET Technologies USA, Inc. | Variable capacitor with linear impedance and high voltage breakdown |
| US11657980B1 (en) | 2022-05-09 | 2023-05-23 | COMET Technologies USA, Inc. | Dielectric fluid variable capacitor |
| US12020902B2 (en) | 2022-07-14 | 2024-06-25 | Tokyo Electron Limited | Plasma processing with broadband RF waveforms |
| US12646686B2 (en) | 2022-07-29 | 2026-06-02 | COMET Technologies USA, Inc. | Compound helical inductor coil |
| US12051549B2 (en) | 2022-08-02 | 2024-07-30 | COMET Technologies USA, Inc. | Coaxial variable capacitor |
| US12132435B2 (en) | 2022-10-27 | 2024-10-29 | COMET Technologies USA, Inc. | Method for repeatable stepper motor homing |
| US12567562B2 (en) | 2022-12-21 | 2026-03-03 | Advanced Energy Industries, Inc. | Compensation of impedance modulation in a plasma generator by frequency sweep |
| KR20250156594A (ko) * | 2024-04-25 | 2025-11-03 | 주식회사 알에프피티 | 고속 자동 무선 주파수 제어 방법 및 장치 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060220656A1 (en) * | 2005-03-31 | 2006-10-05 | Daihen Corporation | High-frequency power source |
| JP2008263587A (ja) * | 2007-04-13 | 2008-10-30 | Advanced Micro-Fabrication Equipment Inc Asia | Rfパワーソースシステムと該rfパワーソースシステムを使用するプラズマチェンバー |
| US7839223B2 (en) * | 2008-03-23 | 2010-11-23 | Advanced Energy Industries, Inc. | Method and apparatus for advanced frequency tuning |
| TW201327620A (zh) * | 2011-12-29 | 2013-07-01 | Mks Instr Inc | 頻率調諧射頻功率源之基於功率失真的伺服控制系統 |
| TWI430715B (zh) * | 2006-11-22 | 2014-03-11 | 巴爾工業股份有限公司 | 高頻電源裝置及高頻功率供給方法 |
| US20140155008A1 (en) * | 2012-12-04 | 2014-06-05 | Advanced Energy Industries, Inc. | Frequency tuning system and method for finding a global optimum |
| JP2014222657A (ja) * | 2008-05-14 | 2014-11-27 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Rf電力供給のための時間分解チューニングスキームを利用したパルス化プラズマ処理の方法及び装置 |
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-
2016
- 2016-04-20 US US15/133,461 patent/US9748076B1/en active Active
-
2017
- 2017-04-12 TW TW106112173A patent/TWI677265B/zh active
- 2017-04-13 JP JP2018555490A patent/JP6666470B2/ja active Active
- 2017-04-13 KR KR1020187033349A patent/KR102099033B1/ko active Active
- 2017-04-13 CN CN201780031100.2A patent/CN109156075B/zh active Active
- 2017-04-13 WO PCT/US2017/027385 patent/WO2017184425A1/en not_active Ceased
- 2017-07-24 US US15/657,525 patent/US10026595B2/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060220656A1 (en) * | 2005-03-31 | 2006-10-05 | Daihen Corporation | High-frequency power source |
| TWI430715B (zh) * | 2006-11-22 | 2014-03-11 | 巴爾工業股份有限公司 | 高頻電源裝置及高頻功率供給方法 |
| JP2008263587A (ja) * | 2007-04-13 | 2008-10-30 | Advanced Micro-Fabrication Equipment Inc Asia | Rfパワーソースシステムと該rfパワーソースシステムを使用するプラズマチェンバー |
| US7839223B2 (en) * | 2008-03-23 | 2010-11-23 | Advanced Energy Industries, Inc. | Method and apparatus for advanced frequency tuning |
| JP2014222657A (ja) * | 2008-05-14 | 2014-11-27 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Rf電力供給のための時間分解チューニングスキームを利用したパルス化プラズマ処理の方法及び装置 |
| TW201327620A (zh) * | 2011-12-29 | 2013-07-01 | Mks Instr Inc | 頻率調諧射頻功率源之基於功率失真的伺服控制系統 |
| US20140155008A1 (en) * | 2012-12-04 | 2014-06-05 | Advanced Energy Industries, Inc. | Frequency tuning system and method for finding a global optimum |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109156075B (zh) | 2020-08-07 |
| CN109156075A (zh) | 2019-01-04 |
| KR20180132901A (ko) | 2018-12-12 |
| US20170323771A1 (en) | 2017-11-09 |
| KR102099033B1 (ko) | 2020-04-08 |
| TW201801574A (zh) | 2018-01-01 |
| JP6666470B2 (ja) | 2020-03-13 |
| JP2019515429A (ja) | 2019-06-06 |
| US9748076B1 (en) | 2017-08-29 |
| WO2017184425A1 (en) | 2017-10-26 |
| US10026595B2 (en) | 2018-07-17 |
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